Patent classifications
B29K2027/14
METHOD OF MANUFACTURING WAFER CLEANING BRUSH
Provided is a method of manufacturing a brush, such as a wafer cleaning brush. The method includes providing a polyvinyl alcohol (PVA) solution, forming an insoluble polyvinyl fluoride (PVF) by adding formaldehyde to the PVA solution, adding a water-soluble inorganic compound including a plurality of particles to the insoluble PVF, and mixing the insoluble PVF with the water-soluble inorganic compound to form a mixture of the water-soluble inorganic compound and the insoluble PVF, forming a brush by inserting the mixture of the water-soluble inorganic compound and the insoluble PVF into a mold and heat-treating the mixture, removing the wafer cleaning brush from the mold; and washing the wafer cleaning brush to remove the plurality of particles of the water-soluble inorganic compound from the wafer cleaning brush.