A wafer storage container cleaning device according to an embodiment includes a first inspection unit that inspects a grip target portion of a wafer storage container; a cleaning unit that cleans a storage space storing the wafer, in the container; a second inspection unit that inspects the storage space; a robot that conveys the container from the first inspection unit to the cleaning unit and conveys the container from the cleaning unit to the second inspection unit; and a control unit that controls the robot. The control unit controls the robot to convey the container from the first inspection unit to the cleaning unit when the container is determined to be in a usable state, and controls the robot to convey the container from the first inspection unit to a position different from that of the cleaning unit when the container is determined not to be in the usable state.