A semiconductor device includes a substrate including a first active region and a second active region, the first active region having a conductivity type that is different than a conductivity type of the second active region, and the first active region being spaced apart from the second active region in a first direction, gate electrodes extending in the first direction, the gate electrodes intersecting the first active region and the second active region, a first shallow isolation pattern disposed in an upper portion of the first active region, the first shallow isolation pattern extending in the first direction, and a deep isolation pattern disposed in an upper portion of the second active region, the deep isolation pattern extending in the first direction, and the deep isolation pattern dividing the second active region into a first region and a second region.

An IO cell includes a first output transistor and a second output transistor. A capacitance transistor is provided between external connection pads. The capacitance transistor is placed between the output transistors and an edge of the semiconductor integrated circuit device as viewed in plan. The gate length of the capacitance transistor is smaller than the gate length of the output transistors.

A semiconductor device includes first, second, and third power rails extending in a first direction on a substrate and sequentially spaced apart in a second direction intersecting the first direction. A fourth power rail extends in the first direction on the substrate between the first and third power rails. A first well of a first conductive type is displaced inside the substrate between the first and third power rails. Cells are continuously displaced between the first and third power rails and share the first well. The first and third power rails are provided with a first voltage, the second power rail is provided with a second voltage different from the first voltage, the fourth power rail is provided with a third voltage different from the first voltage and the second voltage, and the cells are provided with the third voltage from the fourth power rail.

The present disclosure attempts to provide a capacitor cell having a large capacitance value per unit area in a semiconductor integrated circuit device using a three-dimensional transistor device. A logic cell includes a three-dimensional transistor device. A capacitor cell includes a three-dimensional transistor device. A length of a portion, of a local interconnect, which protrudes from a three-dimensional diffusion layer in a direction away from a power supply interconnect in the capacitor cell is greater than a length of a portion, of a local interconnect, which protrudes from a three-dimensional diffusion layer in a direction away from a power supply interconnect in the logic cell.

A semiconductor device has: a first chip having a substrate and a first wiring layer; and a second wiring layer formed on a second surface of the substrate. The second wiring layer has a first power supply line, and a second power supply line. The first chip has a first ground line, a third power supply line, a fourth power supply line, vias formed in the substrate and connecting the first power supply line and the third power supply line, a first area in which the first ground line and the fourth power supply line are arranged, and a first circuit connected between the first ground line and the third power supply line. A switch is connected between the first power supply line and the second power supply line. In a plan view, the third power supply line, the vias, and the first circuit are arranged in the first area.

Various implementations described herein refer to a method. The method may be configured to synthesize standard cells for a physical design having a power supply net with power supply rails. The method may be configured to employ a place-and-route tool so as to define edge-types for each standard cell of the standard cells in the physical design based on the power supply net and the power supply rails that touch at least one edge of each standard cell of the standard cells.

According to one implementation of the present disclosure, a power grid comprising: one or more cells; a metal layer; first and second buried power rails; and one or more local interconnects, wherein one or more local interconnect stitches are configured to electrically couple the one or more cells to either of the first or second buried power rails through the metal layer and the one or more local interconnects.

A structure for extracting interconnect parasitic in a ring oscillator is disclosed. The ring oscillator comprises multiple logical units connected in head to tail series. The structure comprises parasitic resistance sub-structures and/or parasitic capacitance sub-structures each connected to a corresponding logical unit. The structure can be used to determine errors in extracting parasitic resistance of polysilicon interconnects and metal interconnects, and/or errors in extracting parasitic capacitance between the polysilicon interconnects and between the metal interconnects. Therefore, the parasitic extraction error can be calibrated accordingly to obtain more precise circuit simulation results and more accurate device model and BEOL model.

A semiconductor device employs surrounding gate transistors (SGTs) which are vertical transistors to constitute a CMOS NAND circuit. The NAND circuit is formed by using a plurality of MOS transistors arranged in m rows and n columns. The MOS transistors constituting the NAND circuit are formed on a planar silicon layer disposed on a substrate, and each have a structure in which a drain, a gate, and a source are arranged in a vertical direction, the gate surrounding a silicon pillar. The planar silicon layer includes a first active region having a first conductivity type and a second active region having a second conductivity type. The first active region and the second active region are connected to one another via a silicon layer formed on a surface of the planar silicon layer. This provides for a semiconductor device that constitutes a NAND circuit.

An IC device includes first and second power rails extending in a first direction and carrying one of a power supply or reference voltage, a third power rail extending between the first and second power rails and carrying the other of the power supply or reference voltage, and a plurality of transistors including first through fourth active areas extending between the first and second power rails, a plurality of gate structures extending perpendicularly to the first direction, and first and second conductive segments extending in the second direction across the third power rail. Each of the second and third active areas is adjacent to the third power rail, each of the first and second conductive segments is electrically connected to S/D structures in each of the second and third active areas, and the plurality of transistors is configured as one of an AOI, an OAI, or a four-input NAND gate.