Embodiments of the present invention are directed to a surface modified metal piece comprising a first major surface, wherein at least one portion of the first major surface: comprises the reaction product of a surface modifier; has a random micro- and nanoscale structure; and has at least one of a water contact angle when exposed to water of at least about 120 and a spectral reflectance of less than about 25% within the visible spectrum. Other embodiments relate to processes and methods for making such a surface modified metal piece.

A method and a device for increasing a laser induced shock wave pressure. According to the method, plasmas (21) are generated by impinging an aluminium foil (20) using lasers; a high-voltage pulse electrode (22) discharges to the plasmas (21) to induce and form a photoelectric combined energy field and then high-temperature plasmas (21) having the characteristics of an ultra-high density and an ultra-high speed expansion are induced and generated; a surface to be processed is impacted by the high-temperature plasmas (21) in a restrained state; the laser induced shock wave pressure is increased substantially; the surface of a high-strength material is reinforced, and the strength, hardness, abrasion resistance and anti-fatigue performances of the high-strength material are improved. The device comprises a laser, the electrode (22), a high-voltage power supply (4), a discharging medium (12), a moving platform, etc.

A method for processing a transparent workpiece includes applying a fluid film having a first refractive index to a impingement surface of the transparent workpiece that has a second refractive index. Further, a difference between the first refractive index and the second refractive index is about 0.8 or less and the impingement surface comprises a surface roughness Ra of about 0.1 ?m or greater. The method also includes forming a defect in the transparent workpiece by directing a laser beam oriented along a beam pathway and output by a beam source, through the fluid film, through the impingement surface, and into the transparent workpiece such that a portion of the laser beam directed into the transparent workpiece generates an induced absorption within the transparent workpiece, the induced absorption producing the defect within the transparent workpiece.

A method for processing a transparent workpiece includes applying a fluid film having a first refractive index to a impingement surface of the transparent workpiece that has a second refractive index. Further, a difference between the first refractive index and the second refractive index is about 0.8 or less and the impingement surface comprises a surface roughness Ra of about 0.1 ?m or greater. The method also includes forming a defect in the transparent workpiece by directing a laser beam oriented along a beam pathway and output by a beam source, through the fluid film, through the impingement surface, and into the transparent workpiece such that a portion of the laser beam directed into the transparent workpiece generates an induced absorption within the transparent workpiece, the induced absorption producing the defect within the transparent workpiece.

Method and devices are disclosed for device manufacture of gallium nitride devices by growing a gallium nitride layer on a silicon substrate using Atomic Layer Deposition (ALD) followed by rapid thermal annealing. Gallium nitride is grown directly on silicon or on a barrier layer of aluminum nitride grown on the silicon substrate. One or both layers are thermally processed by rapid thermal annealing. Preferably the ALD process use a reaction temperature below 550 C. and preferable below 350 C. The rapid thermal annealing step raises the temperature of the coating surface to a temperature ranging from 550 to 1500 C. for less than 12 msec.

Method and devices are disclosed for device manufacture of gallium nitride devices by growing a gallium nitride layer on a silicon substrate using Atomic Layer Deposition (ALD) followed by rapid thermal annealing. Gallium nitride is grown directly on silicon or on a barrier layer of aluminum nitride grown on the silicon substrate. One or both layers are thermally processed by rapid thermal annealing. Preferably the ALD process use a reaction temperature below 550 C. and preferable below 350 C. The rapid thermal annealing step raises the temperature of the coating surface to a temperature ranging from 550 to 1500 C. for less than 12 msec.

A system for material-ablative laser processing of workpieces in liquid is provided with a laser beam source for generating pulsed laser radiation; a focusing unit for focusing the laser radiation onto a workpiece; and a process chamber for receiving a workpiece. The process chamber includes a first side having a transparent process window for letting pass laser radiation; a second side arranged opposite the first side; a chamber wall surrounding an interior of the process chamber; and a flow generator for generating a flow within the interior of the process chamber. The flow generator includes a first flow generator unit for generating a first flow along a first flow axis and a second flow generator unit for generating a second flow along a second flow axis; and a positioning unit for adjusting the position of the laser radiation on the workpiece.

A method of monitoring an operation status of a confined laser cutting tool includes emitting light in the form of laser beams from a laser source. The method includes using a nozzle to form a confining column composed of a liquid. The method further includes forming a confined laser beam, the confined laser beam defined by the confluence of the laser beams and the confining column. The method also includes sensing a characteristic of the confined laser beam with a sensor. The method further includes determining the operation status of the confined laser cutting tool based on the sensed characteristic of the confined laser beam. The method also includes deactivating the laser source when the sensed characteristic of the confined laser beam reaches a predetermined threshold. The method may also include providing an operator notification after deactivating the laser source.

A tool and related method for removing unwanted gas hydrates from the surface of equipment used in subsea exploration and production. The tool includes a main vessel and a power cable linked together by a connector. Inside the vessel a laser device is connected to an adjustable focus collimator by a cable, with the wavelength emitted by the laser being between 200 nm and 930 nm. When the radiation reaches the subsea exploration equipment it causes the heating thereof, which in turn heats the hydrate through conduction, breaking down the hydrate formation from the inside out. The front lid of the tools includes a window fitted with anti-reflection film that forms an interface between the vessel and the aqueous medium.

A tool and related method for removing unwanted gas hydrates from the surface of equipment used in subsea exploration and production. The tool includes a main vessel and a power cable linked together by a connector. Inside the vessel a laser device is connected to an adjustable focus collimator by a cable, with the wavelength emitted by the laser being between 200 nm and 930 nm. When the radiation reaches the subsea exploration equipment it causes the heating thereof, which in turn heats the hydrate through conduction, breaking down the hydrate formation from the inside out. The front lid of the tools includes a window fitted with anti-reflection film that forms an interface between the vessel and the aqueous medium.