The present invention relates to an apparatus for supplying a liquid target material to a radiation source, comprising a reservoir system including a reservoir (410) configured to be connected to an ejection system (450) via an outlet (410a) of the reservoir and a pressurizing system to pressurize solid target material in the reservoir, wherein the apparatus further comprises a heating system (440) arranged between the reservoir and the ejection system to liquify the solid target material after being pressurized in the reservoir, and wherein the pressurizing system is configured to provide a pressure to the solid target material in the reservoir in order to extrude the solid target material through the outlet such that the liquid target material entering the ejection system is at a pressure of at least (200) bar.

A target generation device includes nozzle including a nozzle hole through which a liquid target substance for generating extreme ultraviolet light is discharged; a first piezoelectric element arranged at a different position in a first direction with respect to the nozzle, and configured to vibrate the nozzle by expanding and contracting in the first direction; and a second piezoelectric element arranged at a different position in the first direction with respect to the first piezoelectric element, and configured to vibrate the nozzle via the first piezoelectric element by expanding and contracting in the first direction.

The present disclosure relates to an EUV light source device for EUV mask inspection, including: an IR laser source for emitting an IR laser beam; a condenser lens for collecting the IR laser beam emitted from the IR laser source; a collector mirror having a hole formed at the center thereof in such a way as to pass the IR laser beam collected onto the condenser lens therethrough, the collector mirror being adapted to collect EUV light reflected onto a liquid target if the IR laser beam reacts with the liquid target to produce the EUV light; a target feeder for continuously feeding the liquid target to allow the IR laser beam passing through the hole formed on the collector mirror to react with the liquid target; and a plurality of heaters located on the collector mirror.

A tilt stage includes a mounting table on which a target supply device supplying a target to a predetermined region in a chamber is mounted, a rotation support portion supporting the mounting table rotatably about at least first and second axes, a first tilt support portion including a first ball and a first contact surface in contact with the first ball and supporting the mounting table, a first adjuster adjusting posture of the target supply device by moving one of the first ball and the first contact surface in a first direction, a second tilt support portion including a second ball and a second contact surface in contact with the first ball and supporting the mounting table, and a second adjuster adjusting the posture of the target supply device by moving one of the second ball and the second contact surface in a second direction.

An extreme ultraviolet light generation apparatus generating extreme ultraviolet light by irradiating a droplet with laser light includes a tank storing a target substance in a liquid state; a nozzle outputting the target substance stored in the tank; a piezoelectric element applying vibration reflecting an electric signal to the target substance to be output from the nozzle to generate the droplet of the target substance; a first sensor measuring a passage interval of the droplets output from the nozzle; a second sensor measuring a parameter related to the droplet; and a processor setting a prohibited band of a duty of the electric signal based on data in which the duty and the parameter at the duty are associated with each other, and setting the duty of the electric signal to be applied to the piezoelectric element while avoiding the prohibited band.

A processing method of a target supply device is configured to supply a target into a chamber for generating EUV light. The target supply device includes a tank capable of accommodating the target, a filter accommodated in the tank, and a nozzle in communication with inside of the tank and capable of discharging the target in a molten state. The processing method includes a first step of heating the tank to a temperature exceeding a melting point of the target before supplying the target into the tank, and a second step of supplying the target into the tank after the first step.