The present invention relates to compositions for removing nail polish that include a C2-C3 monoalcohol, at least about 15% glycerin, and at least about 20% by weight of a C2-C4 alkyl acetate, and combinations thereof. The compositions include less water than glycerin. Methods of using these compositions to remove nail polish and moisturize the hands are also provided.

The present invention relates to compositions for removing nail polish that include a C2-C3 monoalcohol, at least about 15% glycerin, and at least about 20% by weight of a C2-C4 alkyl acetate, and combinations thereof. The compositions include less water than glycerin. Methods of using these compositions to remove nail polish and moisturize the hands are also provided.

The invention relates to compositions for removing nail polish comprising at least at least about 10% by weight of at least one polyhydric alcohol compound, at least one low carbon alcohol, at least one high boiling point ester compound, at least one thickening agent, and at least one abrasive compound, as well as to methods of removing nail polish from nails using such compositions.

The invention relates to compositions for removing nail polish comprising at least at least about 10% by weight of at least one polyhydric alcohol compound, at least one low carbon alcohol, at least one high boiling point ester compound, at least one thickening agent, and at least one abrasive compound, as well as to methods of removing nail polish from nails using such compositions.

The invention relates to compositions for removing nail polish including at least about 20% by weight of a C2-C3 monoalcohol, at least about 10% by weight of glycerin, and a diester of a dicarboxylic acid. The compositions optionally include water. The water, if present, is present in a concentration by weight that is less than the concentration by weight of glycerin. If the concentration of glycerin is from 30% to 60% by weight, then the concentration of C2-C3 monoalcohol is at least about 30% by weight.

The invention relates to compositions for removing nail polish including at least about 20% by weight of a C2-C3 monoalcohol, at least about 10% by weight of glycerin, and a diester of a dicarboxylic acid. The compositions optionally include water. The water, if present, is present in a concentration by weight that is less than the concentration by weight of glycerin. If the concentration of glycerin is from 30% to 60% by weight, then the concentration of C2-C3 monoalcohol is at least about 30% by weight.

The present invention relates to compositions for removing nail polish that include a C2-C3 monoalcohol, at least about 15% glycerin, and at least about 20% by weight of a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions include less water than glycerin. Methods of using these compositions to remove nail polish and moisturize the hands are also provided.

The present invention relates to compositions for removing nail polish that include a C2-C3 monoalcohol, at least about 15% glycerin, and at least about 20% by weight of a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions include less water than glycerin. Methods of using these compositions to remove nail polish and moisturize the hands are also provided.

A composition for removing nail polish includes a propylene glycol methyl ether; and a C2-C3 monoalcohol. The C2-C3 monoalcohol and the propylene glycol methyl ether are present in a C2-C3 monoalcohol to propylene glycol methyl ether ratio by weight from about 1:1 to about 20:1. Methods for removing nail polish are also provided.

A composition for removing nail polish includes a propylene glycol methyl ether; and a C2-C3 monoalcohol. The C2-C3 monoalcohol and the propylene glycol methyl ether are present in a C2-C3 monoalcohol to propylene glycol methyl ether ratio by weight from about 1:1 to about 20:1. Methods for removing nail polish are also provided.