A semiconductor device is disclosed, and the semiconductor device comprises: a semiconductor layer; and a transparent electrode which is formed from a resistance switching material and is formed on one side of the semiconductor layer, wherein the transparent electrode includes a channel on which an electron is capable of hopping and a conductive path formed by applying a voltage that is a threshold voltage or more, and the threshold voltage for forming the conductive path is lowered by the channel.

Systems and methods for electronic devices are presented. A device includes a substrate. An Indium Gallium Nitride (InGaN) nanoring is formed over the substrate. The InGaN nanoring includes an alloy of Indium Nitride (InN) and Gallium Nitride (GaN). The alloy includes at least 6 percent Indium. A GaN layer may be formed over the InGaN nanoring, and a first electrode is formed over the GaN layer. In one embodiment, the alloy includes less than about 70 percent Indium.

A solid-state light source (SSLS) with light modulation control is described. A SSLS device can include a main p-n junction region configured for recombination of electron-hole pairs for light emission. A supplementary p-n junction region is proximate the main p-n junction region to supplement the recombination of electron-hole pairs, wherein the supplementary p-n junction region has a smaller electron-hole life time than the electron-hole life time of the main p-n junction region. The main p-n junction region and the supplementary p-n junction region operate cooperatively in a light emission state and a light turn-off-state. In one embodiment, the recombination of electron-hole pairs occurs in the main p-n junction region during a light emission state, and the recombination of electron-hole pairs occurs in the supplementary p-n junction region light during the light turn off-state.

A semiconductor light-emitting device includes a light-emitting structure including a first conductivity-type semiconductor layer, an active layer, and a second conductivity-type semiconductor layer, and a magnetic layer on the light-emitting structure. The magnetic layer may have at least one magnetization direction that is parallel to an upper surface of the active layer. The magnetic layer may generate a magnetic field that is parallel to the upper surface of the active layer. The magnetic layer may include multiple structures that may have different magnetization directions. Multiple magnetic layers may be included on the light-emitting structure. A magnetic layer may be on a contact electrode. A magnetic layer may be isolated from a pad electrode.

The invention relates to a light emitting diode, which comprises a substrate and a semiconductor epitaxy structure. The semiconductor epitaxial structure is disposed on the substrate. The semiconductor epitaxial structure comprises semiconductor composite layers and a plurality of current spreading layers which are disposed among the semiconductor composite layers. The doping concentrations of the upper and lower adjacent current spreading layers are alternately high and low.

A nitride semiconductor light-emitting element includes an N-type cladding layer, an N-side guide layer, an active layer, a P-type cladding layer, and a P-side guide layer (an upper P-side guide layer) and an electron blocking layer that are disposed between the active layer and the P-type cladding layer. The N-type cladding layer, the N-side guide layer, the P-side guide layer, the electron blocking layer, and the P-type cladding layer contains Al. The active layer includes an N-side barrier layer, a well layer disposed above the N-side barrier layer, and a P-side barrier layer disposed above the well layer. The average band gap energy of the P-side barrier layer is greater than the average band gap energy of the N-side barrier layer. A thickness of the P-side barrier layer is less than a thickness of the N-side barrier layer.

Light-emitting devices and methods for making light-emitting devices. A light-emitting device includes a high-field electrode, a collector electrode, and a light generating region. The collector electrode is operatively coupled to one side of the light generating region, and the high-field electrode is operatively coupled to another side of the light generating region opposite the collector electrode. The high-field electrode includes protruding electrode elements that extend into the light generating region and toward the collector electrode. The protruding electrode elements accelerate carriers in the light generating region in response to a voltage being applied between the high-field electrode and the collector electrode. The carriers have sufficient kinetic energy to create electron-hole pairs in the light generating region through impact ionization. When these electron-hole pairs recombine, at least a portion of the recombination events emit a photon with an energy corresponding to the bandgap of the light generating region.

Light-emitting devices and methods for making light-emitting devices. A light-emitting device includes a high-field electrode, a collector electrode, and a light generating region. The collector electrode is operatively coupled to one side of the light generating region, and the high-field electrode is operatively coupled to another side of the light generating region opposite the collector electrode. The high-field electrode includes protruding electrode elements that extend into the light generating region and toward the collector electrode. The protruding electrode elements accelerate carriers in the light generating region in response to a voltage being applied between the high-field electrode and the collector electrode. The carriers have sufficient kinetic energy to create electron-hole pairs in the light generating region through impact ionization. When these electron-hole pairs recombine, at least a portion of the recombination events emit a photon with an energy corresponding to the bandgap of the light generating region.

Solid state lighting (SSL) devices with improved contacts and associated methods of manufacturing are disclosed herein. In one embodiment, an SSL device includes an SSL structure having a first semiconductor material, a second semiconductor material spaced apart from the first semiconductor material, and an active region between the first and second semiconductor materials. The SSL device also includes a first contact on the first semiconductor material and a second contact on the second semiconductor material, where the first and second contacts define the current flow path through the SSL structure. The first or second contact is configured to provide a current density profile in the SSL structure based on a target current density profile.

The group III nitride semiconductor light emitting element according to this disclosure has, on a substrate, an n-type semiconductor layer, a light emitting layer, a p-type AlGaN electron blocking layer, a p-type contact layer and a p-side reflection electrode, in this order, wherein, a center emission wavelength of light emitted from the light emitting layer is 250 nm or greater and 330 nm or smaller, the Al composition ratio of the p-type AlGaN electron blocking layer is 0.40 or greater and 0.80 or smaller, the film thickness of the p-type contact layer is 10 nm or greater and 50 nm or smaller, and the p-type contact layer has a p-type AlGaN contact layer having Al composition ratio of 0.03 or greater and 0.25 or smaller.