A method for evacuating a volume below a substrate in a substrate processing system includes arranging the substrate on a lift mechanism of a substrate support to define the volume below the substrate between the substrate and an upper surface of the substrate support. An evacuation step is initiated to evacuate the volume below the substrate. The evacuation step includes pumping down the volume below the substrate at least one of through and around the lift mechanism. The lift mechanism is lowered during the evacuation step to position the substrate on the upper surface of the substrate support and the evacuation step is terminated.

A switch housing body has a base and a sidewall having an axis and extending from the base to a rim and having a pair of axial slots. A switch cap has: a cap body having a top web; and a sidewall extending from the top web to a rim and having a pair of holes. A shaft passes through the pair of axial slots and pair of holes. A spring biases the cap axially away from the housing from a compressed condition to an extended condition. A cap electrical contact and a housing electrical contact have an electrically closed condition at the compressed condition.

A wafer carrier comprises a first foil, a second foil, and a chamber between the first and the second foil. The first foil has a perforation and is used for carrying the wafer. The first and the second foil are connected to each other so as to form the chamber. The chamber is configured to be evacuated to form a vacuum in the chamber, the vacuum causes an underpressure at the perforation, the underpressure forms a carrying force to the wafer to be carried.

A worktable for laser processing includes a lower plate, internal blocks, and external blocks. The lower plate includes a first area, a second area surrounding the first area, and a third area surrounding the second area. The internal blocks are disposed on the lower plate in the first area and the external blocks are disposed on the lower plate in the third area. The external blocks surround the internal blocks.

A substrate processing apparatus includes a processing chamber and a rotating mechanism. The rotating mechanism is configured to rotate about a center axis of a shaft, where the shaft includes a flow path configured to flow gases through the shaft.

The invention relates to a workpiece carrier for arrangement in a machine tool. The workpiece carrier includes multiple pneumatic workpiece holders as well as a compressed air reservoir, pneumatic valves, a control unit, and an accumulator as a voltage supply, so that the workpiece carrier can hold a plurality of workpieces and be wirelessly activated by an external robot controller in order to clamp workpieces in the workpiece holders or remove workpieces therefrom.

A worktable system includes a base stage extending in a first direction and a second direction intersecting the first direction, and having a first stroke length, and a plurality of first stages disposed on the base stage adjacent to each corner portion of the base stage, and the plurality of first stages move in the first direction and the second direction by a second stroke length that is smaller than the first stroke length.

A workpiece holding apparatus includes: a main body; at least one shaft member capable of coming into contact with a workpiece; a clamping device into which the shaft member is inserted, the clamping device being attached to the main body and capable of switching between an unclamping state that releases the shaft member and a clamping state that clamps the shaft member; and a trigger member configured to switch the clamping device between the unclamping state and the clamping state. The trigger member comes into direct contact with the workpiece, or comes into indirect contact with the workpiece via at least a part of the shaft member, thus moving relative to the main body, and the clamping device switches from the unclamping state to the clamping state.

A workpiece carriage for workpiece transport includes a guide unit oriented in a longitudinal direction, a drive unit having an electrical supply and a drive motor, and a workpiece gripping unit having two clamping jaws movable relative to one another. A machine tool includes at least one workpiece table, with at least one tool unit movable relative to the workpiece table and with at least two workpiece carriages that are displaceable individually in the longitudinal direction along a machine bed of the machine tool. A manufacturing cell includes such a machine tool and a workpiece supply. The two clamping jaws of the workpiece gripping unit can be displaced relative to one another in a height direction oriented normal to the longitudinal direction and normal to a transverse direction oriented normal to the longitudinal direction. This expands the possible applications of the workpiece carriage.

The present invention provides a substrate treating apparatus, including: a treatment container having a treatment space therein; a support unit for supporting and rotating the substrate in the treatment space; and a liquid supply unit for supplying a liquid onto the substrate, in which wherein the support unit includes: a body on which the substrate is seated; and a support shaft coupled to the body, and an upper surface of the body is provided with a central portion including a center of the body and an edge portion surrounding the central portion, and a vacuum hole is formed in the central portion, and a groove is formed in the edge portion.