Patent classifications
B23K26/035
Laser Processing Method and Laser Processing Apparatus
The object of the present invention is to achieve the combination processing that accelerates the processing speed while keeping the accuracy of finishing. In the combination processing consisting combination of stationary processing and synchronization processing, the processing of the section in the rows in an processing area is performed from a first end to a second end of a row, and then from the second end to the first end of the next row so that the processing is performed from side to side. The stationary processing is performed in sections having relatively low processing densities and the synchronization processing is performed in the other sections than the sections for the stationary processing.
Laser Processing Method and Laser Processing Apparatus
The object of the present invention is to achieve the combination processing that accelerates the processing speed while keeping the accuracy of finishing. In the combination processing consisting combination of stationary processing and synchronization processing, the processing of the section in the rows in an processing area is performed from a first end to a second end of a row, and then from the second end to the first end of the next row so that the processing is performed from side to side. The stationary processing is performed in sections having relatively low processing densities and the synchronization processing is performed in the other sections than the sections for the stationary processing.
LASER MACHINING METHOD AND LASER MACHINING DEVICE
A method for performing cutting machining by applying a laser beam to the surface of a base material formed from a composite material and cutting the base material to be cut out a product from the base material, a machining line, serving as a boundary between the product to be cut out and a remainder which is the base material after the product is cut out, is set to the base material before the cutting machining, and a plurality of machining paths along the machining line are set to be arranged from the machining line side to the remainder side with the machining line side as a reference. In the cutting machining, the base material is cut by repeatedly executing a laser beam application step for applying the laser beam to the surface of the base material on the basis of the plurality of machining paths having been set.
LASER MACHINING METHOD AND LASER MACHINING DEVICE
A method for performing cutting machining by applying a laser beam to the surface of a base material formed from a composite material and cutting the base material to be cut out a product from the base material, a machining line, serving as a boundary between the product to be cut out and a remainder which is the base material after the product is cut out, is set to the base material before the cutting machining, and a plurality of machining paths along the machining line are set to be arranged from the machining line side to the remainder side with the machining line side as a reference. In the cutting machining, the base material is cut by repeatedly executing a laser beam application step for applying the laser beam to the surface of the base material on the basis of the plurality of machining paths having been set.
LASER PROCESSING HEAD AND LASER PROCESSING MACHINE
A laser processing head includes a tubular main body, and a gas supply part disposed in the main body and allowing an assist gas supplied from outside to flow into an internal space of the main body. The gas supply part includes a first gas supply hole extending along a first axis on a plane orthogonal to an axis of a tube of the main body and opening at an inner circumferential surface of the main body, a second gas supply hole forming a predetermined angle relative to the first axis around the axis extending along a second axis on the plane orthogonal to the axis and opening at the inner circumferential surface, and a flow path forming ring facing the inner circumferential surface with a predetermined interval, and forming a cylindrical space extending along the axis between the flow path forming ring and the inner circumferential surface.
LASER PROCESSING HEAD AND LASER PROCESSING MACHINE
A laser processing head includes a tubular main body, and a gas supply part disposed in the main body and allowing an assist gas supplied from outside to flow into an internal space of the main body. The gas supply part includes a first gas supply hole extending along a first axis on a plane orthogonal to an axis of a tube of the main body and opening at an inner circumferential surface of the main body, a second gas supply hole forming a predetermined angle relative to the first axis around the axis extending along a second axis on the plane orthogonal to the axis and opening at the inner circumferential surface, and a flow path forming ring facing the inner circumferential surface with a predetermined interval, and forming a cylindrical space extending along the axis between the flow path forming ring and the inner circumferential surface.
Laser Irradiation Device, Laser Irradiation System, and Method for Removing Coating or Adhering Matter
In order to provide a laser irradiation system, a method for removing a coating, and a laser irradiation apparatus capable of efficiently removing a coating on a surface of a structure and recovering the removed substance using suction, a laser head (3) is configured from an optical system (4) for irradiating laser beam (30), a suctioning means (33) for suctioning removed matter (60) produced at the point where the laser beam (30) is directed, and an attachment (5) configured to be capable of abutting a surface (20) of a structure, the optical system (4) being operated to scan the irradiation point of the laser beam so as to draw a trajectory of a circle having a radius r1 around the optical axis of the laser beam (30) on a surface substantially perpendicular to the optical axis.
Thermal processing of closed shape workpieces
Systems and methods for heat treating closed shape workpieces are provided. In one example implementation, a method can include imparting relative motion of the closed shape workpiece such that the perimeter surface of the closed shape workpiece is moved relative to the lamp heat source from a first position where a first portion of the closed shape workpiece is presented to the lamp heat source to a second position where a second portion of the closed shape workpiece is presented to the lamp heat source. The method can include emitting lamp heat onto the perimeter surface of the closed shape workpiece from the lamp heat source during imparting of relative motion of the closed shape workpiece. The method can include implementing a flux control procedure during emitting of lamp heat onto the perimeter surface of the closed shape workpiece.
Method for Controlling Stress in a Substrate During Laser Deposition
The invention relates to a method for controlling stress in a substrate during laser deposition. The method includes the steps of: providing a laser deposition device including a chamber with a target holder with a target, a substrate holder with a substrate facing the target and a window, the laser deposition device further including a laser beam directed through the window of the chamber onto a spot at the target for generating a plasma plume of target material and depositing the target material onto a surface portion of the substrate in order to form a thin film of target material, wherein the target spot is movable relative to the substrate in order to deposit target material onto a plurality of surface portions of the substrate; defining a plurality of discrete surface portions on the substrate; aligning the target spot one after the other with each of the plurality of discrete surface portions and generating a plasma plume to deposit target material on each of the plurality of discrete surface portions; and adjusting at least one of the parameters of the deposition process depending on the discrete surface portion with which the target spot is aligned, which parameters include temperature, pressure, laser beam pulse duration, laser beam power, distance of target to substrate.
Method for Controlling Stress in a Substrate During Laser Deposition
The invention relates to a method for controlling stress in a substrate during laser deposition. The method includes the steps of: providing a laser deposition device including a chamber with a target holder with a target, a substrate holder with a substrate facing the target and a window, the laser deposition device further including a laser beam directed through the window of the chamber onto a spot at the target for generating a plasma plume of target material and depositing the target material onto a surface portion of the substrate in order to form a thin film of target material, wherein the target spot is movable relative to the substrate in order to deposit target material onto a plurality of surface portions of the substrate; defining a plurality of discrete surface portions on the substrate; aligning the target spot one after the other with each of the plurality of discrete surface portions and generating a plasma plume to deposit target material on each of the plurality of discrete surface portions; and adjusting at least one of the parameters of the deposition process depending on the discrete surface portion with which the target spot is aligned, which parameters include temperature, pressure, laser beam pulse duration, laser beam power, distance of target to substrate.