A scanning device includes a planar scanning mirror disposed within a frame and having a reflective upper surface. A pair of flexures have respective first ends connected to the frame and respective second ends connected to the mirror at opposing ends of a rotational axis of the mirror. A rotor including a permanent magnet is disposed on the lower surface of the mirror. A stator includes first and second cores disposed in proximity to the rotor on opposing first and second sides of the rotational axis and first and second coils of wire wound respectively on the cores. A drive circuit drives the first and second coils with respective electrical currents including a first component selected so as to control a transverse displacement of the mirror and a second component selected so as to control a rotation of the mirror about the rotational axis.

An optomechanical device comprising an assembly, one or more laser devices configured to generate a first optical signal and a second optical signal, and a circuit. The assembly includes a first beam structure comprising a first spatial frequency and a second beam structure comprising a second spatial frequency. The circuit is configured to modulate the second optical signal and output the first optical signal and the second optical signal to the assembly. A first element of a first beam structure shifts the first spatial frequency of the assembly by approximately 180 degrees and a second element of a second beam structure shifts the second spatial frequency of the assembly by approximately 180 degrees such that a first optical resonance is generated, which is probed by the first optical signal interacting with the assembly, and a second optical resonance is generated, which is probed by the second optical signal interacting with the assembly, where the first optical resonance and the second optical resonance are spectrally separated by a minimum threshold.

An optomechanical device optomechanical device for stabilizing an optomechanical resonator comprising a circuit configured to generate a first optical signal and a second optical signal, modulate the first optical signal, modulate the second optical signal, and combine the first optical signal and the second optical signal into a combined optical signal to direct the combined optical signal into an assembly. An inner sidewall of a first beam structure of the assembly has a first inner spatial frequency correspond to a second inner spatial frequency of an inner sidewall of a second beam structure of the assembly and an outer sidewall of the first beam structure has a first outer spatial frequency correspond to a second outer spatial frequency of an outer sidewall of the second beam structure.

A micro-electromechanical system (MEMS) device includes a substrate and a beam suspended relative to a surface of the substrate. The substrate includes a buried insulator layer and a cavity. The beam includes a first portion and a second portion that are separated by an isolation joint. The cavity separates the surface of the substrate from the beam.

A device has a latching mechanism including a catch element having at least two catches, and a pawl configured to engage in a catch interstice between two catches. The catch element is movable in relation to the pawl in a freewheeling direction, and a movement of the catch element in relation to the pawl in a blocking direction may be blocked by means of the pawl. The device further includes a deflectable actuator configured to move the catch element and the pawl relative to each other on a catch-by-catch basis in the freewheeling direction by means of deflection. According to the invention, the device also includes an electric component configured to change its electric property as a function of the catch-wise movement of the catch element in relation to the pawl.

A method of forming a microelectromechanical device wherein a beam of the microelectromechanical device may deviate from a resting to an engaged or disengaged position through electrical biasing. The microelectromechanical device comprises a beam disposed above a first RF electrode and a second RF electrode. The microelectromechanical device further comprises one or more electrical contacts disposed below the beam. The one or more electrical contacts comprise a first layer of ruthenium disposed over an oxide layer, a titanium nitride layer disposed on the first layer of ruthenium, and a second layer of ruthenium disposed on the titanium nitride layer.

A method of forming a microelectromechanical device wherein a beam of the microelectromechanical device may deviate from a resting to an engaged or disengaged position through electrical biasing. The microelectromechanical device comprises a beam disposed above a first RF conductor and a second RF conductors. The microelectromechanical device further comprises at least a center stack, a first RF stack, a second RF stack, a first stack formed on a first base layer, and a second stack formed on a second base layer, each stack disposed between the beam and the first and second RF conductors. The beam is configured to deflect downward to first contact the first stack formed on the first base layer and the second stack formed on the second base layer simultaneously or the center stack, before contacting the first RF stack and the second RF stack simultaneously.

A method of forming a microelectromechanical device wherein a beam of the microelectromechanical device may deviate from a resting to an engaged or disengaged position through electrical biasing. The microelectromechanical device comprises a beam disposed above a first RF conductor and a second RF conductor. The microelectromechanical device further comprises at least a center stack, a first RF stack, a second RF stack, a first stack formed on a first base layer, and a second stack formed on a second base layer, each stack disposed between the beam and the first and second RF conductors. The beam is configured to deflect downward to first contact the first stack formed on the first base layer and the second stack formed on the second base layer simultaneously or the center stack, before contacting the first RF stack and the second RF stack simultaneously.

A micromechanical device includes an actuator moveable along at least one rotational axis, and an electromagnetic type actuating device. The rotor is composed of a wire coil mounted on a moveable frame, which is rotationally integral with the actuator. The coil conducts the electric current. Protruding strands form a loop proximate the torsional beam. In another embodiment, the coil terminates through its two ends located on the moveable frame. The ends of the coil are each welded to one of the metal plates terminating on the moveable frame. Starting from the power supply pads on the fixed frame, the conductive lines transit through the torsional beam to join the ends of coil on the moveable frame. To make several plates going through one of the torsional beams, the beams are isolated electrically by a groove.

Mechanical apparatus includes a rotational assembly, including a frame and a gimbal, which is attached to the frame by first hinges disposed along a first axis and is configured to rotate on the first hinges about the first axis relative to the frame. A rotating element is attached to the gimbal by second hinges disposed along a second axis, perpendicular to the first axis, and is configured to rotate on the second hinges about the second axis relative to the gimbal. One or more strain sensors are disposed on at least one of the first hinges and configured to provide a signal indicative of a rotation of the rotating element about the second axis relative to the gimbal. Control circuitry is configured to monitor the rotation of the rotating element about the second axis responsively to the signal.