An orthopedic device, such as an intramedullary nail for internal fixation of a bone and a method of manufacturing the same. The orthopedic device may be formed from a medical grade powder via an additive manufacturing process. The forming process may include heat treating the additive manufactured component and machining the heat treated additive manufactured component to form the orthopedic device. Further, the orthopedic device may be formed to include an internal sensor probe channel that extends within at least a portion of the wall of the device, but which does not protrude through an outer portion of the wall. Embodiments further include a dynamizing intramedullary nail that accommodate adjustments in the relative axial positions of one or more sections of the orthopedic device. The devise may include features in an inner region of the orthopedic device that may alter an elastic modulus of the orthopedic device.

Embodiments of the present disclosure provide a surface treatment composition and methods for using same. The composition for removing contaminants from a metallic surface, can include 3 wt % to 40 wt % of at least one bifunctional alkaline compound, 0.03 wt % to 10 wt % of at least one oxidizer comprising a metal salt, and water, where all weight percentages are based on the total weight of the composition.

Some methods for making a granular material comprise crushing demetallized slag particles with one or more crushers and screening the crushed demetallized slag particles with one or more screens to separate the demetallized slag particles into two or more fractions, the granular material comprising at least one of the fractions of the demetallized slag particles. Prior to the crushing, ones of the demetallized slag particles having a size that is less than or equal to 2 inches can account for at least 90% of the demetallized slag particles. An iron-compound content of the demetallized slag particles, by weight, can be less than or equal to 10%. Crushing and screening can be performed such that ones of the demetallized slag particles of the granular material having a size that is less than or equal to 1.25 mm account for at least 90% of the demetallized slag particles of the granular material.

An apparatus for removing a coating from a substrate comprises a nozzle with an inner conduit having an orifice and an outer conduit coaxially arranged about the inner conduit and defining an annular opening between the inner and outer conduits. The nozzle is configured to direct a liquid stream through the orifice toward the coated surface and direct a gas flow through the annular opening such that the gas flow surrounds the liquid stream as the liquid stream moves towards the coated surface.

Systems for cleaning a structure via a robot are described. The robot includes a body. The robot further includes a tool coupled to the body and configured to hold a structural maintenance tool. The robot includes a sensor coupled to the body. The robot includes a drive system configured to allow positioning of the body along the structure, including inverted positioning and vertical positioning. The robot further includes a communication interface coupled to the body. The robot includes a controller coupled to the body. The controller is in communication with the tool, the sensor, and the drive system. The controller is configured to receive an operating instruction through the communication interface. The controller is configured to autonomously position the body via the drive system and to perform a task with at least one of the tool and the sensor according to the operating instruction.

Silicon deposited by CVD and/or silico dust is removed from a polycrystalline silicon deposition reactor component by abrasion with silicon-containing particles in a gas stream.

A method for manufacturing a regenerated product includes a selection step for selecting a recovered regeneration object based on a first evaluation standard indicating a state of a surface of the regeneration object, a rust-removing step for performing a rust-removing treatment to the regeneration object selected by the selection step, and a judgement step for judging whether to terminate the rust-removing treatment in the rust-removing step based on a second evaluation standard indicating the state of the surface of the regeneration object.

Silicon deposited by CVD and/or silico dust is removed from a polycrystalline silicon deposition reactor component by abrasion with silicon-containing particles in a gas stream.

A non-oriented electrical steel sheet according to an embodiment of the present invention includes: a steel sheet base material containing, by wt %: 2.0 to 6.5% of Si, 0.1 to 1.3% of Al, 0.3 to 2.0% of Mn, 0.005 to 0.06% of Cr, and a balance of Fe and other inevitable impurities; and an insulating coating film positioned on the steel sheet base material, wherein Formula 1 below is satisfied before stress relief annealing, and Formula 2 below is satisfied after the stress relief annealing.

[00001]$\begin{array}{cc}0.1\left[\mathrm{Mn}\mathrm{coating}\mathrm{film}\right]/\left[\mathrm{Mn}50\right]& \left[\mathrm{Formula}1\right]\end{array}$$\begin{array}{cc}10\left[\mathrm{Mn}\mathrm{coating}\mathrm{film}\right]/\left[\mathrm{Mn}50\right]1& \left[\mathrm{Formula}2\right]\end{array}$ (in Formulas 1 and 2, [Mn coating film] refers to an average content of Mn (wt %) in the insulating coating film, and [Mn 50] refers to a content of Mn (wt %) at a depth of 50 m from an interface between the steel sheet base material and the insulating coating film toward an inside of the steel sheet base material.)

A mask cleaning apparatus and a mask cleaning method are provided. The mask cleaning method comprises: placing a mask (100) on a stage (20); and ejecting a dry ice particle group including a plurality of dry ice particles (101) toward a surface of the mask (100) at a speed of 340 m/s to 1000 m/s, within a cleaning time, wherein the plurality of dry ice particles (101) impact the surface of the mask (100) so as to remove a contaminant on the surface of the mask. Thereby, the mask cleaning apparatus and the mask cleaning method provided by embodiments of the present disclosure can remove the contaminant on the mask, without increasing a contamination medium and damaging the surface of the mask.