A power module includes a number of sub-modules connected via removable jumpers. The removable jumpers allow the connections between one or more power semiconductor die in the sub-modules to be reconfigured, such that when the removable jumpers are provided, the power module has a first function and when the removable jumpers are removed, the power module has a second function. The removable jumpers may also allow for independent testing of the sub-modules. The power module may also include a multi-layer printed circuit board (PCB), which is used to connect one or more contacts of the power semiconductor die. The multi-layer PCB reduces stray inductance between the contacts and therefore improves the performance of the power module.

A method of manufacturing a semiconductor device includes forming a second SiC layer of a first conductivity type on a first SiC layer by epitaxial growth, forming a first region of a second conductivity type by selectively ion-implanting first impurities of the second conductivity type into the second SiC layer, removing a portion of the first region, forming a third SiC layer of the first conductivity type on the second SiC layer by epitaxial growth, and forming a second region of the second conductivity type on the first region by selectively ion-implanting second impurities of the second conductivity type into the third SiC layer.

The present invention relates to a single-crystal silicon-carbide substrate provided with a principal surface having an atomic step-and-terrace structure containing atomic steps and terraces derived from a crystal structure, in which the atomic step-and-terrace structure has a proportion of an average line roughness of a front edge portion of the atomic step to a height of the atomic step being 20% or less.

Methods and structures for forming strained-channel FETs are described. A strain-inducing layer may be formed under stress in a silicon-on-insulator substrate below the insulator. Stress-relief cuts may be formed in the strain-inducing layer to relieve stress in the strain-inducing layer. The relief of stress can impart strain to an adjacent semiconductor layer. Strained-channel, fully-depleted SOI FETs and strained-channel finFETs may be formed from the adjacent semiconductor layer. The amount and type of strain may be controlled by etch depths and geometries of the stress-relief cuts and choice of materials for the strain-inducing layer.

Semiconductor devices including a dummy gate structure on a fin are provided. A semiconductor device includes a fin protruding from a substrate. The semiconductor device includes a source/drain region in the fin, and a recess region of the fin that is between first and second portions of the source/drain region. Moreover, the semiconductor device includes a dummy gate structure overlapping the recess region, and a spacer that is on the fin and adjacent a sidewall of the dummy gate structure.

A semiconductor device includes trench gate structures in a semiconductor body with hexagonal crystal lattice. A mean surface plane of a first surface is tilted to a <1-100> crystal direction by an off-axis angle, wherein an absolute value of the off-axis angle is in a range from 2 degree to 12 degree. The trench gate structures extend oriented along the <1-100> crystal direction. Portions of the semiconductor body between neighboring trench gate structures form transistor mesas. Sidewalls of the transistor mesas deviate from a normal to the mean surface plane by not more than 5 degree.

A memory system includes a first memory bank, a first path selector, a second memory bank, a second path selector, and a sensing device. The first memory bank includes a plurality of first memory cells. The second memory bank includes a plurality of second memory cells. The first path selector includes a plurality of input terminals coupled to the first memory cells through a plurality of first bit lines, and two output terminals. The second path selector includes a plurality of input terminals coupled to the second memory cells through a plurality of second bit lines, and two output terminals. The sensing device is coupled to the output terminals of the first bank selector and the second bank selector, and senses the difference between currents outputted from two of the reference current source, and the terminals of the two bank selectors according to the required operations.

A non-volatile memory (NVM) includes a fin structure, a first fin field effect transistor (FinFET), a second FinFET, an antifuse structure, a third FinFET, and a fourth FinFET. The antifuse structure is formed on the fin structure and has a sharing gate, a single diffusion break (SDB) isolation structure, a first source/drain region, and a second source/drain region. The SDB isolation structure isolates the first source/drain region and the second source/drain region. The first FinFET, the second FinFET and the first antifuse element compose a first one time programmable (OTP) memory cell, and the third FinFET, the fourth FinFET and the second antifuse element compose a second OTP memory cell. The first OTP memory cell and the second OTP memory cell share the antifuse structure.

A charge pump circuit includes a voltage input port, a voltage output port, a plurality of charge pump units cascaded between the voltage input port and the voltage output port, a clock signal source, and N clock delay elements. The clock signal source generates a main clock signal and the N clock delay elements generate clock signals received by the charge pump units by delaying the main clock signal. The main clock signal received by the first charge pump unit has a rising edge leading a rising edge of the last clock signal received by the last charge pump unit, and a falling edge lagging the rising edge of the last clock signal. Each of the charge pump units includes two sets of inverters with delay elements for generating two complementary clock signals.

A FinFET system comprises a first inverter comprising a first p-type pull-up transistor (PU) and a first n-type pull-down transistor (PD connected in series with the first PD, a second inverter cross-coupled to the first inverter comprising a second PU and a second PD connected in series with the second PD, a first pass-gate transistor, wherein the first pass-gate transistor is coupled between the first inverter and a first bit line, a second pass-gate transistor, wherein the second pass-gate transistor is coupled between the second inverter and a second bit line, a first dummy transistor coupled to a first common node of the first PU and the first PD and a second dummy transistor coupled to a second common node of the second PU and the second PD.