The present invention relates to a dry cleaning technology for a cleaning a surface of an object to be cleaned by adiabatically expanding liquid carbon dioxide to generate sublimable dry ice particles and carrying the dry ice particles on high-speed carrier gas to be sprayed onto the surface of the object to be cleaned, wherein an end of a liquid carbon dioxide nozzle further protrudes to the outside relative to an end of a carrier gas nozzle to prevent a growth of dry ice particles in the carrier gas nozzle, a hydrophobic coating is formed on a surface of the liquid carbon dioxide nozzle to prevent a formation of water droplets and to prevent an occurrence of irregular dry ice particles, thereby effectively preventing damage to a surface of an object to be cleaned and being advantageous in an economical aspect by significantly reducing consumption of liquid carbon dioxide.

A decontamination apparatus for decontaminating an external surface is provided. The decontamination apparatus has a moveable platform and a containment structure mounted on the moveable platform. The containment structure has at least one aperture and a respective contact surface arranged around the perimeter of the aperture. The contact surface is arranged to make contact with the external surface to define a working volume, when the containment structure is positioned proximal to the external surface. The decontamination apparatus includes a decontamination device arranged to decontaminate the external surface. The decontamination device is arranged within the working volume and arranged to access the external surface through the at least one aperture. There is also a vacuum system for generating a partial vacuum in the containment structure to apply a suction force to the external surface.

Disclosed is a substrate processing apparatus including: a holding unit configured to hold a substrate; a processing liquid supply unit configured to supply a first processing liquid and a second processing liquid to the substrate; a first cup configured to recover the first processing liquid; a second cup disposed adjacent to the first cup and configured to recover the second processing liquid; a recovery portion defined by a peripheral wall portion that is erected on a bottom portion of the first cup; and a cleaning liquid supply unit configured to supply a cleaning liquid to the recovery portion. The peripheral wall portion is cleaned by causing the cleaning liquid supplied by the cleaning liquid supply unit to overflow from the peripheral wall portion to the second cup side.

In order to clean the webs in a belt buffer having a plurality of belts arranged one above the other, a cleaning medium is applied to a running belt by means of a cleaning device and vacuumed off together with the loosened contamination. A device for carrying out this cleaning has a cleaning head for applying and vacuuming off the cleaning medium and a device for adjusting the height of the cleaning head to the level of the web to be cleaned and to move the cleaning head over the web to be cleaned.

The present invention provides techniques to more accurately control the process performance of treatments in which microelectronic substrates are treated by pressurized fluids that are sprayed onto the substrates in a vacuum process chamber. control strategies are used that adjust mass flow rate responsive to pressure readings in order to hold the pressure of a pressurized feed constant. In these embodiments, the mass flow rate will tend to vary in order to maintain pressure uniformity.

A cleaning device for removing contamination on a substrate holder used with an electroplating cell includes an arm, a cleaning agent supplier, a nozzle and a receiver. The cleaning agent supplier is coupled to the arm and configured to supply a cleaning agent. The nozzle is coupled to the cleaning agent supplier and configured to spray the cleaning agent onto the substrate holder to remove the contamination. The receiver is coupled to the arm and configured to receive the cleaning agent after the cleaning agent is sprayed onto the substrate holder.

An apparatus and a method for cleaning a partial area of a substrate, in particular a photomask, are described. The apparatus has a cleaning head having a lower surface configured to be arranged above and in close proximity to the substrate area to be cleaned, the lower surface having a central opening formed therein, a first annular groove, surrounding the central opening, and at least a second groove, arranged between the first annular groove and the central opening, the first annular groove being fluidly connected to a first port allowing connection to an external supply source and the second annular groove being fluidly connected to a second port allowing connection to an external supply source, a tape supply mechanism arranged to supply an abrasive tape to the central opening in the lower surface of the cleaning head, such that a portion of the abrasive tape protrudes therefrom and a liquid media conduit having an outlet arranged to supply a liquid to a backside of the abrasive tape at or at the vicinity of the central opening. In the method a protruding portion of an abrasive tape, which protrudes from a central opening of a cleaning head is placed in contact with the area of the substrate to be cleaned to thereby bring a lower surface of the cleaning head in close proximity to the substrate area to be cleaned. A liquid is supplied to a backside of the abrasive tape at or at the vicinity of the central opening of the cleaning head, such that at least the portion of the abrasive tape protruding from the central opening is wetted, and a relative movement is caused between the abrasive tape and the surface area of the substrate to be cleaned. The method also encompasses applying a cleaning fluid to the substrate area to be cleaned via at least one first groove or the at least one second groove in the lower surface of the substrate and applying a suction force to the other groove.

The disclosed preferred embodiment of the handrail cleaning device comprises a flexible bar which uses spring resilience force to press one or more reusable or disposable cleaning pads against the moving handrail of an escalator. The apparatus provides a lightweight, low cost apparatus that is simple to set-up and use and requires no external power. Additionally, the device is capable of cleaning and treating the handrails of common escalators during operation of the escalator. The device utilizes the motion of the escalator to perform the cleaning action. The simplicity of the device allows for multiple devices to be used simultaneously by a single operator.

A cleaning vehicle generally has a grey water reservoir having a pre-filter; an aspiration conduit leading into the grey water reservoir upstream from the pre-filter and a vacuum pump adapted to create a vacuum inside the grey water reservoir to draw grey water; a vortex separation subsystem connected downstream from the pre-filter; a filtration bag subsystem connected downstream from the vortex separation subsystem; a filtrate reservoir connected downstream from the filtration bag subsystem; a high pressure hose having an end connected downstream from the filtrate reservoir and another end having a high pressure spray nozzle; a filtrate path extending from the grey water reservoir to the high pressure spray nozzle via the pre-filter, the vortex separation subsystem, the filtration bag subsystem and the high pressure hose; and at least one pump adapted to entrain a flow of fluid along the filtrate path.

The disclosed preferred embodiment of the handrail cleaning device comprises a flexible bar which uses spring resilience force to press one or more reusable or disposable cleaning pads against the moving handrail of an escalator. The apparatus provides a lightweight, low cost apparatus that is simple to set-up and use and requires no external power. Additionally, the device is capable of cleaning and treating the handrails of common escalators during operation of the escalator. The device utilizes the motion of the escalator to perform the cleaning action. The simplicity of the device allows for multiple devices to be used simultaneously by a single operator.