B23K26/38

METHOD FOR BUTT WELDING AT LEAST TWO METAL SHEETS

The present invention relates to a method for butt welding at least two metal sheets, namely a first metal sheet and a second metal sheet, wherein, in particular, a tailored blank is produced from the metal sheets.

METHOD AND DEVICE FOR DETERMINING AN ACTUAL STATE OF SUPPORTING BARS OF A WORKPIECE SUPPORT, AND MACHINE TOOL HAVING A DEVICE OF THIS TYPE

A method determines an actual state of a supporting bar for supporting a plate-like workpiece on a machine tool for a cutting the workpiece. The method includes: determining a geometry of supporting projections on the supporting bar by a light section method, which includes: projecting a longitudinal line of light onto a longitudinal side of the supporting bar; with the line of light, scanning the longitudinal side over a height region assigned to the supporting projections in the direction of the height of the supporting bar, detecting the scanned extent of the longitudinal side of the supporting bar to generate an image of the longitudinal side of the supporting bar, and determining the geometry of the supporting projections based on the generated image; and comparing the determined geometry of the supporting projections with the defined intended geometry of the supporting projections.

METHOD AND DEVICE FOR DETERMINING AN ACTUAL STATE OF SUPPORTING BARS OF A WORKPIECE SUPPORT, AND MACHINE TOOL HAVING A DEVICE OF THIS TYPE

A method determines an actual state of a supporting bar for supporting a plate-like workpiece on a machine tool for a cutting the workpiece. The method includes: determining a geometry of supporting projections on the supporting bar by a light section method, which includes: projecting a longitudinal line of light onto a longitudinal side of the supporting bar; with the line of light, scanning the longitudinal side over a height region assigned to the supporting projections in the direction of the height of the supporting bar, detecting the scanned extent of the longitudinal side of the supporting bar to generate an image of the longitudinal side of the supporting bar, and determining the geometry of the supporting projections based on the generated image; and comparing the determined geometry of the supporting projections with the defined intended geometry of the supporting projections.

System and method for laser beveling and/or polishing

Laser processing of hard dielectric materials may include cutting a part from a hard dielectric material using a continuous wave laser operating in a quasi-continuous wave (QCW) mode to emit consecutive laser light pulses in a wavelength range of about 1060 nm to 1070 nm. Cutting using a QCW laser may be performed with a lower duty cycle (e.g., between about 1% and 15%) and in an inert gas atmosphere such as nitrogen, argon or helium. Laser processing of hard dielectric materials may further include post-cut processing the cut edges of the part cut from the dielectric material, for example, by beveling and/or polishing the edges to reduce edge defects. The post-cut processing may be performed using a laser beam with different laser parameters than the beam used for cutting, for example, by using a shorter wavelength (e.g., 193 nm excimer laser) and/or a shorter pulse width (e.g., picosecond laser).

System and method for laser beveling and/or polishing

Laser processing of hard dielectric materials may include cutting a part from a hard dielectric material using a continuous wave laser operating in a quasi-continuous wave (QCW) mode to emit consecutive laser light pulses in a wavelength range of about 1060 nm to 1070 nm. Cutting using a QCW laser may be performed with a lower duty cycle (e.g., between about 1% and 15%) and in an inert gas atmosphere such as nitrogen, argon or helium. Laser processing of hard dielectric materials may further include post-cut processing the cut edges of the part cut from the dielectric material, for example, by beveling and/or polishing the edges to reduce edge defects. The post-cut processing may be performed using a laser beam with different laser parameters than the beam used for cutting, for example, by using a shorter wavelength (e.g., 193 nm excimer laser) and/or a shorter pulse width (e.g., picosecond laser).

Laser processing device and laser processing method

Laser processing device (1) includes: laser-beam switching apparatus (70) that switches between a first optical path and a second optical path as an optical path along which a laser beam is to travel, the first optical path including first fiber (11), the second optical path including second fiber (21) that has a core diameter that is larger than a core diameter of first fiber (11); and processing head (80) that illuminates a same processed point on workpiece (900) with a laser beam that has passed through the first optical path or the second optical path. When illumination with laser beam that has passed through the first optical path is performed for a predetermined period of time, laser-beam switching apparatus (70) switches from the first optical path to the second optical path.

Laser processing device and laser processing method

Laser processing device (1) includes: laser-beam switching apparatus (70) that switches between a first optical path and a second optical path as an optical path along which a laser beam is to travel, the first optical path including first fiber (11), the second optical path including second fiber (21) that has a core diameter that is larger than a core diameter of first fiber (11); and processing head (80) that illuminates a same processed point on workpiece (900) with a laser beam that has passed through the first optical path or the second optical path. When illumination with laser beam that has passed through the first optical path is performed for a predetermined period of time, laser-beam switching apparatus (70) switches from the first optical path to the second optical path.

Stage for cutting substrate and substrate cutting device

A stage for cutting a substrate includes: a body member; a plurality of first discharging members, each including a first suction portion in the body member and a first partition wall portion connected to the first suction portion and protruding from a top surface of the body member, each of the first discharging members defining a first space connected to an outside; a plurality of second discharging members, each including a second suction portion in the body member and a second partition wall portion connected to the second suction portion and protruding from the top surface of the body member, each of the second discharging members defining a second space connected to the outside; a plurality of connecting pipes each connected to the first partition wall portion and the second partition wall portion; and a plurality of supply pipes connected to the connecting pipes.

Stage for cutting substrate and substrate cutting device

A stage for cutting a substrate includes: a body member; a plurality of first discharging members, each including a first suction portion in the body member and a first partition wall portion connected to the first suction portion and protruding from a top surface of the body member, each of the first discharging members defining a first space connected to an outside; a plurality of second discharging members, each including a second suction portion in the body member and a second partition wall portion connected to the second suction portion and protruding from the top surface of the body member, each of the second discharging members defining a second space connected to the outside; a plurality of connecting pipes each connected to the first partition wall portion and the second partition wall portion; and a plurality of supply pipes connected to the connecting pipes.

Substrate processing apparatus and substrate processing method

A substrate processing apparatus includes the following: a support frame, first stage, a suction part, and a plurality of island-type second stages. The support frame is disposed on the first stage. The height of the support frame is lower than the height of the first stage. A plurality of island-type second stages are disposed on the support frame on the same plane as the first stage. The suction part is disposed on the support frame.