Patent classifications
B29D11/00769
MICROSTRUCTURE AND METHOD FOR MANUFACTURING SAME
The present invention relates to a microstructure 20 having pores 22 on its surface or inside. The microstructure is a sheet containing an energy ray active resin 21. The pores 22 are formed in a vertical array and are in a formation pattern with a Talbot distance being specified by Formula 1 below:
Z.sub.T=(2nd.sup.2)/λ [Formula 1] where Z.sub.T represents a Talbot distance (nm), n represents a refractive index, d represents a pitch distance (nm), and λ represents a light wavelength (nm). The pores have a periodic shape in the planar direction. Thus, the present invention provides three-dimensional microfabricated structures through which the periodicity is controlled.
Artificial eye lens with laser-generated birefringent structure and method for producing an artificial eye lens
An artificial eye lens having an integral optical part which has, viewed in the direction of an optical principal axis of the eye lens, a first optical side and an opposite, second optical side. The optical part is formed with a structure having birefringence, where the birefringent structure in the integral optical part is formed as a laser structure. A method for producing an artificial eye lens, where the birefringent structure is produced with a laser apparatus, and a pulsed laser beam having a pulse length of between 100 fs and 20 ps, a wavelength of between 320 nm and 1100 nm, a pulse repetition rate of between 1 kHz and 10 MHz, a focus diameter of less than 5 μm, and a power density of greater than 10.sup.6 W/cm.sup.2.
Grating structure for a diffractive optic
A grating structure for a diffractive optic includes grating lines, each of which is approximated by successive segments. Longitudinal axes of the segments each have an angle relative to a first coordinate axis of a reference coordinate system. A first section of a first one of the grating lines is approximated by a first group of the segments, and a second section adjacent to the first section of the first grating line is approximated by a second group of segments. The longitudinal axes of a major portion of the segments of the first group have a first predetermined angle relative to the first coordinate axis of the reference coordinate system, and the longitudinal axes of a major portion of the segments of the second group have a second predetermined angle different from the first predetermined angle relative to the first coordinate axis of the reference coordinate system.
LENS WITH SURFACE MICROSTRUCTURES ENCAPSULATED BY A THICK LOW REFRACTIVE INDEX HARD COAT
The invention relates to an optical article comprising a base lens substrate having a at least one or a plurality of optical elements such as microlenses, a Fresnel structures, etc protruding from a surface thereof, and a hard coat covering encapsulating each optical elements. More particular it relates to an optical article comprising: a base lens substrate having opposing first and second lens surfaces; a protective layer having opposing first and second protective surfaces and a maximum thickness, measured in a direction perpendicular to the first protective surface between the first and second protective surfaces, the first protective surface disposed on the second lens surface; and at least one or a plurality of optical elements, each: defining a portion of one of the first protective surface and the second lens surface; having a maximum height, measured in a direction perpendicular to the second lens surface carrying them, that is less than or equal to 0.1 millimeters (mm) and a diameter that is less than or equal to 2.0 mm. wherein the protective layer is composed of a crosslinked matrix and nanoparticles and the index nc of said protective layer is lower than the index nm of the at least one or each optical element such that the difference nm−nc is greater than 0.045, preferably greater than 0.10, or even greater than 0.15; and wherein the maximum thickness of the protective layer is at least 2 times, preferably at least 5 times of the maximum height of the at least one or each of the optical elements. The invention also relates to the method for forming such optical articles, typically comprising an inkjet step.
