A display device includes a display panel having a display area and a non-display area, at least one thin-film transistor disposed in the non-display area, at least two or more divided capacitors disposed in the non-display area, and a bridge line for connecting two neighboring divided capacitors with each other among the at least two or more divided capacitors. The non-display area includes a light-blocking film disposed on a substrate and having a stepped first region and a flat second region, and a buffer and gate insulating film disposed on the light-blocking film, and having a bent first region disposed on the stepped first region of the light-blocking layer and a flat second region disposed on the flat second region of the light-blocking layer.

A display device includes: a substrate including a display area and a peripheral area positioned outside the display area; a first power supply line positioned in the peripheral area; a first insulating layer positioned on the first power supply line; and a second power supply line positioned on the first insulating layer in the peripheral area. The first power supply line includes a first main wire extending in a first direction and a first sub-wire diverging toward the display area from the first main wire, the second power supply line includes a second main wire extending in the first direction and a second sub-wire diverging toward the display area from the second main wire, the first main wire includes an internal edge positioned near the first sub-wire and an external edge facing the internal edge, and the second main wire does not overlap the internal edge in a plan view.

An electrostatic discharge (ESD) protection device includes a semiconductor substrate and a pair of first well regions formed in the semiconductor substrate, wherein the pair of first well regions have a first conductivity type and are separated by at least one portion of the semiconductor substrate. In addition, the ESD protection device further includes a first doping region formed in a portion of the at least one portion of the semiconductor substrate separating the pair of first well regions, having a second conductivity type opposite to the first conductivity type. Moreover, the ESD protection device further includes a pair of second doping regions respectively formed in one of the first well regions, having the first conductivity type, and a pair of insulating layers respectively formed over a portion of the semiconductor substrate to cover a portion of the first doped region and one of the second doping regions.

An ESD protection device including a Si substrate with an ESD protection circuit formed at the surface of the substrate; pads formed on the Si substrate; a rewiring layer opposed to the surface of the Si substrate, which includes terminal electrodes electrically connected to the pads. The rewiring layer includes a SiN protection film formed on the surface of the Si substrate to cover parts of the pads except regions in contact with openings (contact holes) formed in a resin layer, and the resin layer that is lower in dielectric constant than the SiN protection film, and formed between the SiN protection film and the terminal electrodes. Thus, provided is a semiconductor device which can reduce the generation of parasitic capacitance, and eliminates variation in parasitic capacitance generated.

Described is an apparatus comprising: an input pad; an output pad; a wire, coupled to the input pad and the output pad, the wire positioned at a periphery of a semiconductor die, the wire extending substantially along a perimeter of the semiconductor die; and one or more diodes, coupled at various sections of the wire, and positioned along the perimeter of the semiconductor die and surrounding the semiconductor die.

A display device comprising a display panel that includes an active area, the active area including a data line positioned on a substrate in a first direction and transferring a data signal, a gate line positioned on the substrate in a second direction and transferring a gate signal, a thin film transistor connected to the gate line and the data line, and a plurality of pixels driven by the thin film transistor, a first pad coupled to a first signal line disposed in a data signal area wherein the first signal line is connected to the data line, and a first non-signal line disposed in a first non-signal area wherein the first non-signal line is disconnected from the data line, the first non-signal area being disposed outside the data signal area, a second pad coupled to a second signal line disposed in a gate signal area wherein the second signal line is connected to the gate line, and a second non-signal line disposed in a second non-signal area wherein the second non-signal line is disconnected from the gate line, the second non-signal area being disposed outside the gate signal area; and a dummy pattern disposed between the data signal area and the first non-signal area, or disposed between the gate signal area and the second non-signal area.

An integrated circuit includes a transistor, an UTBOX buried insulating layer disposed under it and a ground plane disposed under the layer. A well is disposed under the plane and a first trench is at the periphery of the transistor and extends through the layer into the well. There is a substrate under the well and a p-n diode on a side of the transistor. The diode comprises first and second zones of opposite doping and the first zone is configured for electrical connection to a first electrode of the transistor. The first and second zones are coplanar with the plane and a second trench for separating the first and second zones. The second trench extends through the layer into the plane to a depth less than an interface between the plane and the well. There is a third zone under the second trench forming a junction between the zones.

An integrated circuit device including a semiconductor substrate, a first bonding pad structure, a second bonding pad structure, a third bonding pad structure, a first internal bonding wire, and a second internal bonding wire is provided. The first bonding pad structure is disposed on a surface of the semiconductor substrate and exposed outside of the semiconductor substrate. The second bonding pad structure is disposed on the surface of the semiconductor substrate and exposed outside of the semiconductor substrate. The third bonding pad structure is disposed on the surface of the semiconductor substrate and exposed outside of the semiconductor substrate. The first bonding pad structure is electrically coupled to the third bonding pad structure via the first internal bonding wire. The third bonding pad structure is electrically coupled to the second bonding pad structure via the second internal bonding wire.

A display device that includes a substrate having a display region and an adjacent peripheral region is provided, including; a plurality of sub-pixels provided within the display region; a plurality of data lines electrically connected to the sub-pixels; and a first electronic circuit group and a second electronic circuit group provided in the peripheral region, connected to the corresponding data lines. The first electronic circuit group includes a plurality of first electronic circuits, and the second electronic circuit group includes a plurality of second electronic circuits. Two adjacent first electronic circuits are arranged with a first interval therebetween, and the first interval has a first width. Two adjacent second electronic circuits are arranged with a second interval therebetween, and the second interval has a second width. The first width and the second width are different.

Discloses is a display device that may include a display panel; sub-pixels in a display area of the display panel; upper and lower data lines separated in a central portion of the display area; and an electrostatic discharge circuit formed in the central portion of the display area, the electrostatic discharge circuit electrically connected to the upper and lower data lines.