A liquid crystal display device including a first substrate, a second substrate disposed so as to face the first substrate and a liquid crystal layer disposed between the first and the second substrates, the first substrate including: a display area portion in which a plurality of pixels are arranged in a manner of a matrix; and a frame edge area lying outside the display area portion, the frame edge area including a peripheral circuit configured to drive the plurality of pixels of the display area portion, the peripheral circuit having at least one transistor, wherein a channel area of the transistor is covered with a conductive layer via an inorganic insulating layer, the inorganic insulating layer and the conductive layer being stacked in a direction orthogonal to a surface of the first substrate in the stated order, and a predetermined negative potential is applied to the conductive layer.

The present invention provides a manufacture method of a TFT substrate structure and a TFT substrate structure. In the manufacture method of the TFT substrate structure, as manufacturing the gate, a plurality of metal sections distributed in spaces are formed at two sides of the gate, and the gate and the plurality of metal sections are employed to be a mask to implement ion implantation to the polysilicon layer. In the TFT substrate structure according to the present invention, the undoped areas are formed among the n-type heavy doping areas while forming the n-type heavy doping areas at the polysilicon layer.

An electronic display includes a substrate and a thin-film transistor (TFT) layer deposited on a top surface of the substrate. The TFT layer includes a plurality of driving TFTs that are configured to provide current to one or more organic light emitting diodes (OLEDs). The electronic display also includes an emission layer deposited on a top surface of the TFT layer. The emission layer includes emission areas and non-emission areas that separate the emission areas. The emission areas include a plurality of OLEDs and each of the OLEDs are configured to be driven by one or more of the TFTs to emit light. The electronic display also includes a reflective layer formed on a bottom surface of the substrate. The reflective layer is configured to reflect at least some of the light emitted from the OLEDs toward the non-emission areas.

As a cost effective alternative to lithography, there is provided a method of forming an electronic device comprising the steps of: depositing a first quantity of a first liquid medium comprising a dopant on a first portion of a planar surface and depositing a second quantity of the first liquid medium on a second portion of the surface, the first quantity spaced from the second quantity by a gap; heating the first quantity, the second quantity, and the surface, the heating configured to cause diffusion of at least some of the dopant from the first liquid medium into the surface; depositing a dielectric material on the surface in the gap; selectively removing the first quantity and the second quantity from the surface; depositing an electrical contact on each of the first portion and the second portion; and depositing a further electrical contact on the dielectric material.

A complementary metal oxide semiconductor (CMOS) device includes a p-channel metal oxide semiconductor (PMOS) transistor unit and an n-channel metal oxide semiconductor (NMOS) transistor unit. A semiconductor layer of the PMOS transistor unit between source and drain electrodes thereof is divided into a first tapered region having an ion concentration of CP/e and a first flat region having an ion concentration of CP/f. A semiconductor layer of the NMOS transistor unit between source and drain electrodes thereof is divided into a second tapered region having an ion concentration of CN/e, a second flat region having an ion concentration of CN/f2 and a third flat region located between the second tapered region and second flat region and having an ion concentration of CN/f1, wherein the ion concentrations have a relationship of CP/e<CP/f<CN/f2<CN/e<CN/f1.

A display apparatus includes a protective layer, a substrate including a non-display area adjacent to a display area, and a sub-pixel in the display area and including a conductive layer, an inorganic insulating layer on the conductive layer, an organic insulating layer on the inorganic insulating layer, and a display device connected to the conductive layer. The display apparatus further includes a power supply line including a first power supply line and a second power supply line electrically connected to the sub-pixel; and an insulating dam as at least one layer in the non-display area. The non-display area includes the insulating dam, the power supply line are placed, and a spaced area which does not include the organic insulating layer. The protective layer covers an exposed portion of the power supply line.

Provided are liquid crystal display and the method for manufacturing the same. According to an aspect of the present invention, there is provided a liquid crystal display device, including a first substrate; a gate electrode disposed on the first substrate; a semiconductor pattern layer disposed on the gate electrode; and a source electrode and a drain electrode disposed on the semiconductor pattern layer and facing each other, wherein a diffusion prevention pattern is disposed on the semiconductor pattern layer to prevent diffusion into the semiconductor pattern layer or to maintain uniform thickness of the semiconductor pattern layer.

A display device includes a pixel array section, the pixel array section having pixels arranged in a matrix form, at least one of the pixels including an electro-optical element, a write transistor, a capacitor, a drive transistor, and a switching transistor. A write scan line is disposed for each pixel row of the pixel array section and adapted to convey a write signal to be applied to a gate electrode of the write transistor. The wiring structure of the write scan line does not cross a wiring pattern connected to a gate electrode of the drive transistor.

Disclosed herein is a display apparatus, including, a panel having a plurality of pixels disposed in a matrix and each including a self-luminous element for emitting light, the panel including first to third conductive layers laminated in order on a supporting substrate, a first contact portion between the first and second conductive layers and a second contact portion between the second and third conductive layers being disposed at the same position in a planar direction.

In accordance with some embodiments of the disclosed subject of matter, a TFT array substrate, a method for fabricating the TFT array substrate, and a display panel that comprises the TFT array substrate are provided. In some embodiments, the TFT array substrate comprises: a substrate; an active layer comprising a first region, a source region, a drain region, and a second region between the drain region and the first region; a gate electrode above the first insulating layer, wherein the gate electrode substantially covers the first region; and a first light-shielding layer that overlaps with the first region and substantially covers the second region.