Methods for characterizing an environmental contaminant containing a PFAS formulation. The methods involve obtaining environmental samples with the PFAS formulation, creating a dilution series of the PFAS formulation, determining the static surface tension for each dilution, and plotting the static surface tension against the logarithm of the PFAS formulation concentration to generate an emergent behavior curve. Utilizing this curve, PFAS formulation concentration can be assigned within non-emergent dispersive, weakly emergent, and strongly emergent behavior concentration ranges, provides a systematic and efficient method for determining environmental sites most likely to shed additional PFAS into the environment. The emergent behavior curve also permits total PFAS formulation concentration to be effectively measured in real time, and to be converted into total PFAS TOPs concentration.

The invention is an apparatus and method for sterilizing waste and, optionally, producing a biofuel. The method utilizes an apparatus for sterilizing waste by dehydrating it at ambient pressure or reduced pressure, maintaining the waste temperature above 0 C., collecting the distillate, applying a rough vacuum, sterilizing the waste by creating a plasma, and collecting the residual from the process. The rough vacuum must be between 133 Pa (1 torr) and 13 Pa (0.1 torr), and the plasma is a low-energy plasma having an energy of 50 to 300 Watts.

The invention is an apparatus and method for sterilizing waste and, optionally, producing a biofuel. The method utilizes an apparatus for sterilizing waste by dehydrating it at ambient pressure or reduced pressure, maintaining the waste temperature above 0 C., collecting the distillate, applying a rough vacuum, sterilizing the waste by creating a plasma, and collecting the residual from the process. The rough vacuum must be between 133 Pa (1 torr) and 13 Pa (0.1 torr), and the plasma is a low-energy plasma having an energy of 50 to 300 Watts.

Systems and methods are provided for degrading PFAS in a semi-solid sample. The semi-solid sample includes PFAS molecules in a partially liquid solution. An electron donor, and optionally a surfactant, are introduced into the mixture, forming micelles. An electron donor associates with the micelle surface and releases hydrated electrons upon exposure to UV light to initiate the reductive defluorination reaction, resulting in fluoride, water, and simple carbon compounds.

Systems and methods are provided for degrading PFAS in a semi-solid sample. The semi-solid sample includes PFAS molecules in a partially liquid solution. An electron donor, and optionally a surfactant, are introduced into the mixture, forming micelles. An electron donor associates with the micelle surface and releases hydrated electrons upon exposure to UV light to initiate the reductive defluorination reaction, resulting in fluoride, water, and simple carbon compounds.

A method for decontaminating residual halogen species in a processed metal-containing layer without breaking vacuum includes processing a metal-containing layer (such as a metal oxide layer) using a halogen-containing process gas to form a processed metal-containing layer that includes residual halogen species, and chemically modifying the residual halogen species to form modified residual species using a reactive gas to decontaminate the residual halogen species. Decontamination may include neutralization and/or removal of the residual halogen species. The metal-containing layer may be an organometal oxide photoresist and processing with the halogen-containing process gas may form a patterned photoresist layer contaminated with the residual halogen species. The modified residual species may be further treated using dinitrogen plasma (pure or with additional gases) and/or additional reactive gases, both of which may be combined with maintaining and higher or lower temperature during the treatment.

A method for decontaminating residual halogen species in a processed metal-containing layer without breaking vacuum includes processing a metal-containing layer (such as a metal oxide layer) using a halogen-containing process gas to form a processed metal-containing layer that includes residual halogen species, and chemically modifying the residual halogen species to form modified residual species using a reactive gas to decontaminate the residual halogen species. Decontamination may include neutralization and/or removal of the residual halogen species. The metal-containing layer may be an organometal oxide photoresist and processing with the halogen-containing process gas may form a patterned photoresist layer contaminated with the residual halogen species. The modified residual species may be further treated using dinitrogen plasma (pure or with additional gases) and/or additional reactive gases, both of which may be combined with maintaining and higher or lower temperature during the treatment.

A thermal destruction reservoir system and a method of using the same to thermally destroy certain chemical and/or biological materials. The reservoir relies upon the use of a sheet comprising potassium perchlorate and iron dispersed in a polymeric binder.

A thermal destruction reservoir system and a method of using the same to thermally destroy certain chemical and/or biological materials. The reservoir relies upon the use of a sheet comprising potassium perchlorate and iron dispersed in a polymeric binder.