B81B3/0056

MEMS DRIVING DEVICE, ELECTRONIC APPARATUS, AND MEMS DRIVING METHOD
20190285871 · 2019-09-19 ·

A spectroscopic measurement apparatus includes a fixed substrate, a movable substrate, and a wavelength variable interference filter which includes an electrostatic actuator for changing the gap dimension between the substrates, a vibration disturbance detection unit which detects vibration added to the wavelength variable interference filter, and a bias driving unit which applies a feed-forward voltage based on a detected value of the vibration disturbance detection unit to the electrostatic actuator.

Sensitivity Compensation for Capacitive MEMS Device
20190273993 · 2019-09-05 ·

A MEMS device includes a membrane and a counter electrode structure spaced apart from the membrane. The counter electrode structure includes a non-planar conductive layer. The MEMS device includes an air gap between the membrane and the counter electrode structure. The air gap has a non-uniform thickness.

MEMS device to selectively measure excitation in different directions

A method and system for a sensor system of a device is disclosed. The sensor system includes a first MEMS sensor (FMEMS), a second MEMS sensor (SMEMS) and a signal processor (SP). An excitation is imparted to the device along a first axis (FA). The FMEMS has a first primary sense axis (FPSA), moves in response to a component of the excitation along the FA aligned with the FPSA and outputs a first signal proportional to an excitation along the FPSA. The SMEMS has a second primary sense axis (SPSA), moves in response to a component of the excitation along the FA aligned with the SPSA and outputs a second signal proportional to an excitation along the SPSA. The SP combines the first signal and the second signal to output a third signal proportional to the excitation along the FA. The FA, the FPSA and the SPSA have different orientations.

Sculpted micromirror in a digital micromirror device

A digital micromirror device comprises an array of micromirror pixels, the array comprising a first micromirror pixel and a second micromirror pixel. The first micromirror pixel comprises a hinge, where the hinge is configured to tilt toward a first raised address electrode and toward a second raised address electrode. The first micromirror pixel also comprises a first micromirror coupled to the hinge, where the first micromirror has a sculpted edge. The second micromirror pixel comprises a second micromirror, where a first gap between a first point on the sculpted edge and a nearest point to the first point on the second micromirror is larger than a second gap between a second point on the sculpted edge and a nearest point to the second point on the second micromirror.

DEVICE COMPRISING A MICRO-ELECTRO-MECHANICAL SYSTEM SUBSTRATE WITH PROTRUSIONS OF DIFFERENT HEIGHTS THAT HAS BEEN INTEGRATED WITH A COMPLEMENTARY METAL-OXIDE-SEMICONDUCTOR SUBSTRATE

A device comprising a micro-electro-mechanical system (MEMS) substrate with protrusions of different heights that has been integrated with a complementary metal-oxide-semiconductor (CMOS) substrate is presented herein. The MEMS substrate comprises defined protrusions of respective distinct heights from a surface of the MEMS substrate, and the MEMS substrate is bonded to the CMOS substrate. In an aspect, the defined protrusions can be formed from the MEMS substrate. In another aspect, the defined protrusions can be deposited on, or attached to, the MEMS substrate. In yet another aspect, the MEMS substrate comprises monocrystalline silicon and/or polysilicon. In yet even another aspect, the defined protrusions comprise respective electrodes of sensors of the device.

MEMS MICROPHONE
20240217809 · 2024-07-04 ·

A MEMS microphone, includes a substrate with a back cavity, and a capacitive system including a back plate and a diaphragm located on the substrate, the back plate includes a body portion and a first protrusion, the diaphragm includes a main portion and a second protrusion, the first protrusion is corresponding to the second protrusion, the substrate includes an upper end close to the capacitive system and a lower end away from the capacitive system, an opening of the back cavity at the upper end of the substrate is larger than an opening at the lower end of the substrate. Compared with the related art, the MEMS microphone disclosed by the present disclosure could improve the resonant frequency.

ACTUATOR PLATE PARTITIONING AND CONTROL DEVICES AND METHODS
20190144263 · 2019-05-16 ·

Devices and methods of operating partitioned actuator plates to obtain a desirable shape of a movable component of a micro-electro-mechanical system (MEMS) device. The subject matter described herein can in some embodiments include a micro-electro-mechanical system (MEMS) device including a plurality of actuation electrodes attached to a first surface, where each of the one or more actuation electrode being independently controllable, and a movable component spaced apart from the first surface and movable with respect to the first surface. Where the movable component further includes one or more movable actuation electrodes spaced apart from the plurality of fixed actuation electrodes.

MICRO-MIRROR FRINGE FIELD ELECTRODE DESIGN WITH MISALIGNMENT COMPENSATION
20240231078 · 2024-07-11 ·

In one example, an apparatus includes a substrate, an electrode layer on the substrate, and a hinge layer. The electrode layer has N linear electrode edges on a side of a centerline of the electrode layer, N being an odd number greater than or equal to 3. The hinge layer has N linear hinge edges on the side of the centerline. A first edge of the linear hinge edges is spaced apart from a closest second edge of the linear electrode edges by a first lateral gap distance. A third edge of the linear hinge edges is spaced apart from a closest fourth edge of the linear electrode edges by a second lateral gap distance different from the first lateral gap distance.

Small wafer area MEMs switch

Deep via technology is used to construct an integrated silicon cantilever and cavity oriented in a vertical plane which creates an electrostatically-switched MEMS switch in a small wafer area. Another embodiment is a small wafer area electrostatically-switched, vertical-cantilever MEMS switch wherein the switch cavity is etched within a volume defined by walls grown internally within a silicon substrate using through vias.

Small wafer are MEMS switch

Deep via technology is used to construct an integrated silicon cantilever and cavity oriented in a vertical plane which creates an electrostatically-switched MEMS switch in a small wafer area. Another embodiment is a small wafer area electrostatically-switched, vertical-cantilever MEMS switch wherein the switch cavity is etched within a volume defined by walls grown internally within a silicon substrate using through vias.