A faade element having a transparent cover plate and an opaque back element mounted on the cover plate. The cover plate has an outer surface facing the external environment and an inner surface facing the back element. The outer surface has a patterned region on which an interference layer is arranged. Alternatively, the interference layer is arranged on the inner surface. The inner surface and/or the outer surface have a patterned region having a height profile with hills and valleys. A portion of the patterned region is composed of flat segments that are inclined relative to the plane of the cover plate.

Provided are a solar cell, a method for preparing a photovoltaic module, and a photovoltaic module. The solar cell includes: a substrate, a first dielectric layer and a first doped conductive layer. The substrate has a first surface and a second surface opposite to the first surface. The first surface includes alternating electrode regions and non-electrode regions, and transition regions, each respective transition region of the transition regions being abutted on one side by a respective electrode region of the electrode regions and on an opposing side by a respective non-electrode region of the non-electrode regions. The transition region includes a plurality of spaced first pyramid structures and a plurality of micro-convex structures, and a one-dimensional size of a bottom of a respective micro-convex structure is smaller than a one-dimensional size of a bottom of a respective first pyramid structure.

A preparation method for a solar cell includes: providing a silicon substrate having a first surface and a second surface opposite to the first surface; sequentially depositing an oxide layer, a doped amorphous silicon layer and a silicon oxide mask layer on the first surface of the silicon substrate; annealing the silicon substrate to transform the doped amorphous silicon layer into a doped polysilicon layer; patterning the first surface using a laser to destroy or remove the silicon oxide mask layer and the doped polysilicon layer in a preset region and retaining the entire or part of the oxide layer to form a patterned region.

Embodiments of the present application relate to a charge storage structure and a method for manufacturing the charge storage structure. The charge storage structure according to an embodiment includes a wafer, a first polar region, and a second polar region. The wafer has a first surface and a second surface opposite to the first surface, wherein the first surface has a first texture, and the second surface includes a first part with a second texture and a second part connected to the first part; the first polar region is configured to be in contact with the first part of the second surface; the second polar region is spaced apart from the first polar region and is configured to be adjacent to the second part of the second surface; and the first texture is different from the second texture. The charge storage structure and the method for manufacturing the charge storage structure provided in the embodiments of the present application have the advantages of lower manufacturing cost and higher manufacturing efficiency, and can flexibly set a texture on a front surface of a battery and a texture in an opening of a back surface of the battery according to specific needs, so as to meet different product requirements.

A solar cell, a method for producing a solar cell and a solar cell module are provided. The solar cell includes: a substrate having a front surface and a rear surface opposite to the front surface; a first passivation layer, a second passivation layer and a third passivation layer sequentially formed on the front surface and in a direction away from the front surface; wherein the first passivation layer includes a dielectric material; the second passivation layer includes a first silicon nitride Si.sub.mN.sub.n material, and a ratio of n/m is 0.51; the third passivation layer includes a silicon oxynitride SiO.sub.iN.sub.j material, and a ratio of j/i is 0.10.6; and a tunneling oxide layer and a doped conductive layer sequentially formed on the rear surface and in a direction away from the rear surface, wherein the doped conductive layer and the substrate have a doping element of a same conductivity type.

The method for preparing a solar cell includes providing a substrate having a first surface and a second surface opposite to the first surface; forming a doped layer and a first passivation layer stacked sequentially in a direction away from the substrate on the first surface; forming a second passivation layer on the second surface; forming multiple first grid line electrodes arranged at intervals on the surface of the first passivation layer away from the substrate, and forming multiple second grid line electrodes arranged at intervals on the surface of the second passivation layer away from the substrate; performing a laser processing on the multiple first grid line electrodes and an adjacent region of the multiple first grid line electrodes, and applying a reverse current between the multiple first grid line electrodes and the multiple second grid line electrodes.

Provided are a solar cell, a method for preparing a photovoltaic module, and a photovoltaic module. The solar cell includes: a substrate, a first dielectric layer and a first doped conductive layer. The substrate has a first surface and a second surface opposite to the first surface. The first surface includes alternating electrode regions and non-electrode regions, and transition regions, each respective transition region of the transition regions being abutted on one side by a respective electrode region of the electrode regions and on an opposing side by a respective non-electrode region of the non-electrode regions. The transition region includes a plurality of spaced first pyramid structures and a plurality of micro-convex structures, and a one-dimensional size of a bottom of a respective micro-convex structure is smaller than a one-dimensional size of a bottom of a respective first pyramid structure.

At least one surface of a cell body of a photovoltaic cell includes a first area and a second area; the first area is configured as a textured structure; the second area is configured as a plurality of pits having a projection size of 0.5 to 100 microns on the surface of the cell body.

Local patterning and metallization of semiconductor structures using a laser beam, e.g., micro-electronic devices, semiconductor substrates and/or solar cells, are described. For example, a method of fabricating a solar cell includes providing a substrate having an intervening layer thereon. The method also includes locating a metal foil over the intervening layer. The method also includes exposing the metal foil to a laser beam, wherein exposing the metal foil to the laser beam forms openings in the intervening layer and forms a plurality of conductive contact structures electrically connected to portions of the substrate exposed by the openings.

Implementations relating to a back contact solar cell and its preparation method are provided in this disclosure. In an implementation, a back contact solar cell includes a silicon substrate having a first surface. The first surface comprises a first conductive region, a second conductive region, and an insulation region located between the first conductive region and the second conductive region. The back contact solar cell further comprises a first transport layer located on the first conductive region and a second transport layer located on the second conductive region. The second transport layer extends from the second conductive region through the insulation region to the first conductive region, and partially covers the first transport layer, wherein a thickness of a first portion of the second transport layer located on the insulation region is greater than a thickness of a second portion of the second transport layer located on the second conductive region.