B32B7/035

Floatable opaque uniaxial shrink film containing polyolefin and silica gel voiding agent

Disclosed is multilayer film having a plurality of layers including a thickest layer containing 1 to 25 wt. % of a silica gel having an average particle size of 1 to 10 microns, and at least 50 wt. % of at least one polyolefin, wherein: (a) the thickest layer is voided by the silica gel; (b) the multilayer film is a uniaxially oriented film having an opacity greater than 10, and a density of less than 1 g/cc; and (c) the multilayer film has a shrinkage of at least 20% in a machine direction or a transverse direction of formation when heated to a temperature of 80 C.-100 C. A label and a flexible package composed of the film are also disclosed.

Method of Making an Article of Footwear
20260096631 · 2026-04-09 ·

A method of manufacturing a panel for an article of apparel includes stretching a base layer from a resting configuration to a stretched configuration. The method further includes coupling a reinforcement layer to the base layer when the base layer is in the stretched configuration. Thereafter, the method includes applying an auxetic or near auxetic structure to the reinforcement layer when the base layer is in the stretched configuration, the auxetic structure including a plurality of interconnected members defining a repeating pattern of void. The base layer is then released to allow the base layer to return to the resting configuration.

Method of Making an Article of Footwear
20260096631 · 2026-04-09 ·

A method of manufacturing a panel for an article of apparel includes stretching a base layer from a resting configuration to a stretched configuration. The method further includes coupling a reinforcement layer to the base layer when the base layer is in the stretched configuration. Thereafter, the method includes applying an auxetic or near auxetic structure to the reinforcement layer when the base layer is in the stretched configuration, the auxetic structure including a plurality of interconnected members defining a repeating pattern of void. The base layer is then released to allow the base layer to return to the resting configuration.