A complementary bipolar junction transistor (BJT) integrated structure and methods for fabricating and operating such. The structure includes a monolithic substrate and conductive first and second backplates electrically isolated from each other. An NPN lateral BJT is superposed over the first backplate, and a PNP lateral BJT is superposed over the second backplate. A buried oxide (BOX) layer is positioned between the NPN lateral BJT and the first backplate, and between the PNP lateral BJT and the second backplate.

An electronic device includes an NPN bipolar transistor in an isolation tank region of an n-type semiconductor layer and having a p-type base region, an n-type emitter region, and an n-type collector region and a PNP bipolar transistor in the isolation tank region of the semiconductor layer and having an n-type base formed by a portion of the n-type semiconductor layer, a p-type emitter formed by a portion of the p-type base region of the NPN bipolar transistor, and a p-type collector formed by a p-type second collector region in the isolation tank region of the semiconductor layer and spaced apart from the p-type base region and from the n-type collector region of the NPN bipolar transistor.