A mixture for making a multilayer inductor, wherein the mixture comprises a first magnetic powder, a second magnetic powder, and a glass material, wherein each of the first magnetic powder and the second magnetic powder comprises an amorphous or nanocrystalline magnetic powder, wherein a softening point temperature of the glass material is in a range of 300°˜430° C.

Copper particles are provided that each include a core particle made of copper and a coating layer that coats the surface of the core particle, wherein the coating layer is made of a copper salt of an aliphatic organic acid. It is also preferable that the copper particles have an infrared absorption peak in a range of 1504 to 1514 cm.sup.−1 and no infrared absorption peak in a range of 1584 to 1596 cm.sup.−1. It is also preferable that, in thermogravimetric analysis of the copper particles, the temperature at which the ratio of the mass loss value to the mass loss value at 500° C. reaches 10% is from 150° C. to 220° C. A method is also provided for producing copper particles, the method including bringing core particles made of copper into contact with a solution containing a copper salt of an aliphatic organic acid to thereby coat the surface of the core particles.

Described herein are embodiments directed to additive manufacturing (AM), including three-dimensional (3D) printing, of metal nitride ceramics. In some embodiments herein, AM may comprise powder bed fusion (PBF) techniques. Also described herein are metal nitride ceramic components formed by AM techniques and methods for forming metal nitrides capable of being used in AM processes.

Described herein are embodiments directed to additive manufacturing (AM), including three-dimensional (3D) printing, of metal nitride ceramics. In some embodiments herein, AM may comprise powder bed fusion (PBF) techniques. Also described herein are metal nitride ceramic components formed by AM techniques and methods for forming metal nitrides capable of being used in AM processes.

A method for treating additive manufacturing powder particles is provided. The method includes exposing the additive manufacturing powder particles to plasma radiation, where the plasma radiation forms functional groups, on surfaces of the additive manufacturing powder particles, having molecular bonds that vibrate in response to irradiation by laser energy of an additive manufacturing process, and moving the additive manufacturing powder particles to expose the additive manufacturing powder particles to the plasma radiation.

A method for treating additive manufacturing powder particles is provided. The method includes exposing the additive manufacturing powder particles to plasma radiation, where the plasma radiation forms functional groups, on surfaces of the additive manufacturing powder particles, having molecular bonds that vibrate in response to irradiation by laser energy of an additive manufacturing process, and moving the additive manufacturing powder particles to expose the additive manufacturing powder particles to the plasma radiation.

A passivation device for passivating filter residues of a filter device arranged in a process gas circuit of an additive manufacturing apparatus includes a reaction unit having an inlet suitable for supplying an oxidant, a coupling unit adapted to be coupled to the filter device for introducing filter residues into the reaction unit, a discharge unit suitable for discharging passivated filter residues from the reaction unit, and an energy supply unit suitable for effecting a reaction between the filter residues and the oxidant in the reaction unit.

A passivation device for passivating filter residues of a filter device arranged in a process gas circuit of an additive manufacturing apparatus includes a reaction unit having an inlet suitable for supplying an oxidant, a coupling unit adapted to be coupled to the filter device for introducing filter residues into the reaction unit, a discharge unit suitable for discharging passivated filter residues from the reaction unit, and an energy supply unit suitable for effecting a reaction between the filter residues and the oxidant in the reaction unit.

A passivation device for passivating filter residues of a filter device arranged in a process gas circuit of an additive manufacturing apparatus includes a reaction unit having an inlet suitable for supplying an oxidant, a coupling unit adapted to be coupled to the filter device for introducing filter residues into the reaction unit, a discharge unit suitable for discharging passivated filter residues from the reaction unit, and an energy supply unit suitable for effecting a reaction between the filter residues and the oxidant in the reaction unit.

A samarium-iron-nitrogen based magnet, wherein a samarium oxide phase is formed on at least a part of a surface of a crystal grain, and wherein an atomic ratio of calcium to a total amount of iron group elements, rare earth elements, and calcium is 0.4% or less.