A method for the dressing of a multi-thread grinding worm by a dressing roll, wherein the grinding worm has at least two screw channels which are arranged parallel to another, which screw channels extend helically around an axis of the grinding worm and wherein the dressing roll has at least two adjacent dressing profiles which are arranged along an axis of the dressing roll, wherein the dressing profiles of the dressing roll are guided simultaneously through adjacent screw channels of the grinding worm during the dressing of the grinding worm. To improve the precision of the dressing the method includes the steps: a) execution of a first partial dressing process at which the dressing profiles of the dressing roll are guided simultaneously through first adjacent screw channels of the grinding worm; b) execution of at least one second partial dressing process at which the dressing profiles of the dressing roll are guided simultaneously through second adjacent screw channels of the grinding worm, wherein the second adjacent screw channels are, compared with step a), offset in the direction of the axis of the grinding worm by at least one screw channel of the grinding worm.

A method of manufacturing a rotary abrasive machining tool, the rotary abrasive machining tool including a hub and a plurality of abrasive segments mounted to the hub, the method including the steps of: mounting each abrasive segment on the hub; machining an abrading edge on each abrasive segment while the abrasive segment is mounted on the hub.

A method of manufacturing a rotary abrasive machining tool, the rotary abrasive machining tool including a hub and a plurality of abrasive segments mounted to the hub, the method including the steps of: mounting each abrasive segment on the hub; machining an abrading edge on each abrasive segment while the abrasive segment is mounted on the hub.

A wheel outer rim fillet dressing device, wherein after a wheel is roughly positioned, an electric cylinder drives a moving plate to descend to an appropriate position, an adjusting cylinder drives a second sliding table to move away from a first sliding table, the first sliding table moves synchronously with the second sliding table under the action of a second gear rack, thus the distance between a precision positioning post on the first sliding table and a precision positioning post on the second sliding table is adjusted, and the precision positioning posts contact a vertical surface of a cap seam allowance of the wheel and hold the wheel tightly. The adjusting cylinder is restarted, and the outer rim fillets can be dressed when the distance between first and second cutters for dressing wheel outer rim fillets is adjusted to an appropriate position and under the cooperation of the rotating wheel.

A wheel outer rim fillet dressing device, wherein after a wheel is roughly positioned, an electric cylinder drives a moving plate to descend to an appropriate position, an adjusting cylinder drives a second sliding table to move away from a first sliding table, the first sliding table moves synchronously with the second sliding table under the action of a second gear rack, thus the distance between a precision positioning post on the first sliding table and a precision positioning post on the second sliding table is adjusted, and the precision positioning posts contact a vertical surface of a cap seam allowance of the wheel and hold the wheel tightly. The adjusting cylinder is restarted, and the outer rim fillets can be dressed when the distance between first and second cutters for dressing wheel outer rim fillets is adjusted to an appropriate position and under the cooperation of the rotating wheel.

Provided is a formed rotary dresser that has regions in which diamond abrasive grains are scattered and arranged on an outer circumferential surface thereof brought into contact with a grindstone, and slit regions in which the diamond abrasive grains are not arranged on the outer circumferential surface thereof. The plurality of slit regions are provided to be inclined with respect to a rotational axis. A plurality of octahedral diamond abrasive grains are arranged along downstream edges of the slit regions in a rotating direction such that any face of an octahedron is parallel with the outer circumferential surface.

Provided is a formed rotary dresser that has regions in which diamond abrasive grains are scattered and arranged on an outer circumferential surface thereof brought into contact with a grindstone, and slit regions in which the diamond abrasive grains are not arranged on the outer circumferential surface thereof. The plurality of slit regions are provided to be inclined with respect to a rotational axis. A plurality of octahedral diamond abrasive grains are arranged along downstream edges of the slit regions in a rotating direction such that any face of an octahedron is parallel with the outer circumferential surface.

The two piece spindle grinder fixture is adapted to minimize the size of the frame by a two piece spindle assembled into a frame having a bearing race formed between the frame and the two piece spindle. An angularity adjustable angle indicator mounted concentric with a spindle axis to allow the indicator to be adjusted relative to a part attached to the two piece spindle. A chuck or other holding tool may be mounted on the chuck end of the two piece spindle opposite a handle on a handle end.

The two piece spindle grinder fixture is adapted to minimize the size of the frame by a two piece spindle assembled into a frame having a bearing race formed between the frame and the two piece spindle. An angularity adjustable angle indicator mounted concentric with a spindle axis to allow the indicator to be adjusted relative to a part attached to the two piece spindle. A chuck or other holding tool may be mounted on the chuck end of the two piece spindle opposite a handle on a handle end.

An example system for monitoring contamination level of effluent of an offline brush conditioning system includes a first reservoir configured to collect a first effluent from a first portion of a brush in the offline brush conditioning system and a second reservoir configured to collect a second effluent from a second portion of the brush, where the second portion is different from the first portion, and the first and second effluents are from a fluid used to condition a brush configured to clean a surface of a semiconductor wafer. An effluent contamination monitor is configured to monitor a first contamination level of the first effluent and a second contamination level of the second effluent.