In some embodiments, the present disclosure relates to a method of forming an integrated chip. The method includes forming a lower electrode layer over a substrate, and an un-patterned amorphous initiation layer over the lower electrode layer. An intermediate ferroelectric material layer is formed have a substantially uniform amorphous phase on the un-patterned amorphous initiation layer. An anneal process is performed to change the intermediate ferroelectric material layer to a ferroelectric material layer having a substantially uniform orthorhombic crystalline phase. An upper electrode layer is formed over the ferroelectric material layer. One or more patterning processes are performed on the upper electrode layer, the ferroelectric material layer, the un-patterned amorphous initiation layer, and the lower electrode layer to form a ferroelectric memory device. An upper ILD layer is formed over the ferroelectric memory device, and an upper interconnect is formed to contact the ferroelectric memory device.

A finger-type semiconductor capacitor array layout includes a first conductive structure and a second conductive structure. The first conductive structure includes longitudinal first conductive strips and lateral power supply strips. The second conductive structure includes longitudinal second conductive strips and P lateral power supply strip(s). The longitudinal first conductive strips and the longitudinal second conductive strips are alternately disposed in a first integrated circuit (IC) layer; and the longitudinal first conductive strips include a first row of strips and a second row of strips. The lateral power supply strips are located in a second IC layer, and coupled to the first and second rows of strips through vias. The P lateral power supply strip(s) is/are located in the second IC layer, and include(s) a first-capacitor-group power supply strip that is coupled to K strip(s) of the longitudinal second conductive strips through K via(s). The P and K are positive integers.

A method for fabricating a MOMCAP includes steps as follows: An Nth metal layer is formed on a substrate according to an Nth expected capacitance value of the Nth metal layer. An Nth capacitance error value between an Nth actual capacitance value of the Nth metal layer and the Nth expected capacitance value is calculated. An N+1th expected capacitance value of an N+1th metal layer is adjusted to form an N+1th actual capacitance value according to the Nth capacitance error value, and the N+1th metal layer with an N+1th actual capacitance value is formed on the Nth metal layer according to the adjusted N+1th expected capacitance value, to make the sum of the Nth actual capacitance value and the N+1th actual capacitance value equal to the sum of the Nth expected capacitance value and the N+1th expected capacitance value. N is an integer greater than 1.

The present disclosure provides a semiconductor device with a composite dielectric structure and a method for forming the semiconductor device. The semiconductor device includes a conductive contact disposed over a semiconductor substrate, and a first dielectric layer disposed over the conductive contact. A top surface of the conductive contact is exposed by an opening. The semiconductor device also includes a bottom electrode extending along sidewalls of the opening and the top surface of the conductive contact, and a top electrode disposed over the bottom electrode and separated from the bottom electrode by a dielectric structure. The dielectric structure includes a second dielectric layer and dielectric portions disposed over the second dielectric layer. The dielectric portions cover top corners of the opening and extend partially along the sidewalls of the opening.

A semiconductor structure includes a bonded assembly of a first semiconductor die including first metal bonding pads and a second semiconductor die including second metal bonding pads, and a capacitor structure including a first electrode, a second electrode, and a node dielectric. The first electrode includes first bonded pairs of metal bonding pads. The second electrode includes second bonded pairs of metal bonding pads. The node dielectric includes portions dielectric material layers laterally surrounding the metal bonding pads.

A method of manufacturing an electronic device includes forming a shallow trench isolation (STI) structure on or in a semiconductor surface layer and forming a mask on the semiconductor surface layer, where the mask exposes a surface of a dielectric material of the STI structure and a prospective local oxidation of silicon (LOCOS) portion of a surface of the semiconductor surface layer. The method also includes performing an oxidation process using the mask to oxidize silicon in an indent in the dielectric material of the STI structure and to grow an oxide material on the exposed LOCOS portion of the surface of the semiconductor surface layer.

A semiconductor die includes an array of first capacitor regions, each of the first capacitor regions including multiple first capacitor cell structures, wherein each first capacitor cell structure includes a plurality of first trench segments characterized by a first trench length, a first trench width, and a first trench spacing, and a first air gap width in a gap-filling material. The semiconductor die also includes a plurality of second capacitor regions interspersed in the array of first capacitor regions, each of the second capacitor region including multiple second capacitor cell structures, wherein each second capacitor cell structures includes a plurality of second trench segments characterized by a second trench length, a second trench width, a second trench spacing, and a second air gap width in the gap-filling material.

New types of circuit elements for integrated circuits include structures wherein a thickness dimension is much greater than a width dimension and is more closely spaced than the width dimension in order to attain a tight coupling condition. The structure is suitable to form inductors, capacitors, transmission lines and low impedance power distribution networks in integrated circuits. The width dimension is on the same order of magnitude as skin depth. Embodiments include a spiral winding disposed in a silicon substrate formed of a deep, narrow, conductor-covered spiral ridge separated by a narrow spiral trench. Other embodiments include a wide, thin conductor formed in or on a flexible insulative ribbon and wound with turns adjacent one another, or a conductor in or on a flexible insulative sheet folded into layers with windings adjacent one another Further, a method of manufacture includes directional etching of the deep, narrow spiral trench to form a winding in silicon.

The present disclosure relates to a semiconductor device and a manufacturing method, and more particularly to a MIM dual capacitor structure with an increased capacitance per unit area in a semiconductor structure. Without using additional mask layers, a second parallel plate capacitor can be formed over a first parallel plate capacitor, and both capacitors share a common capacitor plate. The two parallel plate capacitors can be connected in parallel to increase the capacitance per unit area.

An apparatus is provided, which includes a stack of a first plurality of layers interleaved with a second plurality of layers. In an example, the first plurality of layers includes conductive material, and the second plurality of layers includes insulating material. In an example, the first plurality of layers includes an upper layer and lower layer. A first via may extend through at least a portion of the stack, where the first via may be in contact with the upper layer and the lower layer. A second via may extend through at least a portion of the stack, where the second via may be isolated from the upper layer and lower layer.