A Schiff base-containing chain extender may be a diol having a Schiff base or a derivative thereof, as well as a polyurethane produced using the same and a modification method thereof, and a polishing layer including a polyurethane and a polishing method using the polishing layer.

A grinding robot for grinding an electrically conducting workpiece. The grinding robot includes a grinding wheel, an actuation device for actuating grinding wheel, and a control system. The grinding wheel including an undulated tool receptacle which defines an axis of rotation about which the grinding wheel can rotate during grinding, and a head which is rotationally symmetrical with respect to the axis of rotation, and which contains abrasive material and has a grinding surface which is in contact with workpiece during grinding. The grinding wheel also includes a measuring and transmission unit and at least one conductor strand pair with two conductor strands which are electrically insulated from one another. The conductor strands are embedded in the rotationally symmetrical head and extend from the grinding surface of the head into the interior of the head and are electrically connected with measuring and transmission unit.

A buffing and polishing member has an uncompressed monolithic body of foam material having slits from an outside surface toward and less than a distance to a rotational axis of the body. The slits, on circumferential spaced planes, extend generally radially from the outside surface toward and less than a distance to the rotational axis to define a plurality of foam fingers and an unslit center portion. A fastening mechanism holds the center portion of the slit foam body in a compressed state along the rotational axis such that the uncompressed outer ends of the foam finger define a spherocylinder.

The present disclosure relates to saturated or primed abrasive article constructions containing an anti-loading composition which significantly reduces loading, is coatable, is durable, and is relatively inexpensive to manufacture. In particular, the use of the anti-loading compositions of the present disclosure as a size coat at least reduces if not eliminates the need for a supersize coat, while offering comparable if not superior performance and durability. The abrasive article further includes an anti-loading size layer comprising a size coat binder and wax at least partially disposed on the abrasive layer.

A buffing and polishing member has an uncompressed monolithic body of foam material having slits from an outside surface toward and less than a distance to a rotational axis of the body. The slits, on circumferential spaced planes, extend generally radially from the outside surface toward and less than a distance to the rotational axis to define a plurality of foam fingers and an unslit center portion. A fastening mechanism holds the center portion of the slit foam body in a compressed state along the rotational axis such that the uncompressed outer ends of the foam finger define a spherocylinder.

A plurality of abrasive particles can include a coating overlying at least a portion of a core. In an embodiment, the plurality of abrasive particles can include a sintered coating overlying the core, wherein the sintered coating can include an oxide material, and wherein more than 75% of the plurality of abrasive particles are fully covered. In another embodiment, the plurality of abrasive particles can include a sintered coating overlying the core, wherein the sintered coating can include an oxide material, and wherein more the plurality of abrasive particles can have an average coating coverage of greater than 85% of the surface of the core. In an embodiment, the plurality of abrasive particles can include an average coating thickness of not greater than 2 microns. In another embodiment, the plurality of abrasive particles can include a thickness standard deviation of the coating of not greater than 200% of the average coating thickness. In a particular embodiment, the coating can include sintered silica.

A compoundless buff and method of making a compoundless buff using a coating solution formulated with abrasive particles dispersed or suspended using a surfactant or suspension agent and which also contains a self-crosslinking acrylic binder emulsion that binds abrasive particles to nonwoven cloth of a buffing article when the coating solution is applied thereto forming a relatively hard abrasive-containing coating that enables the buffing article to abrasively treat a surface without having to separately apply any buffing or polishing compound. A preferred coating solution formulation further contains a lubricant emulsion that produces a lubricant and abrasive-containing coating of the buff having lubricant interspersed with binder and abrasive particles thereby reducing friction during buffing or polishing. A preferred coating solution also contains at least one surfactant to disperse the abrasive, suspension agent to keep the abrasive suspended, and buffering agent to keep the pH of the solution so it remains flowable.

The present invention relates to a grinding aid as well as a grinding method. Further, the present invention pertains to a titanium dioxide particle with a layer comprising a grinding aid as described herein and the use of said titanium dioxide particle in various applications.

The present invention relates to a polishing pad conditioner and a manufacturing method thereof. The polishing pad conditioner includes a substrate, an abrasive layer and a protective layer. The abrasive layer covers the surface of the substrate. The abrasive layer includes a bonding layer and a plurality of abrasive particles embedded in the bonding layer. Each of the abrasive particles has a protrusion exposed out of the bonding layer, and the protrusion is insulated. The protective layer covers the surface of the bonding layer, and the protrusion is exposed out of the protective layer. The polishing pad conditioner of the present invention can protect the bonding layer from being damaged by abrasion and hold the abrasive particles, avoid the abrasive particles from falling off or out of position, and maintain the polishing effect and service life of the polishing pad conditioner.

Provided is a polishing composition in which a polishing speed of silicon germanium is sufficiently high and a selection ratio of the polishing speed of silicon germanium is sufficiently high. A polishing composition includes: abrasive grains; an inorganic salt; and an oxidizing agent, in which the number of silanol groups per unit surface area of the abrasive grains is more than 0/nm.sup.2 and 2.0/nm.sup.2 or less, and a pH of the polishing composition is 6.0 or more.