Patent classifications
C11D11/0029
Rinsing Solution for Metal Blades
A blade rinse composition comprising about 0.0001 to 0.01 wt. % disodium tetraborate decahydrate, about 0.0001 to 0.01 wt. % cationic surfactant, up to 5 wt. % anhydrous alcohol, and deionized water is disclosed, together with methods of making and using the same. The composition may prevent oxidation and/or contamination of metal blades and premature dullness of the blades.
BIOLOGICAL CORROSION INHIBITOR FOR METALS
An object of the present invention is to provide a biological corrosion inhibitor for a metal, which exhibits the effect at a low concentration and is superior in biodegradability. A biological corrosion inhibitor for a metal including 3-methylglutaraldehyde as an effective ingredient is provided.
SUPERCRITICAL Y-GRADE NGL
Use of supercritical Y-grade natural gas liquids for a variety of processes and across numerous industrial applications is described herein. The low viscosity, high density, and tunable solvent properties of supercritical Y-grade natural gas liquids are useful for example in enhanced reservoir recovery and treatment, control of chemical reactions and processes, and/or single or two-phase separations.
COMPOSITIONS COMPRISING 1,2-DICHLORO-1,2-DIFLUOROETHYLENE FOR USE IN CLEANING AND SOLVENT APPLICATIONS
The present application provides compositions comprising 1,2-dichloro-1,2-difluoroethylene (i.e., CFO-1112) and, optionally, an additional component. The present application further provides use of the compositions provided herein in cleaning, solvent, carrier fluid, and deposition applications.
POLYFUNCTIONAL POLYMERS BASED ON PHOSPHONATE UNITS AND AMINE UNITS
The invention relates to polyfunctional polymers suitable in particular for the treatment of metal surfaces (metal finishing) and comprising: monomer units u1 bearing phosphonic acid functions; monomer units u2 bearing amine functions; and optionally monomer units u3 bearing alcohol units —OH.
COMPOSITIONS COMPRISING 1,2-DICHLORO-1,2-DIFLUOROETHYLENE FOR USE IN CLEANING AND SOLVENT APPLICATIONS
The present application provides compositions comprising 1,2-dichloro-1,2-difluoroethylene (i.e., CFO-1112) and, optionally, an additional component. The present application further provides use of the compositions provided herein in cleaning, solvent, carrier fluid, and deposition applications.
Methods and compositions for acid treatment of a metal surface
The invention relates to compositions and methods that are useful in etching a metal surface. In particular, the invention relates to novel acid compositions and methods of using such compositions in etching a metal surface, preferably an aluminum surface prior to anodizing to dissolve impurities, imperfections, scale, and oxide. The compositions are effective in maintaining their etching capacity and in removing smut produced by the etching of a surface as well as in general cleaning.
Process for the demulsifying cleaning of metallic surfaces
The demulsifying cleaning of metallic surfaces which may be contaminated with oil(s) with at least one further nonpolar organic compound, with fat(s), with soap(s), with particulate dirt or with at least one anionic organic compound using an aqueous, alkaline, surfactant-containing bath solutions.
METHOD FOR REMOVING ONE OR MORE OF: COATING, CORROSION, SALT FROM A SURFACE
Embodiments of the present methods and solutions that operate to prepare a metal surface to be ready for coating or primer. The surface is operated on using mechanical or pressure impingement operation in conjunction with application of medium comprising dimethylethanolamine (DMEA) and water (DMEA diluted in water). Embodiments of the present invention can perform the wash or decontamination to leave a clean surface that provides excellent performance in durability and rust resistance after being coated or primed. Other cleaning chemicals if added may reduce the performance and interfere with the desired objective. Other surfaces are contemplated.
PROCESS FOR THE REMOVAL OF CHROMIUM CONTAMINANTS FROM RUTHENIUM SPUTTERING TARGET SUBSTRATES
The present invention provides a process for the removal of chromium contaminants on a spent ruthenium sputtering target used in Plasma Vapor Deposition by the steps of grit abrasion, organic solvent cleaning, and being subjected to an electric field in an acidic bath including a surfactant, and followed by subsequent water and air rinse and further grit abrasion. Removal of the contaminants is verified by spectroscopy.