The invention relates to compositions for removing nail polish comprising a C2-C3 monoalcohol, glycerin, and propylene carbonate, wherein the glycerin and propylene carbonate are present in a glycerin to propylene carbonate ratio by weight of at least 1:3 and the concentration by weight of ethanol is at least about 16%. Methods of removing nail polish and moisturizing the hands are also provided.

The invention relates to compositions for removing nail polish comprising a C2-C3 monoalcohol, glycerin, and propylene carbonate, wherein the glycerin and propylene carbonate are present in a glycerin to propylene carbonate ratio by weight of at least 1:3 and the concentration by weight of ethanol is at least about 16%. Methods of removing nail polish and moisturizing the hands are also provided.

The present invention relates to a kit for make-up and/or care of nails and/or false nails, comprising: a composition C1 for make-up and/or care of nails and/or false nails comprising at least one film-forming polymer, said polymer being insoluble in acetone, methyl acetate, and ethyl acetate, and a make-up removal composition C2 comprising at least one volatile solvent S2 selected from the group consisting of C.sub.2-C.sub.5 alcohols, C.sub.5-C.sub.12 alkanes, and mixtures thereof, said solvent S2 being able to solubilize the film-forming polymer of composition C1.

The present invention relates to a kit for make-up and/or care of nails and/or false nails, comprising: a composition C1 for make-up and/or care of nails and/or false nails comprising at least one film-forming polymer, said polymer being insoluble in acetone, methyl acetate, and ethyl acetate, and a make-up removal composition C2 comprising at least one volatile solvent S2 selected from the group consisting of C.sub.2-C.sub.5 alcohols, C.sub.5-C.sub.12 alkanes, and mixtures thereof, said solvent S2 being able to solubilize the film-forming polymer of composition C1.

Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions are essentially free of water. The glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 1.2. The concentration of C2-C3 monoalcohol is from 5% by weight to 50% by weight. If the solvent includes C2-C4 alkyl acetate, then the concentration of C2-C3 monoalcohol is from 15% by weight to 50% by weight and the glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 2.0. The composition further includes a polyacrylamide.

Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The compositions are essentially free of water. The glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 1.2. The concentration of C2-C3 monoalcohol is from 5% by weight to 50% by weight. If the solvent includes C2-C4 alkyl acetate, then the concentration of C2-C3 monoalcohol is from 15% by weight to 50% by weight and the glycerin and the solvent are present in a glycerin to solvent weight ratio of at least 2.0. The composition further includes a polyacrylamide.

Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and acetone. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of less than about 0.6. The composition further includes a cellulose polymer soluble in said C2-C3 monoalcohol. The concentration by weight of water in the composition is less than the concentration by weight of glycerin.

Compositions are provided for removing nail polish that include a co-mixture that consists of C2-C3 monoalcohol, glycerin, and acetone. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of less than about 0.6. The composition further includes a cellulose polymer soluble in said C2-C3 monoalcohol. The concentration by weight of water in the composition is less than the concentration by weight of glycerin.

Compositions are provided for removing nail polish that include a co-mixture of monoalcohol, glycerin, and solvent consisting of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The composition for includes a co-mixture of monoalcohol, glycerin, and solvent that consists of C2-C3 monoalcohol; glycerin; and less than 55% by weight of solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of greater than about 0.6. If the solvent includes C2-C4 alkyl acetate then the concentration of C2-C4 alkyl acetate is less than 30% by weight. The composition further includes polyacrylamide and water. The concentration by weight of water in the composition is less than the concentration by weight of glycerin. Methods are also provided.

Compositions are provided for removing nail polish that include a co-mixture of monoalcohol, glycerin, and solvent consisting of C2-C3 monoalcohol, glycerin, and a solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The composition for includes a co-mixture of monoalcohol, glycerin, and solvent that consists of C2-C3 monoalcohol; glycerin; and less than 55% by weight of solvent selected from acetone, a C2-C4 alkyl acetate, and combinations thereof. The glycerin and the C2-C3 monoalcohol are present in a glycerin to C2-C3 monoalcohol weight ratio of greater than about 0.6. If the solvent includes C2-C4 alkyl acetate then the concentration of C2-C4 alkyl acetate is less than 30% by weight. The composition further includes polyacrylamide and water. The concentration by weight of water in the composition is less than the concentration by weight of glycerin. Methods are also provided.