Patent classifications
B01F3/02
METHOD FOR MIXING AT LEAST TWO GASES
A method of co-producing a nitrogen containing stream and a methanol stream, including producing at least an oxygen enriched stream and a nitrogen enriched stream in an air separation unit, introducing at least a portion of the oxygen enriched stream into an oxygen-based reformer, thereby producing a first syngas stream, introducing at least a portion of the first syngas stream into a methanol synthesis reactor, thereby producing at least a hydrogen containing stream and a methanol containing stream, introducing at least a portion of the methanol containing stream into a methanol distillation system, thereby producing a methanol product stream, introducing at least a portion of the nitrogen enriched stream, at least a portion of the first enriched hydrogen containing stream, and at least a portion of the second enriched hydrogen containing stream into an ammonia synthesis reactor, thereby producing an ammonia product stream.
Plasma induced fluid mixing
Embodiments of the subject invention are directed to methods and apparatus for inducing mixing in a fluid using one or more plasma actuators. In an embodiment, a pair of electrodes is positioned near a fluid and a voltage potential is applied across the pair of electrodes such that a plasma discharge is produced in the fluid. In an embodiment, the plasma discharge creates turbulence in the fluid thereby mixing the fluid. In an embodiment, flow structures, such as vortices are generated in the fluid. In an embodiment, the fluid is mixed in three dimensions. In an embodiment, a plurality of fluids are mixed. In an embodiment, solids are dispersed in at least one fluid. In an embodiment, heat or other properties are dispersed within at least one fluid. In an embodiment, at least one of the pair of electrodes has a serpentine shape.
Fluid dispersing device and heat treatment device
A fluid dispersing device includes a tubular first wall portion with an axis extending in a first direction defined as a central axis, and a second wall portion separated downward from the first wall portion. The second wall portion includes at least one circular member and a disk-like member each having a flat surface for causing a fluid passing through an inner space of the first wall portion to collide therewith. The disk-like member is separated downward from the at least one circular member. The at least one circular member has an outer diameter equal to or smaller than an inner diameter of the first wall portion. The disk-like member has an outer diameter equal to or smaller than an outer diameter of the closest circular member.
Process and device for diluting an aerosol
A process dilutes an aerosol by feeding an input aerosol through an inlet pipe surrounded by an annular space to a first mixing stage. An output aerosol leaves purified via an outlet as a particle-free clean gas. The particle-free clean gas is fed to the annular space upstream of the outlet and is mixed with the aerosol. A mixing stage includes an inlet pipe feeding aerosol as inlet aerosol. A downstream purification device purifies outlet aerosol leaving the mixing stage via an outlet pipe to form the particle-free clean gas. A mass flow controller and a pump suction off the outlet aerosol from the outlet pipe. A return line, for the clean gas, leads upstream into the annular space.
EXHAUST SYSTEM AND EXHAUST METHOD
An exhaust system capable of diluting a hydrogen gas to a concentration below the lower explosive limit without requiring a large amount of dilution gas while preventing an increase in a pressure of an exhaust gas in a buffer tank is disclosed. The exhaust system performs, when a main valve disposed in an exhaust line is closed, an initial exhaust operation in which a gas heavier than the hydrogen gas is discharged from a lower part of a buffer tank while an inlet valve disposed in an inlet line and a first outlet valve disposed in an outlet line are opened to introduce the exhaust gas from an equipment in a tangential direction of a buffer tank. Next, the exhaust system performs a hydrogen-gas discharge operation in which the inlet valve and the first outlet valve are closed, and the a bypass valve disposed in a bypass line and the second outlet valve disposed in a hydrogen-gas discharge line are opened to discharge the hydrogen gas stayed in an upper part of the buffer tank while flowing the exhaust gas into a bypass line.
GAS MIXING SYSTEM FOR SEMICONDUCTOR FABRICATION
A gas mixing system for semiconductor fabrication includes a mixing block. The mixing block defines a gas mixing chamber, a first gas channel fluidly coupled to the gas mixing chamber at a first exit location, and a second gas channel fluidly coupled to the gas mixing chamber at a second exit location, wherein the first exit location is diametrically opposite the second exit location relative to the gas mixing chamber and the second gas channel has a bend of 90 degrees or less between an entrance of the second gas channel and the second exit location.
Method and apparatus for dynamic gas mixture production
The present invention relates to a method for producing and delivering a gas mixture having a selected composition of a first gas and at least one second gas, comprising the following steps: (a) providing a main gas flow comprising the first gas in a main conduit, (b) separating the main gas flow into a first plurality of secondary gas flows, (c) guiding each secondary gas flow through a secondary conduit, (d) adding at least one second gas to at least one of the first plurality of secondary gas flows in the respective secondary conduit through a delivering conduit, said delivering conduit protruding into the secondary conduit, and (e) combining the first plurality of secondary gas flows to the gas mixture. With the technical teaching of the present invention a dynamic gas bottle filling is possible wherein the second gas components may have a concentration form some ppb to percent.
Control circuit for stopping the flow of fluid in a primary circuit, and related methods and devices
A control circuit for automatically stopping the flow of a gas in a primary circuit, includes a valve, a sensor and a controller. The valve is couplable with a primary pressure-regulator that controls the flow of another gas in a primary circuit. The valve has an inlet operable to receive a gas and an outlet operable to distribute the gas. The sensor is positionable in the primary circuit and operable to sense a parameter of the flow of the gas in the primary circuit and generate a signal that represents the sensed parameter. The controller is operable to receive the sensor's signal and, in response to the signal, direct the valve to close if the parameter of the flow of gas in the primary circuit lies outside of a predetermined range.
MIXING MANIFOLD AND DELIVERY SYSTEM FOR GAS DELIVERY
An electronically or mechanically controlled system is devised, such that the outlet control system in a flow path delivers a desired flow rate of pre-mixed ratio and quantity of gases based on inlet and outlet pressure conditions. The desired flow rate from the system/device does not depend on type of gas/fluid being mixed such that system will always deliver a mixed gas and also do a real-time measurement of actual flow of the mixture.
MIXING CONNECTOR AND ENGINE
A mixing connector includes an intake passage, an EGR passage that fetches a portion of exhaust gas exhausted from an engine body to use as EGR gas, and that returns the EGR gas to the intake passage, and a merging section that connects the EGR passage to the intake passage so that longitudinal directions of the intake passage and the EGR passage intersect each other. An upstream side region located on an inlet port side of the intake passage from the merging section on an opposite wall surface configuring an inner surface of the intake passage and located on a side opposite to the merging section includes a first wall surface and a second wall surface which are sequentially arranged at an interval from the merging section side toward the inlet port, and a third wall surface projecting inward of the first wall surface between the first and second wall surfaces.