A polishing pad is provided. The polishing pad, suitable for a polishing procedure using a slurry containing water, includes a polishing track region and a first reactant. The polishing track region includes a central region and a peripheral region surrounding the central region. The first reactant is disposed in the central region of the polishing track region, wherein the first reactant is able to react endothermically with the water in the slurry.

A method of transferring a shaped particle to a substrate includes providing a scrim of at least two elongate strands periodically joined together at flexible bond regions to form an array of apertures between the strands. The scrim is extended along at least one direction to increase the minimum dimension of the apertures. Shaped particles are applied to the extended scrim and at least a portion of the shaped particles enter in at least some of the apertures therein. The extended scrim is relaxed and frictionally retains the particles between the elongate strands. The particle loaded scrim is extended along at least one direction to release and transfer the shaped particles to the substrate in a predetermined orientation.

Nonwoven abrasive articles comprise a nonwoven abrasive member having an overlayer composition comprising a fatty acid metal salt disposed thereon adjacent to a working surface. The nonwoven abrasive member comprises abrasive particles adhered to a fiber web by a binder. The abrasive particles may be exposed and/or the nonwoven abrasive member may have suitable frictional properties. Methods of making the same are also disclosed.

Disclosed are an additive raw material composition and an additive for superhard material product, a composite binding agent, a superhard material product, a self-sharpening diamond grinding wheel and a method for manufacturing the same. The raw material composition consisting of components in following mass percentage: Bi.sub.2O.sub.3 25%40%, B.sub.2O.sub.3 25%40%, ZnO 5%25%, SiO.sub.2 2%10%, Al.sub.2O.sub.3 2%10%, Na.sub.2CO.sub.3 1%5%, Li.sub.2CO.sub.3 1%-5%, MgCO.sub.3 0%5%, and CaF.sub.2 1%5%. The composite binding agent is prepared from the additive and a metal composite binding agent. The self-sharpening diamond grinding wheel prepared from the composite binding agent has high self-sharpness, high strength, and fine texture, is uniformly consumed during the grinding process, does not need to be trimmed during the process of being used, and maintains good grinding force all the time, fundamentally solving the problems of long trimming time and high trimming cost of the diamond grinding wheel (FIG. 1).

A grinding robot for grinding an electrically conducting workpiece. The grinding robot includes a grinding wheel, an actuation device for actuating grinding wheel, and a control system. The grinding wheel including an undulated tool receptacle which defines an axis of rotation about which the grinding wheel can rotate during grinding, and a head which is rotationally symmetrical with respect to the axis of rotation, and which contains abrasive material and has a grinding surface which is in contact with workpiece during grinding. The grinding wheel also includes a measuring and transmission unit and at least one conductor strand pair with two conductor strands which are electrically insulated from one another. The conductor strands are embedded in the rotationally symmetrical head and extend from the grinding surface of the head into the interior of the head and are electrically connected with measuring and transmission unit.

A coated abrasive article (10) having a backing (12) and an abrasive coat (20) attached to the backing (12), the abrasive coat (20) comprising a cured abrasive slurry containing a plurality of abrasives particles, wherein the abrasive slurry is soluble such that it retains the abrasive particles on the backing (12) when in its solid state, and releases the abrasive particles from the backing (12) during the process of dissolution to a dissolved state.

In methods and systems of making an abrasive article, abrasive particles are loaded to a distribution tool including a plurality of upper walls defining a plurality of spacing slots, and a plurality of lower walls defining a plurality of distribution slots. The spacing slots are open to the distribution slots, which are open to a lower side of the tool. The loaded particles are spaced and distributed from the distribution tool to a major face of a backing web below the lower side and moving relative to the tool in a machine direction. The upper walls space the particles in the machine direction. The particles distributed by the lower walls undergo an orientation sequence in which each particle is oriented into a column aligned along the machine direction. The upper walls can be disposed oblique to the lower walls. The upper and lower walls can have pointed upper portions.

Provided are a quartz glass member with an increased exposure area, which has an increased exposure area to a film formation treatment gas as compared to a member having a flat surface and has the increased exposure area controlled so that a constant adsorption amount of the film formation treatment gas onto a surface thereof is achieved, a method for manufacturing the quartz glass member with an increased exposure area, and a blade with multiple peripheral cutting edges to be used for the method. The quartz glass member with an increased exposure area is a quartz glass member for exposure to a film formation treatment gas to be, in film formation treatment of a semiconductor substrate, placed in a reaction chamber together with the semiconductor substrate to be subjected to the film formation treatment and exposed to the film formation treatment gas, the quartz glass member including: a quartz glass member main body; and a plurality of irregularities formed on a surface of the quartz glass member main body, the exposure area of the quartz glass member to the film formation treatment gas being controlled and increased.

A polishing pad is provided. The polishing pad comprises a polishing layer and a metal-containing layer. The polishing layer has a polishing surface and a backside surface opposite to each other, wherein the backside surface has a plurality of cavities. The metal-containing layer is disposed on the backside surface of the polishing layer and fills into the cavities, wherein a first contact area is between the metal-containing layer and the backside surface of the polishing layer, and the first contact area is larger than the orthogonal projection area of the polishing layer.

A method for the surface treatment of workpieces by means of abrasive media, and a surface treatment composition. The method comprises the steps of providing a treatment tool, providing an abrasive medium, supplying a workpiece having a surface to be treated, surface treating the workpiece, involving removal of material and producing waste products, and processing the waste products, wherein at least one of said steps comprises adding an additive to lower a self-ignition tendency on the part of the waste products, the additive comprising a salt, composed of a carbonate and/or of a halogen anion.