A heterojunction bipolar transistor (HBT) amplifier device includes transistor fingers arranged in parallel on a substrate. Each transistor finger includes a base/collector mesa stripe shaving a trapezoidal shaped cross-section with sloping sides, and having a base stacked on a collector; a set of emitter mesa stripes arranged on the base/collector mesa stripe; and emitter metallization formed over the set of emitter mesa stripes and the base/collector mesa. The emitter metallization includes a center portion for providing electrical and thermal connectivity to the emitter mesa stripes and extended portions extending beyond the base and overlapping onto the sloping sides of the base/collector mesa stripe for increasing thermal coupling to the collector. A common conductive pillar is formed over the transistor fingers for providing electrical and thermal conductivity. Also, thermal shunts are disposed on the substrate between adjacent transistor fingers, where the thermal shunts are electrically isolated from the transistor fingers.

Operating a double-sided double-base bipolar junction transistor. One example is a method of operating a switch assembly, the method comprising: blocking current flow from an upper terminal of the switch assembly to a lower terminal by a transistor; and then responsive to assertion of a conduction signal, conducting a first load current from the upper terminal to a lower terminal. The conducting the first load current may be by: closing an upper-main FET coupled between the upper terminal and an upper collector-emitter of the transistor; closing a lower-main FET coupled between a lower collector-emitter of the transistor and the lower terminal; driving a first turn-on current to an upper base of the transistor from an upper current source; and then providing a first steady-state current to the upper base from the upper current source, the first steady-state current lower than the first turn-on current.

A power amplifier that includes a substrate, and an emitter layer, a base layer, and a collector layer laminated in this order on a major surface of the substrate includes an electrical insulator provided adjacent to the emitter layer, an emitter electrode provided between the substrate and both the emitter layer and the electrical insulator, a base electrode electrically connected to the base layer, and a collector electrode electrically connected to the collector layer. The emitter electrode, the electrical insulator, and the base layer are provided between the substrate and the base electrode in a direction perpendicular to the major surface of the substrate.

Provided is a semiconductor device including a semiconductor substrate, a plurality of gate electrodes disposed on the upper surface portion of the semiconductor substrate and spaced apart from each other, a plurality of emitter electrodes disposed to be overlapped with each of the plurality of gate electrodes, and a collector electrode disposed on the lower surface of the semiconductor substrate.

There is provided a semiconductor device including: a pad portion that is provided above the upper surface of the semiconductor substrate and that is separated from the emitter electrode; a wire wiring portion that is connected to a connection region on an upper surface of the pad portion; a wiring layer that is provided between the semiconductor substrate and the pad portion and that includes a region overlapping the connection region; an interlayer dielectric film that is provided between the wiring layer and the pad portion and that has a through hole below the connection region; a tungsten portion that contains tungsten and that is provided inside the through hole and electrically connects the wiring layer and the pad portion; and a barrier metal layer that contains titanium and that is provided to cover an upper surface of the interlayer dielectric film below the connection region.

There are disclosed herein various implementations of a latch-up free power transistor. Such a device includes an insulated gate situated adjacent to a conduction channel in the power transistor, an emitter electrode in direct physical contact with the conduction channel, and a collector electrode in electrical contact with the conduction channel. The power transistor also includes an emitter layer in contact with a surface of a semiconductor substrate adjacent the conduction channel.

Provided is a method for manufacturing a semiconductor device that improves the reliability of the semiconductor device. An opening is formed in an insulating film formed over a semiconductor substrate. At that time, a mask layer for formation of the opening is formed over the insulating film. The insulating film is dry etched and then wet etched. The dry etching step is finished before the semiconductor substrate is exposed at the bottom of the opening, and the wet etching step is finished after the semiconductor substrate is exposed at the bottom of the opening.

It is aimed to reduce a current concentration at the edge of the contact electrode.

Provided is a semiconductor device including a semiconductor layer, a first trench electrode formed in the semiconductor layer on a front surface side thereof, and a second trench electrode formed in the semiconductor layer on the front surface side thereof so as to oppose the first trench electrode. Here, the first trench electrode is formed in a mesh-like pattern. The semiconductor layer may further include a first-conductivity-type region and a second-conductivity-type region having a different conductivity type than the first-conductivity-type region. The first trench electrode may be electrically connected to the first-conductivity-type region, and the second trench electrode may be electrically connected to the second-conductivity-type region.

A power semiconductor device includes a semiconductor substrate layer of a first conductive type which has a lower part semiconductor layer of a second conductive type and an active region that includes a body region of the second conductive type, a source region of the first conductive type disposed in the body region, and a first doped region of the first conductive type at least a part of which is disposed below the body region. An emitter electrode is electrically connected to the source region, and a groove extends into the substrate layer and includes a shielding electrode electrically connected to the emitter electrode. The groove extends to a deeper depth into the substrate layer than the first doped region. At least a part of a gate is formed above at least a part of the source region and the body region, and is electrically insulated from the shielding electrode.

A semiconductor device includes a plurality of metal patterns formed on a ceramic substrate, and a semiconductor chip mounted on some of the plurality of metal patterns. Also, a plurality of hollow portions are formed in peripheral portions of the plurality of metal patterns. In addition, the plurality of hollow portions are not formed in a region overlapping the semiconductor chip in the plurality of metal patterns. Furthermore, the plurality of hollow portions are provided in a plurality of metal patterns arranged at a position closest to the peripheral portion of the top surface of the ceramic substrate among the plurality of metal patterns.