A modular unit for washing and drying containers for pharmaceutical use includes a load transfer unit configured to take a plurality of containers for pharmaceutical use from an associated input transfer unit, a washing tower, a group of grippers configured to take said containers for pharmaceutical use from the load transfer unit and loading them onto said washing tower, at least one washing station, at least one drying station and at least one unloading station for said containers for pharmaceutical use. The washing tower is configured to move the containers for pharmaceutical use through said washing stations, drying stations and unloading stations. The drying station includes at least one lower drying nozzle configured to direct a flow of air from the bottom to the top inside the containers and at least one upper drying nozzle configured to blow air from above.

A substrate stocker system that may include a high-density storage chamber that comprises a plurality of compartments, each storing one or more high density substrates, one or more robots configured to move one or more compartments of the high-density storage chamber for cleaning, and a cleaning module configured to clean the one or more compartments, while the one or more compartments hold corresponding one or more substrates.

The invention relates to a non-corrosive degreasing concentrate and ready to use formulation. In particular, non-corrosive compositions capable of removing polymerized grease as effectively as some alkali metal hydroxide (i.e. caustic) based degreasers without requiring the use of personal protective equipment are disclosed.

Methods employing detergent compositions effective for reducing hard water scale and accumulation on hard surfaces, namely within food, beverage and pharmaceutical applications are disclosed. The detergent compositions employ phosphinosuccinic acid adducts in combination with an alkalinity source and optionally polymers, surfactants and/or oxidizers, providing alkaline compositions having a pH between about 10 and 13.5.

A method of washing dishes in an automated dishwasher utilizing a high velocity sprayer and high velocity spray phase for forcibly spraying water from concavities on washed dishes or utensils in which liquid can puddle in the cavities of the dishes or utensils during previous washing or rinsing cycles.

Process for cleaning dishware soiled with fatty residue, characterized in that said process is carried out at a temperature in the range of from 45 to 65 C. and using at least one formulation, comprising (A) in the range of from 1 to 50% by weight of at least one complexing agent, selected from the alkali metal salts of citric acid, aminocarboxylic acids and from sodium tripolyphosphate, (B) in the range of from 2 to 8% by weight of at least one non-ionic surfactant of general formula (I) R.sup.1CH(OH)CH.sub.2O-(AO).sub.xR.sup.2 (I) (C) in the range of from 0.25 to less than 4% by weight of a copolymer, being obtained from copolymerizing the following comonomers (a) at least one comonomer selected from ethylenically unsaturated C.sub.3-C.sub.4-carboxylic acids and ethylenically unsaturated C.sub.4-C.sub.8-dicarboxylic acids or their respective anhydrides, (b) at least one comonomer selected from isobutene, diisobutene, C.sub.2-C.sub.28-a-olefins, and C.sub.12-C.sub.24-alkyl esters of (meth)acrylic acid, (c) optionally, at least one further comonomer selected from non-ionic comonomers, the integers being defined as follows: R.sup.1 being selected from C.sub.4-C.sub.30-alkyl, straight-chain or branched, and from C.sub.4-C.sub.30-alkenyl, straight-chain or branched, with at least one CC double bond, R.sup.2 being selected from C.sub.1-C.sub.30-alkyl, straight-chain or branched, and from C.sub.2-C.sub.30-alkenyl, straight-chain or branched, with at least one CC double bond, x being selected from one to 100, AO being identical or different alkylene oxides, selected from CH.sub.2CH.sub.2O, (CH.sub.2).sub.3O, (CH.sub.2).sub.4O, CH.sub.2CH(CH.sub.3)O, CH(CH.sub.3)CH.sub.2O and CH.sub.2CH(n-C.sub.3H.sub.7)O.
R.sup.1CH(OH)CH.sub.2O-(AO).sub.xR.sup.2(I)

A method of cleaning an apparatus for processing a semiconductor wafer includes providing a first device having a first surface configured to load a first semiconductor wafer, a second device having a second surface configured to load a second semiconductor wafer, and a first cleaning module; and cleaning the second surface by moving the first cleaning module across the second surface in a first direction with respect to the second device.

A container-processing machine includes a rotor with processing positions formed thereon, a transfer station, and a static lifting element used by all the processing positions. Each processing position has a processing head and a container carrier. The lifting element is a static lifting element that is used by all of the processing positions. When the processing position is at the transfer station, the lifting element causes relative motion between a container carrier and a processing head of the processing position. This causes the processing position to transition between receiving and discharge states.

A method of washing dishes in an automated dishwasher utilizing a high velocity sprayer and high velocity spray phase for forcibly spraying water from concavities on washed dishes or utensils in which liquid can puddle in the cavities of the dishes or utensils during previous washing or rinsing cycles.

A method for processing containers includes introducing flushing gas into a container's interior while the interior remains connected to a vacuum source, and adjusting flow of the flushing gas and an underpressure of the vacuum source such that, while flushing gas flows through the interior, a flushing pressure in the interior lies between 0.46 and 0.9 bar.