An apparatus for monitoring a stream of droplets of target material for generating a radiation beam in a radiation source, wherein the apparatus comprises: a target material emitter for creating the stream of droplets of target material, wherein the target material emitter comprises a chamber configured for the target material to pass through before forming the stream of droplets; a first transducer configured to generate acoustic pressures in the chamber, and a second transducer configured to sense the acoustic pressures in the chamber.

A fluid control device (100) includes a structure (120) defining a valve cavity, a first fluid port (135), a second fluid port (140), and a third fluid port (145) configured to be fluidly coupled to a hermetic interior (105) of a body; and a plunger valve (130) within the valve cavity and configured to move between first and second modes while maintaining the hermetic interior of the body. In the first mode, the plunger valve is open such that a first fluid flow path is open between the hermetic interior and the first fluid port and fluid is free to pass between the first fluid port and the hermetic interior. In the second mode, the plunger valve is closed such that the first fluid port is blocked from the hermetic interior by the plunger valve and a second fluid flow path is open between the hermetic interior and the second fluid port.

The present invention relates to an on-axis type EUV light source device with a target material supply channel, including: a rotational disk having a rotational disk rim which melts a target material for generating EUV light through plasma reactions; a plurality of rotational disk ribs supporting the rotational disk rim so that EUV light penetrates relative to a predetermined area among a light focusing region; and a supply channel formed on each rotational disk rib to supply the target material to the rotational disk rim, wherein the rotational disk ribs supporting the rotational disk rim are configured to allow EUV light to penetrate relative to a predetermined area of a light focusing region through a collector mirror.

The present invention relates to a rotational disk structure for an EUV light source device, including: a rotational disk confining a target material by centrifugal force while rotating to generate EUV light through plasma reactions with the target material in the EUV light source device, wherein the rotational disk includes a plurality of rotational disk ribs supporting a rotational disk rim to allow EUV light to penetrate relative to a predetermined area of a light focusing region through a collector mirror, which irradiates the beam emitted from a laser source to the target material by penetrating the beam to the center, receives the EUV light reflected from the target material, and collects the EUV light to the same incident light axis.

An extreme ultraviolet light generation system, generating extreme ultraviolet light by irradiating a target substance with laser light, includes a tank storing the target substance in a liquid state, a nozzle outputting the target substance stored in the tank, a piezoelectric element applying vibration to the target substance to be output from the nozzle to generate droplets of the target substance, a droplet detection device detecting a time interval of passage of the droplets output from the nozzle, and at least one processor. The processor acquires a first value of a vibration parameter relating to the vibration of the piezoelectric element, acquires a variation of the time interval corresponding to each of a plurality of values including the first value of the vibration parameter, and generates the droplets using a second value with which the variation of the time interval is smaller than that with the first value.

A radiation system configured to produce radiation and comprising a droplet generator (3) configured to produce a droplet of fuel traveling towards a plasma formation region, a laser system operative to generate a pre-pulse (PP) and a main pulse (MP), wherein the pre-pulse is configured to condition the droplet for receipt of the main pulse, and wherein the main pulse is configured to convert the conditioned droplet into plasma producing the radiation and a control system configured to control a spatial offset between the pre-pulse and the droplet in a plane transverse to a propagation direction of the pre-pulse, wherein the control system is configured to adjust the spatial offset so as to maximize a velocity change of the conditioned droplet in a plane transverse to a propagation direction of the main pulse.

A target material generator includes a fluid flow path between reservoir system and a nozzle supply system, and a coupling assembly in the fluid flow path. The target material generator is a part of an extreme ultraviolet light source. The coupling assembly includes a first fitting coupled to a second fitting to thereby form a flow conduit along the fluid flow path, wherein a seal is formed between the first fitting and the second fitting, and a sleeve disposed along inner walls of the flow conduit and between the seal and the flow conduit such that a contaminant trap is formed between the sleeve and the seal.

A photolithographic apparatus includes a droplet generator, a droplet generator maintenance system, and a controller communicating with the droplet generator maintenance system. The droplet generator maintenance system operatively communicates with the droplet generator, a coolant distribution unit, a gas supply unit, and a supporting member. The gas supply unit includes a heat exchange assembly and an air heating assembly. The coolant distribution unit is configured to control the temperature of the droplet generator within the acceptable droplet generator range.

A method of controlling an extreme ultraviolet (EUV) lithography system is disclosed. The method includes irradiating a target droplet with EUV radiation, detecting EUV radiation reflected by the target droplet, determining aberration of the detected EUV radiation, determining a Zernike polynomial corresponding to the aberration, and performing a corrective action to reduce a shift in Zernike coefficients of the Zernike polynomial.

A solid target substance replenishment device includes a solid target container, a first path through which a solid target substance passes, a delivery device, and a second path through which the solid target substance delivered by the delivery device is replenished to a molten target container. The delivery device includes a tube including a receiving port for receiving the solid target substance having passed through the first path and a facing surface; a delivery rod delivering the solid target substance; and a stopper forming a passage through which the solid target substance between the receiving port and the facing surface is moved in the tube by being moved toward an outside of the tube when the delivery rod moves forward, and restrict the target substance from returning between the receiving port and the facing surface by being moved toward an inside of the tube when the delivery rod moves backward.