Patent classifications
C02F103/34
Method to remove chemical contaminants
A method of removing chemical contaminants from a composition comprising an active, a solvent, and a contaminant can include providing an initial feed supply, wherein the initial feed supply comprises the active, the solvent, and the contaminant, wherein the contaminant can include 1,4 dioxane, dimethyl dioxane, or a combination thereof; including filtering the initial feed stock through a nanofilter.
Porous membrane including perfluoroalkoxy alkane (PFA)-based melt-extruded film and having pores controlled by biaxial stretching, and manufacturing method therefor
There are provided a porous membrane including a perfluoroalkoxy alkane (PFA)-based melt-extruded film and having pores controlled by biaxial stretching, and a manufacturing method therefore. The porous membrane is for water treatment and includes a fluoropolymer. The method includes forming a film by melt-extruding a fluoropolymer; and controlling the pore size of the formed film by biaxial stretching. The membrane for water treatment is based on a fluoropolymer and has physical properties that are resistant to high temperatures and strong acids, and it is able to be used for treatment of wastewater such as semiconductor wastewater.
Hydrocarbon and sulfide removal in direct aqueous extraction
Methods of treating an aqueous source are described herein that include reducing a concentration of sulfide species in a stream obtained from the aqueous source to form an extraction feed and extracting ions from the extraction feed, or a stream obtained from the extraction feed, using direct aqueous extraction. Other methods describe treating an aqueous source by reducing a concentration of organic species in a stream derived from the aqueous source to form an extraction feed and extracting ions from the extraction feed, or a stream derived from the extraction feed, using direct aqueous extraction. The aqueous source can be an aqueous lithium source.
Separator assemblies and methods
Mesofluidic separator assemblies are provided that can include at least a pair of supports configured to extend within a pressure differential axis, and at least one level of a plurality of members extending between the pair of supports. Individual members of the plurality can define a plurality of levels extending from a first level configured to have initial contact with the fluid to be separated and a last level configured to have final contact with the fluid to be separated. Sets of members can be aligned along one axis that is neither parallel nor normal to the pressure differential axis. Conduits configured to facilitate the flow of fluid along the pressure differential axis can define at least one cross sectional area that is open. Methods for size separating particles within a fluid are also provided.
Zero liquid discharge water management system
Systems and methods including a pretreatment component for pretreating a produced water obtained from a subterranean formation operation to remove at least a portion of dispersed hydrocarbons and hydrogen sulfide therein, thereby producing a high salinity produced water; a desalination component for desalinating of the high salinity produced water to remove at least one or more salts therein, thereby producing a desalinated water and a saturated saline water; and a mineral recovery component for treating the saturated saline water to recover mineral salts therein, thereby producing the recovered mineral salts.
Method for preparing cuprous chloride by high-value utilization of chloride ion-containing wasterwater
The disclosure discloses a method for preparing cuprous chloride by high-value utilization of chloride ion-containing wastewater, belonging to the field of wastewater treatment. According to the disclosure, wastewater containing chloride ions is taken, and the pH is maintained at 2 to 3.5. Cuprous oxide is added by 50 to 80% of a theoretical amount of the cuprous oxide according to a Cl.sup. concentration for reaction 8 to 15 min. Centrifugation is performed to obtain crude cuprous chloride and supernatant. Cuprous oxide is added to the resulting supernatant for reaction 8 to 15 min, and a total of cuprous oxide added in two reactions accounts for 90 to 100% of the theoretical amount. Centrifugation is performed after the reaction to obtain crude cuprous chloride. According to the method of the disclosure, the amount of cuprous oxide used is greatly reduced, and the purity of the cuprous chloride is improved.
Wastewater treatment system and method for semiconductor fabrication process
Disclosed are wastewater treatment systems and methods for semiconductor fabrication process. The method comprises performing first concentration on wastewater discharged from a semiconductor process chamber, and performing second concentration on concentrated wastewater or at least a portion of the wastewater concentrated by the first concentration. The step of performing the first concentration includes performing in a first electrodialysis apparatus an ion exchange between the wastewater and first treatment water. The step of performing the second concentration includes allowing the concentrated wastewater to circulate in a second electrodialysis apparatus, allowing second treatment water to circulate in the second electrodialysis apparatus, providing a power to an anode and a cathode of the second electrodialysis apparatus to perform an ion exchange between the second treatment water and the concentrated wastewater, and joining a portion of the concentrated wastewater to the second treatment water.