WAVEGUIDE AND METHOD FOR FABRICATING A WAVEGUIDE MASTER GRATING TOOL
There is provided a method for fabricating a waveguide master grating imprint tool. The method comprises: coating a substrate with at least one photoresist layer; selectively exposing a first diffraction grating master profile onto a first area of the at least one photoresist layer; selectively exposing a second diffraction grating master profile onto a second area of the at least one photoresist layer; and processing the substrate to form the first diffraction grating master profile and the second diffraction grating master profile. Each of the first diffraction grating profile and the second diffraction grating profile comprises an edge between the substrate and the respective grating profile that is substantially perpendicular to the substrate surface and each of the edges is substantially the same height as a maximum depth of the first diffraction grating master profile and the second diffraction grating master profile
WAVEGUIDE AND METHOD FOR FABRICATING A WAVEGUIDE
There is provided a method for fabricating a waveguide. The method comprising fabricating a first master grating tool comprising a first tool substrate having a surface with an area corresponding at least to the area of a surface of the waveguide and having a first grating profile formed over substantially all of the surface of the first tool substrate. Fabricating a second master grating tool comprising a second tool substrate having a surface with an area corresponding at least to the area of the surface of the waveguide and having a second grating profile formed over substantially all of the surface of the second tool substrate. Using the first master grating tool to replicate the first grating profile over substantially all of a surface of a first waveguide substrate. Using the second master grating tool to replicate the second grating profile over substantially all of a surface of a second waveguide substrate. Applying a first dielectric layer over a selected area of the first grating profile replicated on the surface of the first waveguide substrate. Applying a second dielectric layer over a selected area of the second grating profile replicated on the surface of the second waveguide substrate. Applying a layer of laminating material to at least one of the surfaces of the first and second waveguide substrates and bringing the surfaces of the first and the second waveguide substrates together thereby to join the first and second waveguide substrates together by an intermediate lamination layer.
OPTICAL DEVICE WITH ORDERED SCATTERER ARRAYS FOR SECURE IDENTITY AND A METHOD OF PRODUCING THE SAME
An optical device with ordered scatterer arrays for secure identity and a method of producing the same
This invention discloses a method for configurable spatial control and modification of optically active resonantly coupled scatterer arrays to produce identifiable security features and a corresponding photonic secure identity device. The invention comprises at least the steps of (i) producing a deposition template from said master stamp, (ii) synthesis of a plasmonic particle colloid, (iii) producing an optically active, two-dimensional security tag template using self-assembly of said particles on said deposition template, (iv) producing a customized secure identity device from said security tag template by selective removal or modification of optical properties using ultrashort laser pulses. The produced customized plasmonic-photonic device can then be used as secure identity and anti-counterfeiting means. The device exploits customized spatial control and modification of optically active plasmonic particle arrays demonstrating surface lattice resonance optical signature to produce easily identifiable security features.
Optical element and method for manufacturing the same
A method for manufacturing an optical element includes the steps of: providing a first material including a precursor of a first energy curable resin which contains fine particles of a transparent conductive material on a transparent substrate, curing the first material by light irradiation, and performing a heat treatment on the cured first material. In the method described above, the cured first material processed by the heat treatment is again processed by light irradiation.
IMPRINTING APPARATUS AND IMPRINTING METHOD
An imprinting apparatus includes a first conveyer unit, a flexible imprinting mold film and a driving roller set. The first conveyer is adapted to convey a workpiece to a working region of the imprinting apparatus. The flexible imprinting mold film has imprinting segments. At least one of the imprinting segments is located in the working region. The workpiece is adapted to be imprinted in the working region through the corresponding imprinting segment. The flexible imprinting mold film is partially rolled around the driving roller set, the imprinting segment located in the working region is expanded from the driving roller set, and the driving roller set is adapted to drive the flexible imprinting mold film, such that at least another one of the imprinting segments rolled around the driving roller set is expanded from the driving roller set and moved to the working region. Besides, an imprinting method is also provided.
IRIDESCENT BADGES FOR VEHICLES AND METHODS OF MAKING THE SAME
An iridescent vehicle badge (and methods for making it) that includes a translucent, polymeric badge having a non-planar shape and comprising an interior and an exterior surface. Further, at least one of the surfaces of the badge comprises a plurality of diffraction gratings that are integral with the badge, each having a thickness from 250 nm to 1000 nm and a varying period from 50 nm to 5 microns. In some cases, the thickness can range from 500 nm to 750 nm. The period, in some cases, can vary within a set of discrete values in one or more portions of the at least one of the surfaces of the badge, e.g., from 150 nm to 400 nm.