The short-circuit protection circuit for a Gate Driver on Array (GOA) liquid crystal panel contains a power module, a first booster module, a feedback module, and a second booster module series-connected in the this order. A control module is electrically connected to the first booster, feedback, and second booster modules. The power module provides a power voltage. The control module provides a pulse width modulation (PWM) signal so as to control the first and second booster modules to transform the power voltage into driving voltage. The feedback module extracts a feedback current from a current flowing from the first to the second booster module and provides a feedback signal to the control module. When the feedback current exceeds a current threshold, the control module cuts off the PWM signal output so as to achieve short-circuit protection. A liquid crystal panel incorporating the above short-circuit protection circuit is also provided.

The present invention relates to an array substrate, which comprises: a display region and a drive circuit region; the drive circuit region comprises GOA units, the GOA unit comprising a substrate, a gate electrode layer, an insulation layer, an active layer and a source/drain electrode layer, and the drive circuit region further comprises a gate wire connecting to the gate electrode layer, and a source/drain layer wire at the same layer with the source/drain electrode layer, wherein the area between the portions of the gate wire and the source/drain layer wire which intercross with each other is only formed with the insulation layer. The invention further relates to a manufacturing method of an array substrate and a display apparatus comprising the array substrate.

An array substrate is disclosed. The array substrate includes a substrate, a first film layer on a side surface of the substrate, an insulation layer on the side surface of the substrate, an electrostatic charge dispersion layer on the side surface of the substrate, and a second film layer arranged on the side surface of the substrate. The first film layer, the insulation layer, the electrostatic charge dispersion layer, and the second film layer are sequentially arranged on the substrate. In addition, the insulation layer and the electrostatic charge dispersion layer include via holes, the second film layer is electrically connected with the first film layer through the via holes, and the electrostatic charge dispersion layer is in a same profile as the second film layer.

The present invention relates to a display device including a static electricity discharge circuit. The display device according to an exemplary embodiment of the present invention includes: a thin film transistor array panel including a display area including a plurality of pixels and a peripheral area around the display area; a signal wire positioned at the peripheral area; and a static electricity discharge circuit unit positioned at the peripheral area and connected to the signal wire, wherein the static electricity discharge circuit unit includes a first portion and a second portion positioned at a same layer as a portion of the signal wire and facing each other with a separation space therebetween, and a connecting member positioned at a different layer from the first portion and the second portion and electrically connecting the first portion and the second portion.

A three dimensional NAND memory device includes word line driver devices located on or over a substrate, an alternating stack of word lines and insulating layers located over the word line driver devices, a plurality of memory stack structures extending through the alternating stack, each memory stack structure including a memory film and a vertical semiconductor channel, and through-memory-level via structures which electrically couple the word lines in a first memory block to the word line driver devices. The through-memory-level via structures extend through a through-memory-level via region located between a staircase region of the first memory block and a staircase region of another memory block.

A three dimensional NAND memory device includes word line driver devices located on or over a substrate, an alternating stack of word lines and insulating layers located over the word line driver devices, a plurality of memory stack structures extending through the alternating stack, each memory stack structure including a memory film and a vertical semiconductor channel, and through-memory-level via structures which electrically couple the word lines in a first memory block to the word line driver devices. The through-memory-level via structures extend through a through-memory-level via region located between a staircase region of the first memory block and a staircase region of another memory block.

The present disclosure relates to the technical field of semiconductors, and provides an electro-static discharge (ESD) protection structure and a chip. The ESD protection structure includes: a semiconductor substrate, a first P-type well, a first N-type well, a first N-type doped portion, a first P-type doped portion, a second N-type doped portion, a second P-type doped portion, a third doped well, a third P-type doped portion and a third N-type doped portion, wherein the first P-type well, the first N-type well and the third doped well are located in the semiconductor substrate; the first N-type doped portion and the first P-type doped portion are located in the first N-type well and spaced apart; the second N-type doped portion and the second P-type doped portion are located in the first P-type well and spaced apart.

An isolation system, isolation device, and Integrated Circuit are disclosed. The isolation system is described to include an integrated circuit chip having a first capacitive plate, a second capacitive plate positioned with respect to the first capacitive plate to enable a capacitive coupling therebetween, an enhanced isolation layer positioned between the first capacitive the second capacitive plate that facilitates an electrical isolation between the first capacitive plate and the second capacitive plate, a first bonding wire that is in electrical communication with the second capacitive plate, and an isolation trench that at least partially circumscribes the first capacitive plate and is positioned between the first capacitive plate and the first bonding wire.

The present disclosure provides a method for fabricating an array substrate. The method includes providing a substrate; forming a first pattern on the substrate including a plurality of signal lines and a plurality of electrostatic discharge (ESD) lines, wherein an ESD line is configured to connect two signal lines; and removing a portion of each ESD line during a process for forming a second pattern over the first pattern to disconnect the two signal lines.

A three dimensional NAND memory device includes word line driver devices located on or over a substrate, an alternating stack of word lines and insulating layers located over the word line driver devices, a plurality of memory stack structures extending through the alternating stack, each memory stack structure including a memory film and a vertical semiconductor channel, and through-memory-level via structures which electrically couple the word lines in a first memory block to the word line driver devices. The through-memory-level via structures extend through a through-memory-level via region located between a staircase region of the first memory block and a staircase region of another memory block.