Patent classifications
B29C59/026
FLOW CELLS
An example of a flow cell includes a substrate and a cured, patterned resin on the substrate. The cured, patterned resin has nano-depressions separated by interstitial regions. Each nano-depression has a largest opening dimension ranging from about 10 nm to about 1000 nm. The cured, patterned resin also includes an interpenetrating polymer network. The interpenetrating polymer network of the cured, patterned resin includes an epoxy-based polymer and a (meth)acryloyl-based polymer.
IMPRINT APPARATUS, IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD
An imprint apparatus including a mold deformation mechanism configured to deform a mold by applying a pressure to the mold, a substrate deformation mechanism configured to deform the substrate by applying a pressure to the substrate, a measurement unit configured to measure a deformation amount of the mold and a deformation amount of the substrate during separating the mold from the cured imprint material on the substrate, and a control unit configured to control, during the separating, a pressure to be applied to the mold by the mold deformation mechanism and a pressure to be applied to the substrate by the substrate deformation mechanism based on the deformation amounts measured by the measurement unit such that a difference between the deformation amount of the mold and the deformation amount of the substrate falls within an allowable range.
SUBSTRATE WITH ORTHOGONALLY FUNCTIONAL NANODOMAINS
Embodiments of the present disclosure also relate to methods of fabricating flow cell substrates. Some exemplary workflows exploit orthogonal chemistries of substrate layers such that the process does not include polishing steps. Substrates prepared by the method described herein can include a first primer set and a second primer set compatible with simultaneous paired-end sequencing methods.
Imprint apparatus and method for manufacturing article
An imprint apparatus that forms a pattern of an imprint material on a substrate with use of a mold includes a mold holding unit configured to hold the mold, a suction unit provided at the mold holding unit and configured to suction a gas in a space in which the mold and the substrate face each other, a detector configured to detect particles included in the gas suctioned by the suction unit, and a control unit configured to perform error processing depending on a result of detection performed by the detector.
Method for production of thin plate-like laminate having film-like resin layer
[Object] To provide a method for the production of a thin plate-like laminate having a film-like resin layer in which a concave/convex shape can stably be formed with high accuracy on the film-like resin layer laminated on a thin plate-like substrate. [Achieving Means] There are provided a step of creating a mold retention structure 100 in which molds 110, which have been heated to a thermal deformation temperature of a film-like resin composition 84, are arranged on both surface sides of a workpiece 85, and a step of introducing the mold retention structure in which the heated molds are arranged between two compression rollers 52, 54 and compressing outer surfaces of the molds by rotating the compression rollers to integrally thermocompression-bond the film-like resin composition and a substrate 81 to form a thin plate-like laminate 80 having a film-like resin layer 82.
Storage device, ejection-material ejection device, and imprint apparatus
A storage device stores an ejection cartridge including an accommodating container that accommodates an ejection material, and an ejection head that includes an ejection port for ejecting the ejection material accommodated in the accommodating container. The storage device includes a mount on which the ejection cartridge is mounted, and includes a pressure regulating tank configured to control a pressure of an inside of the accommodating container of the ejection cartridge fixed to the mount with its ejection port not enclosed.
Imprint apparatus and method of controlling imprint apparatus
An imprint apparatus includes: a movable housing unit; an ejection head provided in the housing unit and configured to eject an ejection material; a flexible member provided in the housing unit and separating the housing unit into a first storing space communicating with the ejection head and storing the ejection material and a second storing space storing hydraulic liquid; a first channel and a second channel communicating with the second storing space; a pressure control unit configured to control a pressure in the second storing space through the channels; and a bubble detection unit configured to detect bubbles in the channels.
IMPRINT APPARATUS
The imprint apparatus according to the present invention causes a supplying unit to supply an imprint material onto at least a first region in a predetermined shot region on a substrate, causes an energy supplying unit to supply energy to the imprint material on the first region so as to increase a degree of polymerization of the imprint material on the first region, causes a moving unit to move at least one of a mold and the substrate such that a pattern region formed on the mold and the imprint material on the substrate are brought into contact with each other, and causes the energy supplying unit to supply the energy to the imprint material on the predetermined shot region such that the imprint material on the predetermined shot region is solidified after the pattern region and the imprint material on the substrate are brought into contact with each other.
METHOD OF FORMING PATTERNS ON SUBSTRATE BY DOUBLE NANOIMPRINT LITHOGRAPHY
A method of forming patterns on a substrate by double nanoimprint processes includes providing a first replicate mold and a second replicate mold. The first replicate mold includes numerous first patterns. The second replicate mold includes at least one second pattern. The second pattern corresponds to at least one of the first patterns. Later, a first substrate is provided. A first polymeric compound layer is coated on the first substrate. Next, the first patterns are nanoimprinted into the first polymeric compound layer. Subsequently, the first substrate is etched by taking the first polymeric compound layer as a mask. After that, a second polymeric compound layer is coated on the first substrate. Later, the second pattern is nanoimprinted into the second polymeric compound layer. Finally, the first substrate is etched by taking the second polymeric compound layer as a mask.
Alignment film transfer printing plate and manufacturing method thereof
This application provides an alignment film transfer printing plate including a substrate, a first dot arranged on the substrate, and a plurality of second dots arranged around the first dot. A height of each of the second dots in a direction perpendicular to a surface of the substrate is less than or equal to a height of the first dot in the direction perpendicular to the surface of the substrate, a blocking portion is formed on an end of the first dot away from the substrate, and an area of an end surface of each of the second dots away from the substrate is less than an area of an end surface of the blocking portion away from the substrate.