An extreme ultraviolet (EUV) light source, including a first laser source for emitting a first laser beam, a second laser source for emitting a second laser beam, a combiner configured to combine the first laser beam and the second laser beam, and a beam-guide configured to jointly guide the first laser beam and the second laser beam into a target region for generating EUV radiation. The combiner is configured to supply the first laser beam and the second laser beam to the beam-guide for joint beam guidance via common optical units in a spatially separated manner and with a lateral offset.

The present invention relates to an apparatus for supplying a liquid target material to a radiation source, comprising a reservoir system including a reservoir (410) configured to be connected to an ejection system (450) via an outlet (410a) of the reservoir and a pressurizing system to pressurize solid target material in the reservoir, wherein the apparatus further comprises a heating system (440) arranged between the reservoir and the ejection system to liquify the solid target material after being pressurized in the reservoir, and wherein the pressurizing system is configured to provide a pressure to the solid target material in the reservoir in order to extrude the solid target material through the outlet such that the liquid target material entering the ejection system is at a pressure of at least (200) bar.

Embodiments described herein cover systems and methods to generate a high-powered laser beam, direct the high-powered laser beam to be incident upon a source material, wherein the source material generates X-ray radiation upon being energized by the high-powered laser, and provide one or more components of a test system positioned to receive the X-ray radiation generated from the source material.

An EUV light generation system includes a prepulse laser device outputting prepulse laser light to be radiated to a target supplied into a chamber; a main pulse laser device outputting main pulse laser light to be radiated to a diffusion target generated by the radiation of the prepulse laser light; a first actuator adjusting an irradiation position of the prepulse laser light; a second actuator adjusting an irradiation position of the main pulse laser light; an EUV sensor detecting EUV energy; a laser energy sensor detecting laser energy of the main pulse laser light; a target sensor imaging the diffusion target; and a controller controlling, after controlling the first actuator based on a characteristic value of the diffusion target calculated from an image of the diffusion target, the second actuator so that a ratio of the EUV energy to the laser energy detected by the laser energy sensor becomes large.

An EUV excitation light source includes a laser source configured to emit a laser beam. The laser beam includes two partial beams having different wavelengths. The EUV excitation light source further includes a separating optical element for separating the two partial beams of the laser beam into two separated beams, and a superposition unit for superimposing the two separated beams at a predefined superposition location with a predefined superposition angle. The separating optical element includes a first reflective diffraction grating.

An EUV light generation apparatus is configured to generate EUV light by irradiating a target output into a chamber with laser light. Here, the EUV light generation apparatus includes a light concentrating unit configured to concentrate the laser light on the target, an angle adjustment mirror configured to adjust an incident angle of the laser light on the light concentrating unit, a position adjustment mirror configured to adjust an incident position of the laser light on the light concentrating unit, a beam monitor configured to measure a parameter related to variation in the incident position, and a processor configured to perform control of adjustment by the position adjustment mirror based on a measurement value of the parameter when performing adjustment by the angle adjustment mirror.