A robot hand includes base body defining gripping position of substrate, first contacting part provided to base body at tip-end side and configured to contact first part of edge part of substrate when substrate is gripped, rotary body provided on base-end side of base body and having second contacting part configured to contact second part of edge part of substrate when substrate is gripped, and mobile body having shaft part to be inserted into shaft hole of rotary body, and configured to move toward tip end of base body to move rotary body toward tip end of the base body. An axial-center line of shaft part extends in thickness directions of base and rotary bodies provided so as to have clearance in axial direction of shaft part with respect to shaft part.

A conveying unit includes a housing; a collision prevention mechanism disposed on a sidewall of the housing; a gripping member configured to hold a carrier for carrying a semiconductor structure; a sensor disposed on the gripping member and configured to measure and collect data associated with vibration of the gripping member; and an unit controller disposed on the gripping member and configured to analyze the data from the sensor and control a movement of the conveying unit.

A conveying unit includes a housing; a collision prevention mechanism disposed on a sidewall of the housing; a gripping member configured to hold a carrier for carrying a semiconductor structure; a sensor disposed on the gripping member and configured to measure and collect data associated with vibration of the gripping member; and an unit controller disposed on the gripping member and configured to analyze the data from the sensor and control a movement of the conveying unit.

A substrate gripping hand which grips a substrate with a disc shape, includes a base plate, and a guide member provided at the base plate, and having a L-shape when viewed from a horizontal direction, the guide member having a shape in which a base end portion of a bottom surface has a horizontal portion and a first corner portion which is a corner portion formed by the bottom surface and an inner wall surface has a curve line shape.

A substrate gripping hand which grips a substrate with a disc shape, includes a base plate, and a guide member provided at the base plate, and having a L-shape when viewed from a horizontal direction, the guide member having a shape in which a base end portion of a bottom surface has a horizontal portion and a first corner portion which is a corner portion formed by the bottom surface and an inner wall surface has a curve line shape.

A substrate holding hand includes a blade including a support to support a substrate, a movable pressing unit including a pressing member that moves back and forth to press the substrate, and an inclination adjusting mechanism operable to adjust an inclination of the pressing member.

To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).

To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter. The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).

Disclosed in some embodiments is a chamber component (such as an end effector body) coated with an ultrathin electrically-dissipative material to provide a dissipative path from the coating to the ground. The coating may be deposited via a chemical precursor deposition to provide a uniform, conformal, and porosity free coating in a cost effective manner. In an embodiment wherein the chamber component comprises an end effector body, the end effector body may further comprise replaceable contact pads for supporting a substrate and the contact surface of the contact pads head may also be coated with an electrically-dissipative material.

To provide a transfer chamber capable of replacing a chemical filter without affecting an internal atmosphere, and shortening or eliminating stop time of a transfer process of a wafer (W) associated with replacement of the chemical filter.

The transfer chamber transfers the wafer (W) to or from a processing device (6) by using a transfer robot (2) provided thereinside, and includes a circulation path (CL1) formed inside of a transfer chamber (1) to circulate gas, a chemical filter unit (7) provided in the midstream of the circulation path (CL1), and a connecting and disconnecting means (8) which switches connection and disconnection of the chemical filter unit (7) to and from the circulation path (CL1).