In a method of manufacturing a semiconductor device, a fin structure, which includes a stacked layer of first semiconductor layers and second semiconductor layers disposed over a bottom fin structure and a hard mask layer over the stacked layer, is formed. An isolation insulating layer is formed. A sacrificial cladding layer is formed over at least sidewalls of the exposed hard mask layer and stacked layer. A first dielectric layer is formed. A second dielectric layer is formed over the first dielectric layer. The second dielectric layer is recessed. A third dielectric layer is formed on the recessed second dielectric layer. The third dielectric layer is partially removed to form a trench. A fourth dielectric layer is formed by filling the trench with a dielectric material, thereby forming a wall fin structure.

Provided is a semiconductor device. The semiconductor device includes a first circuit that includes a plurality of fixed resistance elements connected in series; a second circuit that includes a plurality of variable resistance elements connected in series and that is connected in series to the first circuit; a first cover portion that is provided on an upper layer side of the first circuit and that covers the first circuit; and a second cover portion that is provided on an upper layer side of the second circuit and that covers the second circuit. The first cover portion included two or more first metal films electrically connected, correspondingly, to units having any number of the fixed resistance elements, and the second cover portion includes a second metal film electrically connected to the plurality of the variable resistance elements.

Various embodiments of the present disclosure are directed towards an integrated chip including a thin film resistor (TFR) layer overlying a semiconductor substrate. A first conductive structure is disposed on an outer region of the TFR layer. The first conductive structure comprises a lateral portion adjacent to a vertical portion. A height of the vertical portion is greater than a height of the lateral portion. A capping structure is disposed on a middle region of the TFR layer and abuts the vertical portion of the first conductive structure.

An electronic device, e.g. a trimmable resistor, includes a plurality of fused resistors, each fused resistor including one or more doped resistive regions formed in a semiconductor substrate. The doped resistive regions may be thermistors. Each fused resistor further includes a corresponding one of a plurality of fusible links. A first terminal of each of the fused resistors is connected to a first terminal of the corresponding fusible link. First and second interconnection buses are located over the substrate, with the first interconnection bus connecting to a second terminal of each of the fused resistors, and the second interconnection bus connecting to a second terminal of each of the fusible links. The plurality of fused resistors have resistance values that form an exponential progression.

An integrated circuit (IC) including a TFR is disclosed. In one example, the IC comprises a dielectric layer over a semiconductor substrate, a resistive layer over the dielectric layer, a metal interconnect trace over a header end of the resistive layer, a via extending from the metallic interconnect trace toward the resistive layer, and a metallic barrier layer between the via and the resistive layer.

A semiconductor device includes a low-voltage side frame configured to be connected to a low-voltage chip driven by an input voltage and connected to a ground potential; and a high-voltage side frame configured to be insulated from the low-voltage side frame and connected to a high-voltage chip supplied with a supply voltage having a higher voltage than the input voltage. The high-voltage side frame is connected to a reference potential.

A detonator for an explosive material is described. The detonator includes a semiconductor bridge, coupled with the explosive material, including thermal feedback mechanism is provided via one or more thermistors. An exemplary mechanism includes a semiconductor bridge with a polysilicon resistor and a pair of thermistors. The two thermistors are disposed to be substantially close to or sandwich the polysilicon resistor. When the temperature surrounding the polysilicon resistor is getting upwards, the temperature surrounding the thermistors is equally going up. When the temperature reaches a critical point, but below the threshold of the polysilicon resistor, the resistance of the thermistors drops suddenly or drastically, causing the current driving up the temperature of the polysilicon resistor to divert through the VOX temp resistors. Subsequently the current going through the polysilicon resistor is reduced, causing the temperature to drop downwards.

The present disclosure relates to semiconductor structures and, more particularly, to resistor trimming structures and methods of use. The structure includes: a set of resistors each of which include an increasing resistance value; and a set of switches each of which are connected to a respective resistor of the set of resistors and each of which comprise a decreasing width dimension for each resistor of increasing resistance value.

An example integrated circuit (IC) includes a semiconductor substrate having a first well and a second well; a first resistor disposed on the semiconductor substrate over the first well within a boundary thereof; a second resistor disposed on the semiconductor substrate over the second well within a boundary thereof, the boundary of the second well disjoint from the boundary of the first well; and a first contact to bias the semiconductor substrate at a first voltage, a second contact to bias the first well at a second voltage, and a third contact to bias the second well at a third voltage.