B41N10/04

Imaging blanket with thermal management properties

Provided herein is an imaging blanket for variable data lithography comprising (i) a substrate and (ii) a thermally-conductive composition disposed on the substrate comprising a silicone elastomer and a thermally-conductive filler selected from metal oxides, wherein the thermally-conductive composition has a thermal conductivity ranging from about 0.6 W/m.sup.2 to about 1.6 W/m.sup.2. Further provided herein a method of making the imaging blanket, as well as a printing system comprising the imaging blanket, wherein the imaging blanket has improved thermal conductivity.

Imaging blanket with thermal management properties

Provided herein is an imaging blanket for variable data lithography comprising (i) a substrate and (ii) a thermally-conductive composition disposed on the substrate comprising a silicone elastomer and a thermally-conductive filler selected from metal oxides, wherein the thermally-conductive composition has a thermal conductivity ranging from about 0.6 W/m.sup.2 to about 1.6 W/m.sup.2. Further provided herein a method of making the imaging blanket, as well as a printing system comprising the imaging blanket, wherein the imaging blanket has improved thermal conductivity.

TRANSFER MEMBER, TRANSFER DRUM, AND IMAGE FORMING APPARATUS

A transfer member includes: an inner layer; and an outer layer that is adhered to the inner layer and has a hardness lower than a hardness of the inner layer.

TRANSFER MEMBER, TRANSFER DRUM, AND IMAGE FORMING APPARATUS

A transfer member includes: an inner layer; an outer layer provided on an outer periphery of the inner layer; and a surface layer provided on an outer periphery of the outer layer, both end portions of the surface layer in circumferential directions extending in the circumferential directions from both end portions of the outer layer in the circumferential directions.

MULTI-LAYER IMAGING BLANKET

A multilayer imaging blanket for a variable data lithography system, including a multilayer base including a sulfur-containing layer; and a cured topcoat layer including a polyurethane in contact with the sulfur-containing layer of the multilayer base.

MULTI-LAYER IMAGING BLANKET

A multilayer imaging blanket for a variable data lithography system, including a multilayer base including a sulfur-containing layer; and a cured topcoat layer including a polyurethane in contact with the sulfur-containing layer of the multilayer base.

PRINTING BLANKET AND METHOD FOR MANUFACTURING PRINTING BLANKET
20210331509 · 2021-10-28 · ·

A method for manufacturing a printing blanket including an elastic body that can be repeatedly used by removing a sheet is provided. According to the above of the present invention, the printing blanket includes an elastic body and a sheet bonded to the elastic body and performs printing by pressing the sheet against a printing object surface. The method includes a sheet fixing step of fixing the sheet at a periphery of a region in which the sheet is to be bonded to the elastic body; an elastic body placing step of placing the elastic body so that a bonding surface of the elastic body faces a bonding surface of the sheet that is fixed; a wax applying step of forming a wax layer on a surface of the elastic body; an adhesive applying step of applying an adhesive to at least one of the sheet and the elastic body that is provided with the wax layer on the surface thereof; and a pressing step of pressing the sheet and the elastic body against each other and bringing the sheet into close contact with the elastic body provided with the wax layer such that the adhesive is interposed therebetween while stretching the sheet along the surface.

PRINTING BLANKET AND METHOD FOR MANUFACTURING PRINTING BLANKET
20210331509 · 2021-10-28 · ·

A method for manufacturing a printing blanket including an elastic body that can be repeatedly used by removing a sheet is provided. According to the above of the present invention, the printing blanket includes an elastic body and a sheet bonded to the elastic body and performs printing by pressing the sheet against a printing object surface. The method includes a sheet fixing step of fixing the sheet at a periphery of a region in which the sheet is to be bonded to the elastic body; an elastic body placing step of placing the elastic body so that a bonding surface of the elastic body faces a bonding surface of the sheet that is fixed; a wax applying step of forming a wax layer on a surface of the elastic body; an adhesive applying step of applying an adhesive to at least one of the sheet and the elastic body that is provided with the wax layer on the surface thereof; and a pressing step of pressing the sheet and the elastic body against each other and bringing the sheet into close contact with the elastic body provided with the wax layer such that the adhesive is interposed therebetween while stretching the sheet along the surface.

NANOWIRE TRANSISTOR FABRICATION WITH HARDMASK LAYERS

A nanowire device of the present description may be produced with the incorporation of at least one hardmask during the fabrication of at least one nanowire transistor in order to assist in protecting an uppermost channel nanowire from damage that may result from fabrication processes, such as those used in a replacement metal gate process and/or the nanowire release process. The use of at least one hardmask may result in a substantially damage free uppermost channel nanowire in a multi-stacked nanowire transistor, which may improve the uniformity of the channel nanowires and the reliability of the overall multi-stacked nanowire transistor.

NANOWIRE TRANSISTOR FABRICATION WITH HARDMASK LAYERS

A nanowire device of the present description may be produced with the incorporation of at least one hardmask during the fabrication of at least one nanowire transistor in order to assist in protecting an uppermost channel nanowire from damage that may result from fabrication processes, such as those used in a replacement metal gate process and/or the nanowire release process. The use of at least one hardmask may result in a substantially damage free uppermost channel nanowire in a multi-stacked nanowire transistor, which may improve the uniformity of the channel nanowires and the reliability of the overall multi-stacked nanowire transistor.