A semiconductor device according to one embodiment of the present disclosure includes a substrate, a plurality of structures arranged in a matrix and each having a planar part, and a plurality of piezoelectric actuators disposed on the substrate and configured to move each of the plurality of structures along a direction perpendicular to one surface of the substrate.

A micro-electro-mechanical (MEMS) actuator device includes a frame, and a first functional sub-structure positioned within the frame and mechanically coupled thereto by supporting elements. The first functional sub-structure is subdivided into first and second portions. The first portion is subdivided into first and second sub-portions separated from one another by a first through trench, and the second portion is subdivided into first and second sub-portions separated from one another by a second through trench. First and second piezo-electric structures are respectively carried by the first and second sub-portions of the first portion. Third and fourth piezo-electric structures are respectively carried by the first and second sub-portions of the second portion. A third through trench extends between the frame and the first functional sub-structure except for regions in which the supporting elements are present.

A fixed frame (2) is fixed to an external member. An ultrasonic oscillator (3) is disposed inside the fixed frame (2) and includes a flexible first substrate and a first piezoelectric element deposited on the first substrate in the form of a thin film. The ultrasonic oscillator (3) is warped in response to expansion or contraction of the first piezoelectric element and generates ultrasonic waves. Actuator units (4) include a flexible second substrate coupling the first substrate to the fixed frame (2) and a second piezoelectric element deposited on the second substrate in the form of a thin film. The actuator units (4) are warped in response to expansion or contraction of the second piezoelectric element and cause the ultrasonic oscillator (3) to swing relative to the fixed frame (2). The fixed frame (2), the first substrate, and the second substrate are composed of the same substrate.

Described is a micro-haptic actuator device that can be fabricated with roll-to-roll MEMS processing techniques. The device includes a first body having a first surface and a second, opposing surface, the body has a chamber defined by at least one interior wall, a piston member disposed in the chamber, physically spaced from the at least one interior wall of the chamber, the piston member having a first surface and a second opposing surface. A membrane layer is disposed over and attached to the first surface of the body, with a portion of the membrane attached to the first surface of the piston member. The device also includes a first electrode supported on a second surface the membrane, and a second body that supports a second electrode, with the second body attached to the second surface of the first body.

A method for fabricating nano-electro-mechanical tags for identification and authentication includes, in part, forming a protective layer above a substrate, forming a first conductive layer above the protective layer serving as a first electrode, forming a piezoelectric layer above the first conductive layer, forming a second conductive layer above the piezoelectric layer, patterning the second conductive layer to form a second electrode, patterning the piezoelectric layer to expose one or more portions of the first conductive layer, and forming one or more trenches that extends into a plurality layers formed above. In addition, a sacrificial layer can be formed above portions of the substrate, and the sacrificial layer can be removed by etching to release the nano-electro-mechanical tags from the substrate.

A manufacturing method of micro fluid actuator includes: providing a substrate; depositing a first protection layer on a first surface of the substrate; depositing an actuation region on the first protection layer; applying lithography dry etching to a portion of the first protection layer to produce at least one first protection layer flow channel; applying wet etching to a portion of a main structure of the substrate to produce a chamber body and a first polycrystalline silicon flow channel region, while a region of an oxidation layer middle section of the main structure is not etched; applying reactive-ion etching to a portion of a second surface of the substrate to produce at least one substrate silicon flow channel; and applying dry etching to a portion of a silicon dioxide layer to produce at least one silicon dioxide flow channel.

A MEMS device is provided that includes a semiconductor substrate including a main surface extending perpendicular to a first direction and a side surface extending on a plane parallel to the first direction and to a second direction that is perpendicular to the first direction. At least one cantilevered member protrudes from the side surface of the semiconductor substrate along a third direction that is perpendicular to the first and second directions. The at least one cantilevered member includes a body portion that includes a piezoelectric material. The body portion has a length along the third direction, a height along the first direction and a width along the second direction, and the height is greater than the width. The at least one cantilevered member is configured to vibrate by lateral bending along a direction perpendicular to the first direction.

For manufacturing an optical microelectromechanical device, a first wafer of semiconductor material having a first surface and a second surface is machined to form a suspended mirror structure, a fixed structure surrounding the suspended mirror structure, elastic supporting elements which extend between the fixed structure and the suspended mirror structure, and an actuation structure coupled to the suspended mirror structure. A second wafer is machined separately to form a chamber delimited by a bottom wall having a through opening. The second wafer is bonded to the first surface of the first wafer in such a way that the chamber overlies the actuation structure and the through opening is aligned to the suspended mirror structure. Furthermore, a third wafer is bonded to the second surface of the first wafer to form a composite wafer device. The composite wafer device is then diced to form an optical microelectromechanical device.

A method of manufacturing a semiconductor device includes: forming a first substrate includes a membrane stack over a first dielectric layer, the membrane stack having a first electrode, a second electrode over the first electrode and a piezoelectric layer between the first electrode and the second electrode, a third electrode over the first dielectric layer, and a second dielectric layer over the membrane stack and the third electrode; forming a second substrate, including: a redistribution layer (RDL) over a third substrate, the RDL having a fourth electrode; and a first cavity on a surface of the RDL adjacent to the fourth electrode; forming a second cavity in one of the first substrate and the second substrate; and bonding the first substrate to the second substrate.

A movable device includes a light deflector including a movable part rotatable about a predetermined axis; a mount including a pair of stationary parts to which the light deflector is secured; and a substrate attached to an opposite side of a light-deflector side of the mount. The substrate has a through hole between the pair of the stationary parts.