A termination region of an IGBT is described, in which surface p-rings are combined with oxide/polysilicon-filled trenches, buried p-rings and surface field plates, so as to obtain an improved distribution of potential field lines in the termination region. The combination of surface ring termination and deep ring termination offers a significant reduction in the amount silicon area which is required for the termination region.

A semiconductor device includes a drift layer 20 of a first conductivity type, a base layer 30 of a second conductivity type that is disposed on the drift layer 20 and is connected to a source electrode 90, and a column layer 50 of a second conductivity type that is connected to the source electrode 90 and penetrates the base layer 30 to extend into the drift layer 20.

An object of the present invention is to provide a semiconductor device capable of eliminating unevenness of current distribution in a plane. A semiconductor device according to the present invention is a semiconductor device including a transistor cell region where a plurality of transistor cells is arranged on a semiconductor substrate, the semiconductor device including an electrode pad which is arranged avoiding the transistor cell region on the semiconductor substrate and is electrically connected to a one-side current electrode of each of the cells, in which the transistor cell region contains a plurality of regions each of which has a different current drive capability from each other depending on a distance from the electrode pad.

A method for manufacturing an isolation structure integrated with semiconductor device includes following steps. A substrate is provided. A plurality of trenched gates is formed in the substrate. A first insulating layer and a second insulating layer are sequentially deposited on the substrate. A first etching process is performed to remove portions of the second insulating layer to expose portions of the first insulating layer. A second etching process is then performed to remove the exposed second insulating layer to expose the trenched gates and to define at least an active region.

A semiconductor wafer processing system for processing a semiconductor wafer is presented. The semiconductor wafer processing system comprises: a trench production apparatus configured to produce trenches in the semiconductor wafer, the trenches being arranged next to each other along a first lateral direction (X); a trench filling apparatus configured to epitaxially fill the trenches with a doped semiconductor material; and a controller operatively coupled to at least one of the trench production apparatus and the trench filling apparatus, wherein the controller is configured to control at least one of the trench production apparatus and the trench filling apparatus in dependence of a parameter, the parameter being indicative of at least one of a variation of dopant concentrations of the doped semiconductor material along the first lateral direction (X) that is to be expected when carrying out the epitaxially filling and a deviation of an expected average of the dopant concentrations from a predetermined nominal value.

A semiconductor device is provided including a transistor cell in a semiconductor substrate having a first main surface. The transistor cell includes a gate electrode in a gate trench in the first main surface adjacent to a body region. A longitudinal axis of the gate trench extends in a first direction parallel to the first main surface. A source region, a body region and a drain region are disposed along the first direction. A source contact comprises a first source contact portion and a second source contact portion. The second source contact portion is disposed at a second main surface of the semiconductor substrate. The first source contact portion includes a source conductive material in direct contact with the source region and a portion of the semiconductor substrate arranged between the source conductive material and the second source contact portion.

A power semiconductor transistor includes a semiconductor body coupled to a load terminal, a drift region, a first trench extending into the semiconductor body and including a control electrode electrically insulated from the semiconductor body by an insulator, a source region arranged laterally adjacent to a sidewall of the first trench and electrically connected to the load terminal, a channel region arranged laterally adjacent to the same trench sidewall as the source region, a second trench extending into the semiconductor body, and a guidance zone electrically connected to the load terminal and extending deeper into the semiconductor body than the first trench. The guidance zone is adjacent the opposite sidewall of the first trench as the source region and adjacent one sidewall of the second trench. In a section arranged deeper than the bottom of the first trench, the guidance zone extends laterally towards the channel region.

A semiconductor device having a vertical drain extended MOS transistor may be formed by forming deep trench structures to define vertical drift regions of the transistor, so that each vertical drift region is bounded on at least two opposite sides by the deep trench structures. The deep trench structures are spaced so as to form RESURF regions for the drift region. Trench gates are formed in trenches in the substrate over the vertical drift regions. The body regions are located in the substrate over the vertical drift regions.

Switch devices using switch transistors with dual gates are provided. The dual gates may be controlled independently from each other by first and second gate driver circuits.

Metal layout for radio-frequency (RF) switches. In some embodiments, an RF switching device can include a plurality of field-effect transistors (FETs) arranged in series to form a stack. Each of at least some of the FETs can include a source contact and a drain contact, a first group of fingers electrically connected to the source contact, and a second group of fingers electrically connected to the drain contact and arranged in an interleaved configuration with the first group of fingers. At least some of the first group of fingers and the second group of fingers can include a first metal M1 and a second metal M2 arranged in a stack. At least one of the first metal M1 and the second metal M2 can include a tapered portion to yield a current carrying capacity that varies as a function of location along a direction in which the corresponding finger extends.