[Object] To reduce heat damage to a film when a lithium layer is formed on the film by using a roll-to-roll system.

[Solving Means] A roll-to-roll deposition apparatus includes a vacuum chamber, a film travel mechanism, a lithium source, and a first roller. The vacuum chamber is capable of maintaining a reduced-pressure state. The film travel mechanism is capable of causing a film to travel inside the vacuum chamber. The lithium source is capable of making lithium melt inside the vacuum chamber. The first roller is disposed between a deposition surface of the film and the lithium source. The first roller has a transfer pattern that receives the molten lithium from the lithium source. The first roller transfers a pattern of a lithium layer corresponding to the transfer pattern to the deposition surface while being rotated.

A method for transferring a micro device on a curved surface according to an exemplary embodiment of the present invention includes: coating an adhesive layer on an external circumferential surface of a tube; providing a micro device pattern on one side of a substrate; positioning an external circumferential surface of the tube to contact the substrate and allow a length direction of the device pattern to cross a radius direction of the tube, and rotating the tube with respect to an axis-direction of the tube and simultaneously moving at least one of the tube and the substrate in a rectilinear way to transfer the micro device pattern on the substrate to the adhesive layer; and fixing the transferred micro device pattern to the adhesive layer by curing the adhesive layer.

A slidable substrate deposition holding apparatus is disclosed. The apparatus may include a rectangular frame having a first edge, a second edge, a third edge and a fourth edge. The apparatus may further include a first rail and a second rail attached between the first and second edges. The apparatus may further include a first support bracket and a second support bracket mounted on the first and second rails. The first and second support brackets may be disposed between the first and second rails. The apparatus may additionally include a first carriage and a second carriage. The first carriage may be pivotally attached to the first support bracket and the second carriage may be pivotally attached to the second support bracket. Further, at least one of the first carriage and the second carriage may be configured to slide on the first rail and the second rail.

A slidable substrate deposition holding apparatus is disclosed. The apparatus may include a rectangular frame having a first edge, a second edge, a third edge and a fourth edge. The apparatus may further include a first rail and a second rail attached between the first and second edges. The apparatus may further include a first support bracket and a second support bracket mounted on the first and second rails. The first and second support brackets may be disposed between the first and second rails. The apparatus may additionally include a first carriage and a second carriage. The first carriage may be pivotally attached to the first support bracket and the second carriage may be pivotally attached to the second support bracket. Further, at least one of the first carriage and the second carriage may be configured to slide on the first rail and the second rail.

A slidable substrate deposition holding apparatus is disclosed. The apparatus may include a rectangular frame having a first edge, a second edge, a third edge and a fourth edge. The apparatus may further include a first rail and a second rail attached between the first and second edges. The apparatus may further include a first support bracket and a second support bracket mounted on the first and second rails. The first and second support brackets may be disposed between the first and second rails. The apparatus may additionally include a first carriage and a second carriage. The first carriage may be pivotally attached to the first support bracket and the second carriage may be pivotally attached to the second support bracket. Further, at least one of the first carriage and the second carriage may be configured to slide on the first rail and the second rail.

A slidable substrate deposition holding apparatus is disclosed. The apparatus may include a rectangular frame having a first edge, a second edge, a third edge and a fourth edge. The apparatus may further include a first rail and a second rail attached between the first and second edges. The apparatus may further include a first support bracket and a second support bracket mounted on the first and second rails. The first and second support brackets may be disposed between the first and second rails. The apparatus may additionally include a first carriage and a second carriage. The first carriage may be pivotally attached to the first support bracket and the second carriage may be pivotally attached to the second support bracket. Further, at least one of the first carriage and the second carriage may be configured to slide on the first rail and the second rail.