Methods for forming an electrode structure, which can be used as a biosensor, are provided in which the electrode structure has non-random topography located on one surface of an electrode base. In some embodiments, an electrode structure is obtained that contains no interface between the non-random topography of the electrode structure and the electrode base of the electrode structure. In other embodiments, electrode structures are obtained that have an interface between the non-random topography of the electrode structure and the electrode base of the electrode structure.

A sensor comprising a support and a flexible structure arranged on the support is provided. The flexible structure comprises a frustum-shaped portion having a wider end and a narrower end, wherein the wider end of the frustum-shaped portion is arranged proximal to the support, and an elongated portion extending from the narrower end of the frustum-shaped portion, wherein the flexible structure further comprises a stretchable conducting film arranged on the frustum-shaped portion. A method of preparing such a sensor is also provided.

A method of forming a nanostructure comprises forming a directed self-assembly of nucleic acid structures on a patterned substrate. The patterned substrate comprises multiple regions. Each of the regions on the patterned substrate is specifically tailored for adsorption of specific nucleic acid structure in the directed self-assembly.

Aspects include methods of fabricating antibacterial surfaces for medical implant devices including patterning a photoresist layer on a silicon substrate and etching the silicon to generate a plurality of nanopillars. Aspects also include removing the photoresist layer from the structure and coating the plurality of nanopillars with a biocompatible film. Aspects also include a system for preventing bacterial infection associated with medical implants including a thin silicon film including a plurality of nanopillars.

A chemical sensor including at least one resonant detection structure, the detection structure including at least one layer based on a porous material, the pores of which are covered with at least one functionalization layer that can adsorb or absorb at least one chemical species.

A nanotweezer comprises a first metastructure including a first substrate, a first electrode, and a plurality of plasmonic nanostructures; a second metastructure including a second substrate and a second electrode, wherein the second substrate and the second electrode are substantially transparent to light within a wavelength range; a microfluidic channel between the first metastructure and the second metastructure; a voltage source configured to selectively apply an electric field between the first electrode and the second electrode a light source configured to selectively apply an excitation light to the microfluidic channel, the excitation light having a wavelength within the wavelength range. In response to the selective application of the electric field and/or the excitation light, nanoparticles within the microfluidic channel are manipulated.

A microfabricated device having at least one gas-entrapping feature formed therein in a configuration that entraps air bubbles upon wetting the feature with a solvent or solution is described. The device includes a sacrificial residue in contact with the gas-entrapping feature, the dissolution of which guides the wetting of the gas-entrapping feature.

One embodiment of the invention provides: a microchip including a sample collection section and an analysis section, in which the sample collection section and the analysis section are imparted with both hydrophilicity and a positively-charged layer; an analysis system including the microchip; and a method of producing the microchip. The microchip includes: a sample collection section for collecting a sample; and an analysis section for analyzing the sample. In the microchip, a cationic polymer bonded with a hydrophilization substance is immobilized on inner walls of the sample collection section and the analysis section.

Devices, systems and techniques are described for producing and implementing articles and materials having nanoscale and microscale structures that exhibit superhydrophobic, superoleophobic or omniphobic surface properties and other enhanced properties. In one aspect, a surface nanostructure can be formed by adding a silicon-containing buffer layer such as silicon, silicon oxide or silicon nitride layer, followed by metal film deposition and heating to convert the metal film into balled-up, discrete islands to form an etch mask. The buffer layer can be etched using the etch mask to create an array of pillar structures underneath the etch mask, in which the pillar structures have a shape that includes cylinders, negatively tapered rods, or cones and are vertically aligned. In another aspect, a method of fabricating microscale or nanoscale polymer or metal structures on a substrate is made by photolithography and/or nano imprinting lithography.

A MEMS media sensor, in particular, a MEMS gas sensor, including at least two electrodes, which are situated electrically isolated from one another with the aid of a carrier layer, a media-sensitive material for electrically connecting the two electrodes being applied to the carrier layer, a surface area for applying the media-sensitive material on the carrier layer having a topography, which is adapted to a particle size of particles of the media-sensitive material.