A MOS varactor includes a first N-type junction region and a second N-type junction region spaced apart from each other by a channel region, a gate insulation layer disposed on the channel region, a gate electrode disposed on the gate insulation layer, and an N-type well region including the channel region and surrounding the first and second N-type junction regions. The N-type well region exhibits a maximum impurity concentration in the channel region.

A MOS varactor includes a first N-type junction region and a second N-type junction region spaced apart from each other by a channel region, a gate insulation layer disposed on the channel region, a gate electrode disposed on the gate insulation layer, and an N-type well region including the channel region and surrounding the first and second N-type junction regions. The N-type well region exhibits a maximum impurity concentration in the channel region.

A thin-film integrated circuit comprising a first semiconductor device, a second semiconductor device, a first resistor, and a second resistor is provided. A semiconducting region of the first semiconductor device, a resistor body of the first resistor, a semiconducting region of the second semiconductor device, and a resistor body of the second resistor are formed from at least one of a first source material and a second source material, and a material of the resistor body of the first resistor and a material of the resistor body of the second resistor have different electrical properties.

Methods and semiconductor devices are provided. A vertical junction field effect transistor (JFET) includes a substrate, an active region having a plurality of semiconductor fins, a source metal layer on an upper surface of the fins, a source metal pad layer coupled to the semiconductor fins through the source metal layer, a gate region surrounding the semiconductor fins, and a body diode surrounding the gate region.

The present disclosure provides a chip part. The chip part includes: a substrate, a first external electrode and a second external electrode, a capacitor portion disposed on a first main surface of the substrate, a lower electrode including a drawer portion drawn out to the first main surface, a capacitive film disposed on the lower electrode, an upper electrode disposed on the capacitive film, a first electrode film electrically connecting the first external electrode to the lower electrode, and a second electrode film electrically connecting the second external electrode to the upper electrode. The drawer portion includes a first portion disposed in a region between the first external electrode and the second external electrode, and the first electrode film includes a first lower contact portion connected to the first portion.

Described is an apparatus comprising: an input pad; an output pad; a wire, coupled to the input pad and the output pad, the wire positioned at a periphery of a semiconductor die, the wire extending substantially along a perimeter of the semiconductor die; and one or more diodes, coupled at various sections of the wire, and positioned along the perimeter of the semiconductor die and surrounding the semiconductor die.

A design of a non-transistor memory core with corresponding shift register control logic may be all comprised of tunnel diodes and capacitors, and a method for fabricating such memories and control logic may use a stencil and non-lithographic self-aligning semiconductor processing steps to minimize cost. Designs and fabrication processes for I/O pads connected to the memory core and control logic are also presented.

A terahertz element of an aspect of the present disclosure includes a semiconductor substrate, first and second conductive layers, and an active element. The first and second conductive layers are on the substrate and mutually insulated. The active element is on the substrate and electrically connected to the first and second conductive layers. The first conductive layer includes a first antenna part extending along a first direction, a first capacitor part offset from the active element in a second direction as viewed in a thickness direction of the substrate, and a first conductive part connected to the first capacitor part. The second direction is perpendicular to the thickness direction and first direction. The second conductive layer includes a second capacitor part, stacked over and insulated from the first capacitor part. The substrate includes a part exposed from the first and second capacitor parts. The first conductive part has a portion spaced apart from the first antenna part in the second direction with the exposed part therebetween as viewed in the thickness direction.

Some embodiments relate to a method that includes depositing a first layer of hard mask material over a layer of dielectric material; etching the first layer of the hard mask material, the etched first layer of hard mask material including an etched portion having a first lateral dimension; depositing a second layer of the hard mask material over the first layer of the hard mask material; etching at least a portion of the second layer of the hard mask material, while allowing a remaining portion of the hard mask material, to expose a portion of the layer of the dielectric material that has a second lateral dimension less than the first lateral dimension; and etching a trench into the layer of the dielectric material at the exposed portion of the layer of the dielectric material.

A method of manufacturing an electronic circuit (or circuit module) (100) is disclosed. The electronic circuit comprises a transistor (1) and a resistor (2), the transistor comprising a source terminal (11), a drain terminal (12), a gate terminal (13), and a first body (10) of material providing a controllable semi-conductive channel between the source and drain terminals, and the resistor comprises a first resistor terminal (21), a second resistor terminal (22), and a second body (20) of material providing a resistive current path between the first resistor terminal and the second resistor terminal. The method comprises: forming the first body (10); and forming the second body (20), wherein the first body comprises a first quantity (100) of a metal oxide and the second body comprises a second quantity (200) of said metal oxide. Corresponding electronic circuits are disclosed.