Compositions are provided for removing nail polish that include a co-mixture of monoalcohol, glycerin, and solvent consisting of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The composition for includes a co-mixture of monoalcohol, glycerin, and solvent that consists of C2-C3 monoalcohol; glycerin; and less than 55% by weight of solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of greater than about 0.6. If the solvent includes C2-C4 alkyl acetate then the concentration of C2-C4 alkyl acetate is less than 30% by weight. The composition further includes polyacrylamide and water. The concentration by weight of water in the composition is less than the concentration by weight of glycerin. Methods are also provided.

Compositions are provided for removing nail polish that include a co-mixture of monoalcohol, glycerin, and solvent consisting of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The composition for includes a co-mixture of monoalcohol, glycerin, and solvent that consists of C2-C3 monoalcohol; glycerin; and less than 55% by weight of solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of greater than about 0.6. If the solvent includes C2-C4 alkyl acetate then the concentration of C2-C4 alkyl acetate is less than 30% by weight. The composition further includes polyacrylamide and water. The concentration by weight of water in the composition is less than the concentration by weight of glycerin. Methods are also provided.

The invention relates to a method for producing a cosmetic composition, comprising at least one polyurethane urea which does not contain any ionically hydrophilizing groups and is dissolved in a solvent or solvent mixture, wherein the solvent consists of one or more monohydroxy-functional alcohol(s), or a solvent mixture that consists of organic solvents and contains ≥50 wt. %, relative to the total weight of the solvent mixture, of at least one monohydroxy-functional alcohol. The invention also relates to a cosmetic composition obtainable according to the method of the invention as well as to a method for forming a cosmetic coating on skin, nails and/or keratin fibers using the cosmetic compositions of the invention. The invention further relates to a sunscreen composition containing a polyurethane urea as well as to said sunscreen composition for protecting skin and/or hair from negative effects of sun rays.

The invention relates to a method for producing a cosmetic composition, comprising at least one polyurethane urea which does not contain any ionically hydrophilizing groups and is dissolved in a solvent or solvent mixture, wherein the solvent consists of one or more monohydroxy-functional alcohol(s), or a solvent mixture that consists of organic solvents and contains ≥50 wt. %, relative to the total weight of the solvent mixture, of at least one monohydroxy-functional alcohol. The invention also relates to a cosmetic composition obtainable according to the method of the invention as well as to a method for forming a cosmetic coating on skin, nails and/or keratin fibers using the cosmetic compositions of the invention. The invention further relates to a sunscreen composition containing a polyurethane urea as well as to said sunscreen composition for protecting skin and/or hair from negative effects of sun rays.

The present invention provides a polymer compound peeling agent usable for peeling as many types of polymer compounds as possible and capable of reducing a burden required for a peeling treatment when a polymer compound having adhered to an adhesion object is peeled. The polymer compound peeling agent for peeling a polymer compound having adhered to an adhesion object contains a photoresponsive liquid crystal material having a phase structure reversibly transitioning between an isotropic phase and a liquid crystal phase due to photoisomerization based on irradiation lights of different wavelengths. When the polymer compound is adhered to the adhesion object, the photoresponsive liquid crystal material is contained in the polymer compound with the phase structure set to the isotropic phase, and the phase structure of the photoresponsive liquid crystal material is allowed to transition from the isotropic phase to the liquid crystal phase by photoisomerization based on the light irradiation.

The present invention provides a polymer compound peeling agent usable for peeling as many types of polymer compounds as possible and capable of reducing a burden required for a peeling treatment when a polymer compound having adhered to an adhesion object is peeled. The polymer compound peeling agent for peeling a polymer compound having adhered to an adhesion object contains a photoresponsive liquid crystal material having a phase structure reversibly transitioning between an isotropic phase and a liquid crystal phase due to photoisomerization based on irradiation lights of different wavelengths. When the polymer compound is adhered to the adhesion object, the photoresponsive liquid crystal material is contained in the polymer compound with the phase structure set to the isotropic phase, and the phase structure of the photoresponsive liquid crystal material is allowed to transition from the isotropic phase to the liquid crystal phase by photoisomerization based on the light irradiation.

The invention relates to compositions for removing nail polish comprising at least at least about 10% by weight of at least one polyhydric alcohol compound, at least one low carbon alcohol, at least one high boiling point ester compound, at least one thickening agent, and at least one abrasive compound, as well as to methods of removing nail polish from nails using such compositions.

The invention relates to compositions for removing nail polish comprising at least at least about 10% by weight of at least one polyhydric alcohol compound, at least one low carbon alcohol, at least one high boiling point ester compound, at least one thickening agent, and at least one abrasive compound, as well as to methods of removing nail polish from nails using such compositions.

A treatment application garment, such as a glove or a sock, is disclosed. The garment allows for various treatments directed toward the fingers and toes, such as the fingernails and toenails. For example, each digit of the garment may contain an absorbent pad containing acetone. The hand or foot is inserted into the garment such that the nail is positioned below the absorbent pad containing the acetone, allowing the acetone to be constantly applied to the nail to remove polish therefrom. After the treatment is complete, the glove may be removed and the open end thereof tied off, thereby containing the acetone and the smell thereof within the glove. Other features and treatments are also disclosed.

A treatment application garment, such as a glove or a sock, is disclosed. The garment allows for various treatments directed toward the fingers and toes, such as the fingernails and toenails. For example, each digit of the garment may contain an absorbent pad containing acetone. The hand or foot is inserted into the garment such that the nail is positioned below the absorbent pad containing the acetone, allowing the acetone to be constantly applied to the nail to remove polish therefrom. After the treatment is complete, the glove may be removed and the open end thereof tied off, thereby containing the acetone and the smell thereof within the glove. Other features and treatments are also disclosed.