The present invention relates to compositions for the photodynamic control of micro-organisms wherein the compositions comprise a photosensitiser which comprises a dyestuff and produces singlet oxygen when irradiated by means of light for the disinfection and sterilization of materials, commodities and surfaces contaminated with one or more species of micro-organisms including bacteria, fungi, algae, yeasts, bacterial spores and fungal spores.

Embodiments of the present disclosure generally relate to methods for detecting end-points of cleaning processes for aerospace components containing corrosion. The method includes exposing the aerospace component to a first solvent, exposing the aerospace component to a first water rinse, and analyzing a first aliquot of the first water rinse by absorbance spectroscopy to determine an intermediate solute concentration in the first aliquot, where the intermediate solute concentration is greater than a reference solute concentration. The method further includes exposing the aerospace component to an aqueous cleaning solution to remove corrosion from the aluminum oxide layer, exposing the aerospace component to a second solvent, and exposing the aerospace component to a second water rinse, and analyzing a second aliquot of the second water rinse by absorbance spectroscopy to determine a post-clean solute concentration in the second aliquot, where the post-clean solute concentration is less than the intermediate solute concentration.

The present invention provides a process for the removal of chromium contaminants on a spent ruthenium sputtering target used in Plasma Vapor Deposition by the steps of grit abrasion, organic solvent cleaning, and being subjected to an electric field in an acidic bath including a surfactant, and followed by subsequent water and air rinse and further grit abrasion. Removal of the contaminants is verified by spectroscopy.

An ultrasonic wave applying liquid is supplied to one principal surface of a substrate while a liquid film of a first liquid being formed on another principal surface of the substrate. The ultrasonic wave applying liquid is obtained by applying ultrasonic waves to a second liquid. Ultrasonic vibration is transmitted to the other principal surface and the liquid film, thereby ultrasonically cleaning the other principal surface. The first liquid has a higher cavitation intensity, which is a stress per unit area acting on the substrate by cavitation caused in the liquid when ultrasonic waves are transmitted to the liquid present on the principal surface of the substrate, than the second liquid.

The disclosure relates to a device for treating stains, which can be carried by a person, comprising a reservoir for receiving a chemical formulation, where the reservoir has an outlet port for dispensing the chemical formulation and where the device comprises a UV radiation source which emits its radiation in a direction essentially away from the device. The invention further relates to a method for treating spots using such a device.

Systems, methods, etc., directed to removing or modifying pink-stain in a substrate. For example, removal of pink-stains caused by Streptoverticillium reticulum in marine vinyl, or to enhance the speed, specificity, and efficacy of other bleaching processes of autofluorescent organic stains in those and other substrates.

A method of laundering fabric, where the method includes the steps of: (a) in a main washing step, washing soiled fabric with an aqueous wash bath including detersive surfactant and one or more of the following components: perfume, brighteners, hueing dyes, enzymes, or any combination thereof; and (b) in a rinsing step, rinsing the soiled fabric with an aqueous rinsing solution including photo-bleach;
where an artificial light source is present and turned on during at least part of the rinsing step (b) and provides light to the aqueous rinsing solution in such a manner that activates the photo-bleach present in the aqueous rinsing solution, and where the artificial light source is turned off during at least part of the main washing step (a) and does not provide any light to the aqueous wash bath.

A method for cleaning a vacuum chamber, particularly a vacuum chamber used in the manufacture of OLED devices is described. The method includes cleaning at least one of an inside of the vacuum chamber and a component inside the vacuum chamber with active species, a process gas for generating the active species includes at least 90% oxygen and 5 at least 2% argon, particularly, wherein the process gas includes about 95% oxygen and about 5% argon.

This disclosure describes a composition which can provide real-time feedback during medical device cleaning or reprocessing. The composition can be used to monitor the amount of biological material cleaned from medical devices and to determine when cleaning is complete. The disclosure also relates to a method of cleaning, or assessing the cleanliness of, a medical device such as an endoscope. Cleanliness can be assessed by contacting the medical device with the composition, shining an excitation light on the composition, and measuring intensity of resulting fluorescence over time.

Methods for treating substrates are described. The methods comprise the steps of flowing an aqueous liquid medium through a flow channel and at least one outlet slit onto a substrate to be treated and exposing the aqueous liquid medium to UV-radiation of a specific wavelength at least in a portion of the flow channel immediately adjacent the at least one outlet slit and after the aqueous liquid medium has flown through the outlet opening towards the substrate and thus prior to and while applying the aqueous liquid medium to the surface of the substrate to be treated. In one method, the electrical conductance of the aqueous liquid medium is adjusted to be in the range of 20 to 2000 μS, by the addition of an additive to the aqueous liquid medium, the aqueous liquid medium prior to the addition of the additive having an electrical conductivity below 20 μS, prior to or while exposing the same to the UV-radiation. Additionally, the pH of the aqueous liquid medium may be adjusted to a range of 8 to 11 or 3 to 6 prior to or while exposing the same to the UV-radiation. The adjustments may lead to a shift in an equilibrium of reactive species generated in the aqueous liquid medium by the UV-radiation towards preferred species.