A61Q3/04

Polymer compound peeling agent, adhesive material, and method of using adhesive materials

The present invention provides a polymer compound peeling agent usable for peeling as many types of polymer compounds as possible and capable of reducing a burden required for a peeling treatment when a polymer compound having adhered to an adhesion object is peeled. The polymer compound peeling agent for peeling a polymer compound having adhered to an adhesion object contains a photoresponsive liquid crystal material having a phase structure reversibly transitioning between an isotropic phase and a liquid crystal phase due to photoisomerization based on irradiation lights of different wavelengths. When the polymer compound is adhered to the adhesion object, the photoresponsive liquid crystal material is contained in the polymer compound with the phase structure set to the isotropic phase, and the phase structure of the photoresponsive liquid crystal material is allowed to transition from the isotropic phase to the liquid crystal phase by photoisomerization based on the light irradiation.

Polymer compound peeling agent, adhesive material, and method of using adhesive materials

The present invention provides a polymer compound peeling agent usable for peeling as many types of polymer compounds as possible and capable of reducing a burden required for a peeling treatment when a polymer compound having adhered to an adhesion object is peeled. The polymer compound peeling agent for peeling a polymer compound having adhered to an adhesion object contains a photoresponsive liquid crystal material having a phase structure reversibly transitioning between an isotropic phase and a liquid crystal phase due to photoisomerization based on irradiation lights of different wavelengths. When the polymer compound is adhered to the adhesion object, the photoresponsive liquid crystal material is contained in the polymer compound with the phase structure set to the isotropic phase, and the phase structure of the photoresponsive liquid crystal material is allowed to transition from the isotropic phase to the liquid crystal phase by photoisomerization based on the light irradiation.

Compositions comprising solvent, a monoalcohol, glycerin, and thickener

Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions are essentially free of water. The glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 1.2. The concentration of C2-C3 monoalcohol is from 5% by weight to 50% by weight. If the solvent includes C2-C4 alkyl acetate, then the concentration of C2-C3 monoalcohol is from 15% by weight to 50% by weight and the glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 2.0. The composition further includes a polyacrylamide.

Compositions comprising solvent, a monoalcohol, glycerin, and thickener

Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions are essentially free of water. The glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 1.2. The concentration of C2-C3 monoalcohol is from 5% by weight to 50% by weight. If the solvent includes C2-C4 alkyl acetate, then the concentration of C2-C3 monoalcohol is from 15% by weight to 50% by weight and the glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 2.0. The composition further includes a polyacrylamide.

NAIL POLISH REMOVER COMPOSITIONS AND METHODS
20180207075 · 2018-07-26 ·

Methods, systems, and apparatus, including computer programs encoded on computer storage media, for a row-level security. One of the methods includes receiving a request for one or more objects. The method includes determining that a type of the one or more requested objects is associated with an object representative of instance level security. The method includes determining access is authorized to at least some of the one or more objects. Determining access includes obtaining a first access statement associated with the type of the one or more objects, obtaining a second access statement associated with the object representative of instance level security, combining at least the first access statement and the second access statement into a third access statement, and obtaining one or more objects using the third access statement. The method also includes providing the authorized subset of objects to the user.

NAIL POLISH REMOVER COMPOSITIONS AND METHODS
20180207075 · 2018-07-26 ·

Methods, systems, and apparatus, including computer programs encoded on computer storage media, for a row-level security. One of the methods includes receiving a request for one or more objects. The method includes determining that a type of the one or more requested objects is associated with an object representative of instance level security. The method includes determining access is authorized to at least some of the one or more objects. Determining access includes obtaining a first access statement associated with the type of the one or more objects, obtaining a second access statement associated with the object representative of instance level security, combining at least the first access statement and the second access statement into a third access statement, and obtaining one or more objects using the third access statement. The method also includes providing the authorized subset of objects to the user.

Ester-modified organosilicon-based surfactants, methods of making same and applications containing the same

There is provided herein a polyalkylene-oxide-free surfactant composition comprising an ester-modified organosilicon having the general formula (I)
AO.sub.aR.sup.4.sub.b(BO.sub.cR.sup.11.sub.d).sub.e(C).sub.fD.sub.g.
There is also provided methods for making the ester-modified organosilicon (I) and agricultural, coating, personal care and home care applications containing the polyalkylene-oxide-free surfactant composition.

Ester-modified organosilicon-based surfactants, methods of making same and applications containing the same

There is provided herein a polyalkylene-oxide-free surfactant composition comprising an ester-modified organosilicon having the general formula (I)
AO.sub.aR.sup.4.sub.b(BO.sub.cR.sup.11.sub.d).sub.e(C).sub.fD.sub.g.
There is also provided methods for making the ester-modified organosilicon (I) and agricultural, coating, personal care and home care applications containing the polyalkylene-oxide-free surfactant composition.

Acetone-deficient composition

An acetone deficient composition including at least one polyol, at least one alkyl carbonate, at least one monoalcohol and optionally at least one hydrocarbon based non-volatile oil is provided.

Acetone-deficient composition

An acetone deficient composition including at least one polyol, at least one alkyl carbonate, at least one monoalcohol and optionally at least one hydrocarbon based non-volatile oil is provided.