An imprinting apparatus, a method of manufacturing an article, with a template having at least one mass velocity variation feature in a region that alters the filling rate of formable material in the second region surrounding a pattern region. The altered filling rate varies from a first filling rate, at a center of an outer edge of the region to a second filling rate, at corners of the outer edge of the region. The second filling rate is greater than the first filling rate.

A three-dimensional printing head includes a housing (100), a fusing module (200) arranged in the housing (100), and a heat dissipation module (300). The fusing module (200) is disposed in the housing (100) and includes a feeding tube (210) with both ends open. A feeding inlet (211) for receiving a filament material (20) is at one end of the feeding tube (210), a supplying nozzle (220) is at the other end of the feeding tube (210), and multiple fins (212) are formed outside of the feeding tube (210). A heater (230) is disposed at the supplying nozzle (220) to heat the same for melting the filament material (20). The heat dissipation module (300) includes a fan (310) arranged in the housing (100), and the fan (310) has an inlet side (311) and an outlet side (312) opposite thereto. The outlet side (312) is arranged toward the fusing module (200).

An imprint method using a mold and/or a transfer substrate having a mesa structure includes a resin supply step, a contact step, a curing step, and a mold release step. In the resin supply step, a balance layer is formed by supplying a molded resin also to an area outside of a pattern formation area of the transfer substrate in which a pattern structure is to be formed.

The present invention relates generally to a pillow or cushion having embossing and/or debossing elements, apparatus, system, and a method thereof. More particularly, the invention encompasses an apparatus and a method to create fabric cushion or pillow that can have embossing or debossing or a combination of embossing and debossing on them. The invention further comprises of embossed and/or debossed cushion or pillow, with or without cushion filler or insert. These inventive cushion or pillow can be used for both indoor and outdoor purposes. The cushion or pillow sizes can be standard sizes, but they can also be custom sized for any measurement. Embossing and/or debossing are the processes of creating either raised or recessed relief, image, or design in emboss-able/deboss-able materials. For example, an embossed pattern would be raised against a background, while a debossed pattern would be sunken into the surface of the material.

Systems and methods wherein one or more processing operations on an identification document occur after a radiation curable material is applied to a surface of the identification document but before the radiation curable material is fully cured. The one or more processing operations can occur before any curing of the radiation curable material takes place. Alternatively, the one or more processing operations can occur after the radiation curable material has been partially cured, and before the radiation curable material is fully or completely cured.

A system and method according to various embodiments combines three separate technologies to form a unique lighting system with enhanced antimicrobial properties and air cleaning capabilities. The combination of the three technologies also produces a lighting system that extends the required maintenance period for lighting fixtures. The first technology is based on anatase type TiO.sub.2. The second and third technologies are based on the use of micro-sized surface structures to generate light scattering effects and, at the same time, reduce bacterial colonization and inhibit bacterial migration even during the absence of light or in dark environments.

The range of stretch-tunability of sinusoidal wrinkled surfaces that are obtained by compression of supported thin films is limited by the emergence of a period-doubled mode at high compressive strains. This disclosure presents a method to suppress the emergence of the period-doubled mode at high strains. This is achieved by compressing pre-patterned supported thin films, wherein the pre-patterns are substantially similar to the natural pattern of the supported thin film system. As compared to flat thin film systems, pre-patterned thin film systems exhibit period doubling behavior at a higher compressive strain. The onset strain for emergence of period-doubling is tuned by altering the amplitude of the pre-patterns.

An imprint apparatus for forming a pattern in an imprint material on a substrate using an original as a mold, comprises an ultraviolet light generation device which irradiates with ultraviolet light which is curing light for curing the imprint material, and a control unit which controls a light amount of the ultraviolet light which is curing light. The control unit configured to perform a control of the light amount of the ultraviolet light acquires data of a defect distribution of the pattern formed on the substrate by the mold, and performs the control of the light amount of the ultraviolet light in a plurality of shot areas on the substrate based on the acquired data of the defect distribution.

A replica manufacturing apparatus performs imprint processing of forming a pattern of an imprint material on a replica substrate using a master mold, processes the replica substrate with the formed pattern to manufacture a replica mold, and transfers data of a condition concerning the imprint processing to a management apparatus. An imprint apparatus acquires the data from the management apparatus, and performs the imprint processing of forming a pattern of an imprint material on a substrate using the replica mold.

A medical device for delivering a drug compound through a stratum corneum includes a support having an aperture, an array of microneedles extending outwardly from the support, a plurality of nanostructures associated with each microneedle, and a reservoir wherein the drug compound is retained. At least one microneedle contains a shaft extending from the support. The shaft includes a tip configured to penetrate the stratum corneum. The shaft defines a channel extending from the support to the tip. The channel is in at least partial alignment with the aperture. At least some of the microneedles of the array of microneedles each have a cross-sectional dimension of from about 1 micrometer to about 1 millimeter. At least some of the nanostructures have a cross-sectional dimension less than about 500 nanometers and greater than about 5 nanometers and an aspect ratio of from about 0.2 to about 5.