The present invention relates to a shield-integrated rotational disk EUV light source device including a fragment shield, including: a rotational disk having a rotational disk rim which melts a target material for generating EUV light through plasma reactions; a plurality of rotational disk ribs supporting the rotational disk rim so that EUV light penetrates relative to a predetermined area among a light focusing region; and a fragment shield surrounding a plasma reaction region of the rotational disk rim to prevent the generation of target material fragments when the target material melted on the rotational disk rim causes a plasma reaction by the beam emitted from the laser source.

The present invention relates to a rotational disk structure for an EUV light source device, including: a rotational disk confining a target material by centrifugal force while rotating to generate EUV light through plasma reactions with the target material in the EUV light source device, wherein the rotational disk includes a plurality of rotational disk ribs supporting a rotational disk rim to allow EUV light to penetrate relative to a predetermined area of a light focusing region through a collector mirror, which irradiates the beam emitted from a laser source to the target material by penetrating the beam to the center, receives the EUV light reflected from the target material, and collects the EUV light to the same incident light axis.

A solid target substance replenishment device includes a solid target container, a first path through which a solid target substance passes, a delivery device, and a second path through which the solid target substance delivered by the delivery device is replenished to a molten target container. The delivery device includes a tube including a receiving port for receiving the solid target substance having passed through the first path and a facing surface; a delivery rod delivering the solid target substance; and a stopper forming a passage through which the solid target substance between the receiving port and the facing surface is moved in the tube by being moved toward an outside of the tube when the delivery rod moves forward, and restrict the target substance from returning between the receiving port and the facing surface by being moved toward an inside of the tube when the delivery rod moves backward.

A modular laser-produced plasma X-ray system includes a liquid metal flow system enclosed within a low-pressure chamber, the flow system including a liquid metal, wherein in at least one location on the liquid metal forms a metal target directly illuminated by laser pulses, a circulation pump within the liquid metal flow system for circulating the liquid metal, a laser pulse emitter configured to transmit laser pulses into the chamber via a laser window, focusing optics, located between the emitter and the metal target, the focusing optics directing the laser pulses to strike the metal target at a target location to form X-ray pulses, and an X-ray window positioned within the chamber to enable the X-ray pulses to exit the chamber.

A modular laser-produced plasma X-ray system includes a liquid metal flow system enclosed within a low-pressure chamber, the flow system including a liquid metal, wherein in at least one location on the liquid metal forms a metal target directly illuminated by laser pulses, a circulation pump within the liquid metal flow system for circulating the liquid metal, a laser pulse emitter configured to transmit laser pulses into the chamber via a laser window, focusing optics, located between the emitter and the metal target, the focusing optics directing the laser pulses to strike the metal target at a target location to form X-ray pulses, and an X-ray window positioned within the chamber to enable the X-ray pulses to exit the chamber.

A control apparatus for an optical apparatus including a light source apparatus according to the present disclosure is configured to determine a mode to be executed from among a plurality of modes and control the optical apparatus accordingly. The plurality of modes include a first mode in which the light source apparatus irradiates laser light onto a molten target material to generate illumination light, and the optical apparatus illuminates an object using the illumination light, and a second mode in which the light source apparatus irradiates laser light onto at least one of a holding unit of the target material or the target material in a solid state to change the target material from the solid state to a molten state.

A laser-sustained broadband light source is disclosed. The light source may include a gas containment structure for plasma generation. The gas containment structure may include a first portion formed from a first grade of sapphire and a second portion formed from a second grade of sapphire. The first portion is coupled to one or more sections of the second portion of second grade sapphire. The light source may include sapphire-to-sapphire bonding between the first-grade sapphire of the first portion and the second-grade sapphire of the second portion, thereby eliminating metal-to-sapphire brazing and avoiding exposure of metal components to destructive UV and/or VUV light. The light source may include a primary laser pump source configured to direct a primary pump beam into the gas containment structure to sustain a plasma and a light collector element configured to collect broadband light emitted from the plasma.

A laser-driven light source includes a laser source that generates continuous wave sustaining light includes a diode laser that generates a CW laser beam at an output and an optical element optically coupled to the output of the diode laser. The optical element includes a region that passes a portion of the CW laser beam to the output of the laser source and a reflection region that reflects another portion of the CW laser beam back to the output of the diode laser. The reflection region is configured to select a spatial mode and wavelength of the laser beam generated by the diode laser, thereby generating the CW sustaining light with radiant flux and spectral shape that is stable as a function of time. A gas-filled bulb optically coupled to the output of the laser source such that the generated CW sustaining light sustains a CW plasma in the gas-filled bulb, thereby emitting light with radiant flux and spectral shape stable as a function of time.

The invention relates to plasma source comprising a target material to produce the plasma emitting EUV radiation. The target material comprises a Li-based alloy with at least one further element selected from the group consisting of Ag, Au, Bi, Ba, Sr. The alloy is configured to increase the density of the target material by more than three times compared to the density of Li. As a result, compared with the Li target, the velocity of the droplet fraction of debris particles may be sharply reduced, which makes it possible to control the direction of its exit from the plasma due to the high velocity of the target. The plasma source is preferably a laser-produced plasma light source with a fast rotating target (at least 100 m/s). The target material may allow the creation of compact low-debris EUV light sources with high spectral brightness designed for a wide range of applications.

A light source apparatus according to an embodiment includes: a target material capable of generating EUV light when being irradiated with laser light; a collector mirror configured to reflect the EUV light; an exhaust case including an outer cover disposed between the target material and the collector mirror, and an exhaust port communicating with an exhaust space formed on a target material side of the outer cover; a cylindrical optical-path cover a diameter of an opening another end being larger than that of an opening at one end; and a filter that is disposed at the other end of the optical-path cover or inside thereof, and configured to let the EUV light pass therethrough.